Insulator ring assembly and Substrate processing apparatus

본 발명은 절연링 어셈블리 및 기판처리장치에 대한 것으로서, 보다 상세하게는 기판에 대한 공정을 수행하는 경우에 기판의 가장자리와 중앙부의 흡광계수(K)의 편차를 줄일 수 있는 절연링 어셈블리 및 기판처리장치에 대한 것이다. Provided is an insulator ring assembly and a substrate processing apparatus, and more particularly an insulator ring assembly and a substrate processing apparatus, for reduci...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KIM NAM SEO, JEON SEUNG HWAN, KANG DU HO, KIM SUNG HO, CHO SEONG PYO, KIM HYE OK, HWANG YEONG HYEON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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