SUBSTRATE TREATING APPARATUS
본 발명의 기판 처리 장치는, 기판을 지지하는 스핀 척; 린스액을 공급하는 린스액 공급부; 상기 스핀 척의 외측 방향으로 하향 경사지는 경사면을 포함하는 제1 바울; 및 상기 제1 바울의 경사면에 상기 스핀 척을 둘러싸는 나선을 이루도록 마련되어, 상기 린스액의 흐름이 상기 나선을 따라 가이드되도록 하는 가이드부를 포함한다. A substrate treating apparatus includes: a spin chuck supporting a substrate; a rinse liquid supply unit supplying a...
Gespeichert in:
| Hauptverfasser: | , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; kor |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | KIM NAM KYU LIM JAE HYUN AN YOUNG SEO JO YOUNG JU PARK JAE HOON PARK SEO JUNG LEE DAE MYEONG SEO KYUNG JIN |
| description | 본 발명의 기판 처리 장치는, 기판을 지지하는 스핀 척; 린스액을 공급하는 린스액 공급부; 상기 스핀 척의 외측 방향으로 하향 경사지는 경사면을 포함하는 제1 바울; 및 상기 제1 바울의 경사면에 상기 스핀 척을 둘러싸는 나선을 이루도록 마련되어, 상기 린스액의 흐름이 상기 나선을 따라 가이드되도록 하는 가이드부를 포함한다.
A substrate treating apparatus includes: a spin chuck supporting a substrate; a rinse liquid supply unit supplying a rinse liquid; a first bowl including an inclined surface inclined downward in an outward direction of the spin chuck; and a guide part provided on the inclined surface of the first bowl so as to form a spiral surrounding the spin chuck and guiding a flow of the rinse liquid along the spiral. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20240106633A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20240106633A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20240106633A3</originalsourceid><addsrcrecordid>eNrjZJAJDnUKDglyDHFVCAlydQzx9HNXcAwIcASKhAbzMLCmJeYUp_JCaW4GZTfXEGcP3dSC_PjU4oLE5NS81JJ47yAjAyMTA0MDMzNjY0dj4lQBAA9DIeE</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SUBSTRATE TREATING APPARATUS</title><source>esp@cenet</source><creator>KIM NAM KYU ; LIM JAE HYUN ; AN YOUNG SEO ; JO YOUNG JU ; PARK JAE HOON ; PARK SEO JUNG ; LEE DAE MYEONG ; SEO KYUNG JIN</creator><creatorcontrib>KIM NAM KYU ; LIM JAE HYUN ; AN YOUNG SEO ; JO YOUNG JU ; PARK JAE HOON ; PARK SEO JUNG ; LEE DAE MYEONG ; SEO KYUNG JIN</creatorcontrib><description>본 발명의 기판 처리 장치는, 기판을 지지하는 스핀 척; 린스액을 공급하는 린스액 공급부; 상기 스핀 척의 외측 방향으로 하향 경사지는 경사면을 포함하는 제1 바울; 및 상기 제1 바울의 경사면에 상기 스핀 척을 둘러싸는 나선을 이루도록 마련되어, 상기 린스액의 흐름이 상기 나선을 따라 가이드되도록 하는 가이드부를 포함한다.
A substrate treating apparatus includes: a spin chuck supporting a substrate; a rinse liquid supply unit supplying a rinse liquid; a first bowl including an inclined surface inclined downward in an outward direction of the spin chuck; and a guide part provided on the inclined surface of the first bowl so as to form a spiral surrounding the spin chuck and guiding a flow of the rinse liquid along the spiral.</description><language>eng ; kor</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240708&DB=EPODOC&CC=KR&NR=20240106633A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240708&DB=EPODOC&CC=KR&NR=20240106633A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KIM NAM KYU</creatorcontrib><creatorcontrib>LIM JAE HYUN</creatorcontrib><creatorcontrib>AN YOUNG SEO</creatorcontrib><creatorcontrib>JO YOUNG JU</creatorcontrib><creatorcontrib>PARK JAE HOON</creatorcontrib><creatorcontrib>PARK SEO JUNG</creatorcontrib><creatorcontrib>LEE DAE MYEONG</creatorcontrib><creatorcontrib>SEO KYUNG JIN</creatorcontrib><title>SUBSTRATE TREATING APPARATUS</title><description>본 발명의 기판 처리 장치는, 기판을 지지하는 스핀 척; 린스액을 공급하는 린스액 공급부; 상기 스핀 척의 외측 방향으로 하향 경사지는 경사면을 포함하는 제1 바울; 및 상기 제1 바울의 경사면에 상기 스핀 척을 둘러싸는 나선을 이루도록 마련되어, 상기 린스액의 흐름이 상기 나선을 따라 가이드되도록 하는 가이드부를 포함한다.
