프로세스 챔버 구성요소들에 대한 진보된 배리어 니켈 산화물(BNIO) 코팅 개발
니켈을 포함하는 금속 층 및 금속 층 위의 니켈 산화물의 배리어 층을 포함하는 챔버 구성요소가 본원에서 설명된다. 니켈 산화물의 배리어 층은, 플루오린화수소산 및/또는 질산을 포함하는 산화제로 챔버 구성요소를 처리함으로써 형성될 수 있다. Described herein is a chamber component including a metal layer comprising nickel and a barrier layer of nickel oxide over the metal layer. The barrier layer of nicke...
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| creator | BEHNKE JOSEPH KALITA LAKSHESWAR |
| description | 니켈을 포함하는 금속 층 및 금속 층 위의 니켈 산화물의 배리어 층을 포함하는 챔버 구성요소가 본원에서 설명된다. 니켈 산화물의 배리어 층은, 플루오린화수소산 및/또는 질산을 포함하는 산화제로 챔버 구성요소를 처리함으로써 형성될 수 있다.
Described herein is a chamber component including a metal layer comprising nickel and a barrier layer of nickel oxide over the metal layer. The barrier layer of nickel oxide may be formed by treating the chamber component with an oxidizing agent comprising hydrofluoric acid and/or nitric acid |
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Described herein is a chamber component including a metal layer comprising nickel and a barrier layer of nickel oxide over the metal layer. The barrier layer of nickel oxide may be formed by treating the chamber component with an oxidizing agent comprising hydrofluoric acid and/or nitric acid</description><language>kor</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240517&DB=EPODOC&CC=KR&NR=20240068623A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240517&DB=EPODOC&CC=KR&NR=20240068623A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BEHNKE JOSEPH</creatorcontrib><creatorcontrib>KALITA LAKSHESWAR</creatorcontrib><title>프로세스 챔버 구성요소들에 대한 진보된 배리어 니켈 산화물(BNIO) 코팅 개발</title><description>니켈을 포함하는 금속 층 및 금속 층 위의 니켈 산화물의 배리어 층을 포함하는 챔버 구성요소가 본원에서 설명된다. 니켈 산화물의 배리어 층은, 플루오린화수소산 및/또는 질산을 포함하는 산화제로 챔버 구성요소를 처리함으로써 형성될 수 있다.
Described herein is a chamber component including a metal layer comprising nickel and a barrier layer of nickel oxide over the metal layer. The barrier layer of nickel oxide may be formed by treating the chamber component with an oxidizing agent comprising hydrofluoric acid and/or nitric acid</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZEh7O6Xl9cI5b1p2vOlaovBm45TXm1oUXm1d86Zl45tZU9609byevOTN9AkKr3sa3k6do_BmecvrzVteT5ij8HrDhtfL1ryZtkXhdXfHmz0dCm-aNrydOeX1mj0aTn6e_poKb_ZOedvTqvBqw5zXG-bwMLCmJeYUp_JCaW4GZTfXEGcP3dSC_PjU4oLE5NS81JJ47yAjAyMTAwMzCzMjY0dj4lQBALd2WvI</recordid><startdate>20240517</startdate><enddate>20240517</enddate><creator>BEHNKE JOSEPH</creator><creator>KALITA LAKSHESWAR</creator><scope>EVB</scope></search><sort><creationdate>20240517</creationdate><title>프로세스 챔버 구성요소들에 대한 진보된 배리어 니켈 산화물(BNIO) 코팅 개발</title><author>BEHNKE JOSEPH ; KALITA LAKSHESWAR</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20240068623A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>kor</language><creationdate>2024</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>BEHNKE JOSEPH</creatorcontrib><creatorcontrib>KALITA LAKSHESWAR</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BEHNKE JOSEPH</au><au>KALITA LAKSHESWAR</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>프로세스 챔버 구성요소들에 대한 진보된 배리어 니켈 산화물(BNIO) 코팅 개발</title><date>2024-05-17</date><risdate>2024</risdate><abstract>니켈을 포함하는 금속 층 및 금속 층 위의 니켈 산화물의 배리어 층을 포함하는 챔버 구성요소가 본원에서 설명된다. 니켈 산화물의 배리어 층은, 플루오린화수소산 및/또는 질산을 포함하는 산화제로 챔버 구성요소를 처리함으로써 형성될 수 있다.
Described herein is a chamber component including a metal layer comprising nickel and a barrier layer of nickel oxide over the metal layer. The barrier layer of nickel oxide may be formed by treating the chamber component with an oxidizing agent comprising hydrofluoric acid and/or nitric acid</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | 프로세스 챔버 구성요소들에 대한 진보된 배리어 니켈 산화물(BNIO) 코팅 개발 |
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