SUBSTRATE PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD
[과제] 기판 위에 배치된 용액의 건조 속도의 불균일을 저감시킨다. [해결 수단] 기판처리장치는, 기밀용기와, 상기 기밀용기의 내부를 감압하는 감압 기구와, 상기 기밀용기의 내부에 배치되어, 기판을 보유가능한 기판보유부와, 상기 기밀용기의 내부에 있어서 상기 기판보유부에 보유되는 상기 기판의 측면에 대향하는 위치에 배치된 벽 부재를, 구비한다. 상기 벽 부재는, 상기 기판의 측면에 대향하는 측의 벽면을 가진다. 상기 벽 부재는, 상기 벽면의 적어도 일부에, 제1발액부재를 가진다. The invention provides a subs...
Gespeichert in:
| Hauptverfasser: | , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; kor |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | WAKABAYASHI SATOSHI MURAKAMI YASUO HAMAGUCHI KOHEI KISHIMOTO KATSUSHI TERAMOTO YOJI FUTAKI HAJIME |
| description | [과제] 기판 위에 배치된 용액의 건조 속도의 불균일을 저감시킨다. [해결 수단] 기판처리장치는, 기밀용기와, 상기 기밀용기의 내부를 감압하는 감압 기구와, 상기 기밀용기의 내부에 배치되어, 기판을 보유가능한 기판보유부와, 상기 기밀용기의 내부에 있어서 상기 기판보유부에 보유되는 상기 기판의 측면에 대향하는 위치에 배치된 벽 부재를, 구비한다. 상기 벽 부재는, 상기 기판의 측면에 대향하는 측의 벽면을 가진다. 상기 벽 부재는, 상기 벽면의 적어도 일부에, 제1발액부재를 가진다.
The invention provides a substrate processing device and a method for manufacturing articles, which reduces the uneven drying speed of a solution applied to a substrate. The substrate processing device includes: an airtight container; a depressurization mechanism for reducing pressure inside the airtight container; a substrate holding part that is arranged inside the airtight container and can hold the substrate; and a wall member arranged inside the airtight container at a position facing a side surface of the substrate held by the substrate holding part. The wall member has a wall surface facing the side surface of the substrate. The wall member has a first liquid-repellent component on at least a portion of the wall surface. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20240101365A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20240101365A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20240101365A3</originalsourceid><addsrcrecordid>eNrjZLAPDnUKDglyDHFVCAjyd3YNDvb0c1dwDAhwBIqFBis4-rkoOAaFeDr7uCr4OvqFujk6h4QGgdT4uoZ4-LvwMLCmJeYUp_JCaW4GZTfXEGcP3dSC_PjU4oLE5NS81JJ47yAjAyMTA0MDQ2MzU0dj4lQBAFn5K4k</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SUBSTRATE PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD</title><source>esp@cenet</source><creator>WAKABAYASHI SATOSHI ; MURAKAMI YASUO ; HAMAGUCHI KOHEI ; KISHIMOTO KATSUSHI ; TERAMOTO YOJI ; FUTAKI HAJIME</creator><creatorcontrib>WAKABAYASHI SATOSHI ; MURAKAMI YASUO ; HAMAGUCHI KOHEI ; KISHIMOTO KATSUSHI ; TERAMOTO YOJI ; FUTAKI HAJIME</creatorcontrib><description>[과제] 기판 위에 배치된 용액의 건조 속도의 불균일을 저감시킨다. [해결 수단] 기판처리장치는, 기밀용기와, 상기 기밀용기의 내부를 감압하는 감압 기구와, 상기 기밀용기의 내부에 배치되어, 기판을 보유가능한 기판보유부와, 상기 기밀용기의 내부에 있어서 상기 기판보유부에 보유되는 상기 기판의 측면에 대향하는 위치에 배치된 벽 부재를, 구비한다. 상기 벽 부재는, 상기 기판의 측면에 대향하는 측의 벽면을 가진다. 상기 벽 부재는, 상기 벽면의 적어도 일부에, 제1발액부재를 가진다.
The invention provides a substrate processing device and a method for manufacturing articles, which reduces the uneven drying speed of a solution applied to a substrate. The substrate processing device includes: an airtight container; a depressurization mechanism for reducing pressure inside the airtight container; a substrate holding part that is arranged inside the airtight container and can hold the substrate; and a wall member arranged inside the airtight container at a position facing a side surface of the substrate held by the substrate holding part. The wall member has a wall surface facing the side surface of the substrate. The wall member has a first liquid-repellent component on at least a portion of the wall surface.</description><language>eng ; kor</language><subject>BASIC ELECTRIC ELEMENTS ; BLASTING ; DRYING ; DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; HEATING ; LIGHTING ; MECHANICAL ENGINEERING ; SEMICONDUCTOR DEVICES ; WEAPONS</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240702&DB=EPODOC&CC=KR&NR=20240101365A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240702&DB=EPODOC&CC=KR&NR=20240101365A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WAKABAYASHI SATOSHI</creatorcontrib><creatorcontrib>MURAKAMI YASUO</creatorcontrib><creatorcontrib>HAMAGUCHI KOHEI</creatorcontrib><creatorcontrib>KISHIMOTO KATSUSHI</creatorcontrib><creatorcontrib>TERAMOTO YOJI</creatorcontrib><creatorcontrib>FUTAKI HAJIME</creatorcontrib><title>SUBSTRATE PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD</title><description>[과제] 기판 위에 배치된 용액의 건조 속도의 불균일을 저감시킨다. [해결 수단] 기판처리장치는, 기밀용기와, 상기 기밀용기의 내부를 감압하는 감압 기구와, 상기 기밀용기의 내부에 배치되어, 기판을 보유가능한 기판보유부와, 상기 기밀용기의 내부에 있어서 상기 기판보유부에 보유되는 상기 기판의 측면에 대향하는 위치에 배치된 벽 부재를, 구비한다. 상기 벽 부재는, 상기 기판의 측면에 대향하는 측의 벽면을 가진다. 상기 벽 부재는, 상기 벽면의 적어도 일부에, 제1발액부재를 가진다.