A substrate treating apparatus includes: a spin chuck supporting a substrate; a rinse liquid supply unit supplying a rinse liquid; a first bowl including an inclined surface inclined downward in an outward direction of the spin chuck; and a guide part provided on the inclined surface of the first bowl so as to form a spiral surrounding the spin chuck and guiding a flow of the rinse liquid along the spiral.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJAJDnUKDglyDHFVCAlydQzx9HNXcAwIcASKhAbzMLCmJeYUp_JCaW4GZTfXEGcP3dSC_PjU4oLE5NS81JJ47yAjAyMTA0MDMzNjY0dj4lQBAA9DIeE</recordid><startdate>20240708</startdate><enddate>20240708</enddate><creator>KIM NAM KYU</creator><creator>LIM JAE HYUN</creator><creator>AN YOUNG SEO</creator><creator>JO YOUNG JU</creator><creator>PARK JAE HOON</creator><creator>PARK SEO JUNG</creator><creator>LEE DAE MYEONG</creator><creator>SEO KYUNG JIN</creator><scope>EVB</scope></search><sort><creationdate>20240708</creationdate><title>SUBSTRATE TREATING APPARATUS</title><author>KIM NAM KYU ; LIM JAE HYUN ; AN YOUNG SEO ; JO YOUNG JU ; PARK JAE HOON ; PARK SEO JUNG ; LEE DAE MYEONG ; SEO KYUNG JIN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20240106633A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2024</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>KIM NAM KYU</creatorcontrib><creatorcontrib>LIM JAE HYUN</creatorcontrib><creatorcontrib>AN YOUNG SEO</creatorcontrib><creatorcontrib>JO YOUNG JU</creatorcontrib><creatorcontrib>PARK JAE HOON</creatorcontrib><creatorcontrib>PARK SEO JUNG</creatorcontrib><creatorcontrib>LEE DAE MYEONG</creatorcontrib><creatorcontrib>SEO KYUNG JIN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KIM NAM KYU</au><au>LIM JAE HYUN</au><au>AN YOUNG SEO</au><au>JO YOUNG JU</au><au>PARK JAE HOON</au><au>PARK SEO JUNG</au><au>LEE DAE MYEONG</au><au>SEO KYUNG JIN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SUBSTRATE TREATING APPARATUS</title><date>2024-07-08</date><risdate>2024</risdate><abstract>본 발명의 기판 처리 장치는, 기판을 지지하는 스핀 척; 린스액을 공급하는 린스액 공급부; 상기 스핀 척의 외측 방향으로 하향 경사지는 경사면을 포함하는 제1 바울; 및 상기 제1 바울의 경사면에 상기 스핀 척을 둘러싸는 나선을 이루도록 마련되어, 상기 린스액의 흐름이 상기 나선을 따라 가이드되도록 하는 가이드부를 포함한다.
A substrate treating apparatus includes: a spin chuck supporting a substrate; a rinse liquid supply unit supplying a rinse liquid; a first bowl including an inclined surface inclined downward in an outward direction of the spin chuck; and a guide part provided on the inclined surface of the first bowl so as to form a spiral surrounding the spin chuck and guiding a flow of the rinse liquid along the spiral.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; kor |
| recordid | cdi_epo_espacenet_KR20240106633A |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | SUBSTRATE TREATING APPARATUS |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-17T14%3A20%3A40IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KIM%20NAM%20KYU&rft.date=2024-07-08&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EKR20240106633A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |