심자외선 리소그래피용 바닥 반사 방지 코팅과 이의 제조방법 및 용도
본 발명은 심자외선 리소그래피용 바닥 반사 방지 코팅과 이의 제조방법 및 용도를 개시한다. 본 발명에 개시된 중합체는 하기 방법에 의해 제조된다. (1) 용매 I을 예열하고, (2) 식(A)으로 표시되는 단량체, 식(B)으로 표시되는 단량체, 식(C)으로 표시되는 단량체, 식(L)으로 표시되는 가교제, 개시제 및 용매 II를 혼합하여 혼합 용액을 수득하고, (3) 혼합 용액을 예열된 용매에 가하여 중합 반응을 수행하며, 여기서, 단계(1)과 단계(2)는 선후 순서가 없다. 상기 심자외선 리소그래피용 바닥 반사 방지 코팅은 반사율을...
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| creator | FANG SHUNONG GENG ZHIYUE WANG SU |
| description | 본 발명은 심자외선 리소그래피용 바닥 반사 방지 코팅과 이의 제조방법 및 용도를 개시한다. 본 발명에 개시된 중합체는 하기 방법에 의해 제조된다. (1) 용매 I을 예열하고, (2) 식(A)으로 표시되는 단량체, 식(B)으로 표시되는 단량체, 식(C)으로 표시되는 단량체, 식(L)으로 표시되는 가교제, 개시제 및 용매 II를 혼합하여 혼합 용액을 수득하고, (3) 혼합 용액을 예열된 용매에 가하여 중합 반응을 수행하며, 여기서, 단계(1)과 단계(2)는 선후 순서가 없다. 상기 심자외선 리소그래피용 바닥 반사 방지 코팅은 반사율을 감소시킬 수 있으며, 바닥 반사 방지 코팅에 포토레지스트를 스핀 코팅한 후 바닥 반사 방지 코팅에 의해 형성된 스컴이 관찰되지 않았다.
Disclosed in the present invention are a bottom anti-reflective coating for deep ultraviolet lithography, a preparation method therefor and the use thereof. A polymer disclosed in the present invention is prepared by the following method: (1) preheating a solvent I; (2) mixing a monomer as shown in formula (A), a monomer as shown in formula (B), a monomer as shown in formula (C), a cross-linking agent as shown in formula (L), and an initiator and a solvent II to obtain a mixed solution; and (3) adding the mixed solution to a preheated solvent and perform a polymerization reaction, wherein step (1) and step (2) are in no particular order. The bottom anti-reflective coating for deep ultraviolet lithography can reduce the reflectivity, and after the bottom anti-reflective coating is spin-coated with a photoresist, no scum formed by the bottom anti-reflective coating is observed. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20240090687A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20240090687A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20240090687A3</originalsourceid><addsrcrecordid>eNrjZIh9073mzbwJb2bueNOyQOH1sjVv2npebd_xet6Mt1P2vJm1UuH1himvu5cCqRlvmtYAqZVvljcovNk75W1P66vNexTezN3yZu4MhTcL5rxZuAEo-3rTVKCifgWg1tf9LTwMrGmJOcWpvFCam0HZzTXE2UM3tSA_PrW4IDE5NS-1JN47yMjAyMTAwNLAzMLc0Zg4VQC0sVgJ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>심자외선 리소그래피용 바닥 반사 방지 코팅과 이의 제조방법 및 용도</title><source>esp@cenet</source><creator>FANG SHUNONG ; GENG ZHIYUE ; WANG SU</creator><creatorcontrib>FANG SHUNONG ; GENG ZHIYUE ; WANG SU</creatorcontrib><description>본 발명은 심자외선 리소그래피용 바닥 반사 방지 코팅과 이의 제조방법 및 용도를 개시한다. 본 발명에 개시된 중합체는 하기 방법에 의해 제조된다. (1) 용매 I을 예열하고, (2) 식(A)으로 표시되는 단량체, 식(B)으로 표시되는 단량체, 식(C)으로 표시되는 단량체, 식(L)으로 표시되는 가교제, 개시제 및 용매 II를 혼합하여 혼합 용액을 수득하고, (3) 혼합 용액을 예열된 용매에 가하여 중합 반응을 수행하며, 여기서, 단계(1)과 단계(2)는 선후 순서가 없다. 상기 심자외선 리소그래피용 바닥 반사 방지 코팅은 반사율을 감소시킬 수 있으며, 바닥 반사 방지 코팅에 포토레지스트를 스핀 코팅한 후 바닥 반사 방지 코팅에 의해 형성된 스컴이 관찰되지 않았다.
Disclosed in the present invention are a bottom anti-reflective coating for deep ultraviolet lithography, a preparation method therefor and the use thereof. A polymer disclosed in the present invention is prepared by the following method: (1) preheating a solvent I; (2) mixing a monomer as shown in formula (A), a monomer as shown in formula (B), a monomer as shown in formula (C), a cross-linking agent as shown in formula (L), and an initiator and a solvent II to obtain a mixed solution; and (3) adding the mixed solution to a preheated solvent and perform a polymerization reaction, wherein step (1) and step (2) are in no particular order. The bottom anti-reflective coating for deep ultraviolet lithography can reduce the reflectivity, and after the bottom anti-reflective coating is spin-coated with a photoresist, no scum formed by the bottom anti-reflective coating is observed.</description><language>kor</language><subject>ADHESIVES ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMICAL PAINT OR INK REMOVERS ; CHEMISTRY ; CINEMATOGRAPHY ; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS ; COMPOSITIONS BASED THEREON ; CORRECTING FLUIDS ; DYES ; ELECTROGRAPHY ; FILLING PASTES ; HOLOGRAPHY ; INKS ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; MATERIALS THEREFOR ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PAINTS ; PASTES OR SOLIDS FOR COLOURING OR PRINTING ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; POLISHES ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF MATERIALS THEREFOR ; WOODSTAINS</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240621&DB=EPODOC&CC=KR&NR=20240090687A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240621&DB=EPODOC&CC=KR&NR=20240090687A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>FANG SHUNONG</creatorcontrib><creatorcontrib>GENG ZHIYUE</creatorcontrib><creatorcontrib>WANG SU</creatorcontrib><title>심자외선 리소그래피용 바닥 반사 방지 코팅과 이의 제조방법 및 용도</title><description>본 발명은 심자외선 리소그래피용 바닥 반사 방지 코팅과 이의 제조방법 및 용도를 개시한다. 본 발명에 개시된 중합체는 하기 방법에 의해 제조된다. (1) 용매 I을 예열하고, (2) 식(A)으로 표시되는 단량체, 식(B)으로 표시되는 단량체, 식(C)으로 표시되는 단량체, 식(L)으로 표시되는 가교제, 개시제 및 용매 II를 혼합하여 혼합 용액을 수득하고, (3) 혼합 용액을 예열된 용매에 가하여 중합 반응을 수행하며, 여기서, 단계(1)과 단계(2)는 선후 순서가 없다. 상기 심자외선 리소그래피용 바닥 반사 방지 코팅은 반사율을 감소시킬 수 있으며, 바닥 반사 방지 코팅에 포토레지스트를 스핀 코팅한 후 바닥 반사 방지 코팅에 의해 형성된 스컴이 관찰되지 않았다.
Disclosed in the present invention are a bottom anti-reflective coating for deep ultraviolet lithography, a preparation method therefor and the use thereof. A polymer disclosed in the present invention is prepared by the following method: (1) preheating a solvent I; (2) mixing a monomer as shown in formula (A), a monomer as shown in formula (B), a monomer as shown in formula (C), a cross-linking agent as shown in formula (L), and an initiator and a solvent II to obtain a mixed solution; and (3) adding the mixed solution to a preheated solvent and perform a polymerization reaction, wherein step (1) and step (2) are in no particular order. The bottom anti-reflective coating for deep ultraviolet lithography can reduce the reflectivity, and after the bottom anti-reflective coating is spin-coated with a photoresist, no scum formed by the bottom anti-reflective coating is observed.</description><subject>ADHESIVES</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMICAL PAINT OR INK REMOVERS</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>CORRECTING FLUIDS</subject><subject>DYES</subject><subject>ELECTROGRAPHY</subject><subject>FILLING PASTES</subject><subject>HOLOGRAPHY</subject><subject>INKS</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PAINTS</subject><subject>PASTES OR SOLIDS FOR COLOURING OR PRINTING</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>POLISHES</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>USE OF MATERIALS THEREFOR</subject><subject>WOODSTAINS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZIh9073mzbwJb2bueNOyQOH1sjVv2npebd_xet6Mt1P2vJm1UuH1himvu5cCqRlvmtYAqZVvljcovNk75W1P66vNexTezN3yZu4MhTcL5rxZuAEo-3rTVKCifgWg1tf9LTwMrGmJOcWpvFCam0HZzTXE2UM3tSA_PrW4IDE5NS-1JN47yMjAyMTAwNLAzMLc0Zg4VQC0sVgJ</recordid><startdate>20240621</startdate><enddate>20240621</enddate><creator>FANG SHUNONG</creator><creator>GENG ZHIYUE</creator><creator>WANG SU</creator><scope>EVB</scope></search><sort><creationdate>20240621</creationdate><title>심자외선 리소그래피용 바닥 반사 방지 코팅과 이의 제조방법 및 용도</title><author>FANG SHUNONG ; GENG ZHIYUE ; WANG SU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20240090687A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>kor</language><creationdate>2024</creationdate><topic>ADHESIVES</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMICAL PAINT OR INK REMOVERS</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>CORRECTING FLUIDS</topic><topic>DYES</topic><topic>ELECTROGRAPHY</topic><topic>FILLING PASTES</topic><topic>HOLOGRAPHY</topic><topic>INKS</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PAINTS</topic><topic>PASTES OR SOLIDS FOR COLOURING OR PRINTING</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>POLISHES</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>USE OF MATERIALS THEREFOR</topic><topic>WOODSTAINS</topic><toplevel>online_resources</toplevel><creatorcontrib>FANG SHUNONG</creatorcontrib><creatorcontrib>GENG ZHIYUE</creatorcontrib><creatorcontrib>WANG SU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>FANG SHUNONG</au><au>GENG ZHIYUE</au><au>WANG SU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>심자외선 리소그래피용 바닥 반사 방지 코팅과 이의 제조방법 및 용도</title><date>2024-06-21</date><risdate>2024</risdate><abstract>본 발명은 심자외선 리소그래피용 바닥 반사 방지 코팅과 이의 제조방법 및 용도를 개시한다. 본 발명에 개시된 중합체는 하기 방법에 의해 제조된다. (1) 용매 I을 예열하고, (2) 식(A)으로 표시되는 단량체, 식(B)으로 표시되는 단량체, 식(C)으로 표시되는 단량체, 식(L)으로 표시되는 가교제, 개시제 및 용매 II를 혼합하여 혼합 용액을 수득하고, (3) 혼합 용액을 예열된 용매에 가하여 중합 반응을 수행하며, 여기서, 단계(1)과 단계(2)는 선후 순서가 없다. 상기 심자외선 리소그래피용 바닥 반사 방지 코팅은 반사율을 감소시킬 수 있으며, 바닥 반사 방지 코팅에 포토레지스트를 스핀 코팅한 후 바닥 반사 방지 코팅에 의해 형성된 스컴이 관찰되지 않았다.
Disclosed in the present invention are a bottom anti-reflective coating for deep ultraviolet lithography, a preparation method therefor and the use thereof. A polymer disclosed in the present invention is prepared by the following method: (1) preheating a solvent I; (2) mixing a monomer as shown in formula (A), a monomer as shown in formula (B), a monomer as shown in formula (C), a cross-linking agent as shown in formula (L), and an initiator and a solvent II to obtain a mixed solution; and (3) adding the mixed solution to a preheated solvent and perform a polymerization reaction, wherein step (1) and step (2) are in no particular order. The bottom anti-reflective coating for deep ultraviolet lithography can reduce the reflectivity, and after the bottom anti-reflective coating is spin-coated with a photoresist, no scum formed by the bottom anti-reflective coating is observed.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR CHEMICAL PAINT OR INK REMOVERS CHEMISTRY CINEMATOGRAPHY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON CORRECTING FLUIDS DYES ELECTROGRAPHY FILLING PASTES HOLOGRAPHY INKS MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS THEREFOR WOODSTAINS |
| title | 심자외선 리소그래피용 바닥 반사 방지 코팅과 이의 제조방법 및 용도 |
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