The invention provides a substrate processing device and a method for manufacturing articles, which reduces the uneven drying speed of a solution applied to a substrate. The substrate processing device includes: an airtight container; a depressurization mechanism for reducing pressure inside the airtight container; a substrate holding part that is arranged inside the airtight container and can hold the substrate; and a wall member arranged inside the airtight container at a position facing a side surface of the substrate held by the substrate holding part. The wall member has a wall surface facing the side surface of the substrate. The wall member has a first liquid-repellent component on at least a portion of the wall surface.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>BLASTING</subject><subject>DRYING</subject><subject>DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>HEATING</subject><subject>LIGHTING</subject><subject>MECHANICAL ENGINEERING</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLAPDnUKDglyDHFVCAjyd3YNDvb0c1dwDAhwBIqFBis4-rkoOAaFeDr7uCr4OvqFujk6h4QGgdT4uoZ4-LvwMLCmJeYUp_JCaW4GZTfXEGcP3dSC_PjU4oLE5NS81JJ47yAjAyMTA0MDQ2MzU0dj4lQBAFn5K4k</recordid><startdate>20240702</startdate><enddate>20240702</enddate><creator>WAKABAYASHI SATOSHI</creator><creator>MURAKAMI YASUO</creator><creator>HAMAGUCHI KOHEI</creator><creator>KISHIMOTO KATSUSHI</creator><creator>TERAMOTO YOJI</creator><creator>FUTAKI HAJIME</creator><scope>EVB</scope></search><sort><creationdate>20240702</creationdate><title>SUBSTRATE PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD</title><author>WAKABAYASHI SATOSHI ; MURAKAMI YASUO ; HAMAGUCHI KOHEI ; KISHIMOTO KATSUSHI ; TERAMOTO YOJI ; FUTAKI HAJIME</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20240101365A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2024</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>BLASTING</topic><topic>DRYING</topic><topic>DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>HEATING</topic><topic>LIGHTING</topic><topic>MECHANICAL ENGINEERING</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>WAKABAYASHI SATOSHI</creatorcontrib><creatorcontrib>MURAKAMI YASUO</creatorcontrib><creatorcontrib>HAMAGUCHI KOHEI</creatorcontrib><creatorcontrib>KISHIMOTO KATSUSHI</creatorcontrib><creatorcontrib>TERAMOTO YOJI</creatorcontrib><creatorcontrib>FUTAKI HAJIME</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WAKABAYASHI SATOSHI</au><au>MURAKAMI YASUO</au><au>HAMAGUCHI KOHEI</au><au>KISHIMOTO KATSUSHI</au><au>TERAMOTO YOJI</au><au>FUTAKI HAJIME</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SUBSTRATE PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD</title><date>2024-07-02</date><risdate>2024</risdate><abstract>[과제] 기판 위에 배치된 용액의 건조 속도의 불균일을 저감시킨다. [해결 수단] 기판처리장치는, 기밀용기와, 상기 기밀용기의 내부를 감압하는 감압 기구와, 상기 기밀용기의 내부에 배치되어, 기판을 보유가능한 기판보유부와, 상기 기밀용기의 내부에 있어서 상기 기판보유부에 보유되는 상기 기판의 측면에 대향하는 위치에 배치된 벽 부재를, 구비한다. 상기 벽 부재는, 상기 기판의 측면에 대향하는 측의 벽면을 가진다. 상기 벽 부재는, 상기 벽면의 적어도 일부에, 제1발액부재를 가진다.
The invention provides a substrate processing device and a method for manufacturing articles, which reduces the uneven drying speed of a solution applied to a substrate. The substrate processing device includes: an airtight container; a depressurization mechanism for reducing pressure inside the airtight container; a substrate holding part that is arranged inside the airtight container and can hold the substrate; and a wall member arranged inside the airtight container at a position facing a side surface of the substrate held by the substrate holding part. The wall member has a wall surface facing the side surface of the substrate. The wall member has a first liquid-repellent component on at least a portion of the wall surface.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; kor |
| recordid | cdi_epo_espacenet_KR20240101365A |
| source | esp@cenet |
| subjects | BASIC ELECTRIC ELEMENTS BLASTING DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HEATING LIGHTING MECHANICAL ENGINEERING SEMICONDUCTOR DEVICES WEAPONS |
| title | SUBSTRATE PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-22T16%3A43%3A27IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=WAKABAYASHI%20SATOSHI&rft.date=2024-07-02&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EKR20240101365A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |