PHOTOSENSITIVE COMPOSITION PRODUCTION METHOD FOR PATTERNED CURED PRODUCT PATTERNED CURED PRODUCT AND BLACK MATRIX
(과제) 내수성이 우수하고, 또한, 기판에 대한 밀착성이 우수한 패턴화된 경화물을 형성할 수 있는 감광성 조성물과, 당해 감광성 조성물을 사용하는 패턴화된 경화물의 제조 방법과, 전술한 감광성 조성물의 경화물로 이루어지는 패턴화된 경화물과, 전술한 감광성 조성물의 경화물로 이루어지는 블랙 매트릭스를 제공한다. (해결 수단) 알칼리 가용성 수지 (A) 와 광중합성 모노머 (B) 와 광중합 개시제 (C) 와 차광제 (D) 와 실란 커플링제 (E) 를 포함하고, 차광제 (D) 는 에폭시 수지로 피복 처리된 카본 블랙 (D1) 을 포함하고...
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| creator | ABE KAZUKI TADOKORO YOSHINORI |
| description | (과제) 내수성이 우수하고, 또한, 기판에 대한 밀착성이 우수한 패턴화된 경화물을 형성할 수 있는 감광성 조성물과, 당해 감광성 조성물을 사용하는 패턴화된 경화물의 제조 방법과, 전술한 감광성 조성물의 경화물로 이루어지는 패턴화된 경화물과, 전술한 감광성 조성물의 경화물로 이루어지는 블랙 매트릭스를 제공한다. (해결 수단) 알칼리 가용성 수지 (A) 와 광중합성 모노머 (B) 와 광중합 개시제 (C) 와 차광제 (D) 와 실란 커플링제 (E) 를 포함하고, 차광제 (D) 는 에폭시 수지로 피복 처리된 카본 블랙 (D1) 을 포함하고, 광중합성 모노머 (B) 는 수산기가가 180 mgKOH/g 이상인 고수산기가 모노머 (B1) 와 수산기가가 180 mgKOH/g 미만인 저수산기가 모노머 (B2) 를 포함하고, 고수산기가 모노머 (B1) 의 함유량은 광중합성 모노머 (B) 의 질량에 대해 5 질량％ 이상 60 질량％ 이하인, 감광성 조성물을 사용한다.
Provided are: a photosensitive composition capable of forming a patterned cured product having excellent water resistance and excellent adhesion to a substrate; a method for producing a patterned cured product using the photosensitive composition; and a patterned cured product comprising a cured product of the photosensitive composition. And a black matrix comprising a cured product of the photosensitive composition. The photosensitive composition includes an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C), an opacifying agent (D), and a silane coupling agent (E), the opacifying agent (D) includes carbon black (D1) coated with an epoxy resin, and the photopolymerizable monomer (B) includes a high hydroxyl value monomer (B1) having a hydroxyl value of 180 mgKOH/g or more and a low hydroxyl value monomer (B2) having a hydroxyl value of less than 180 mgKOH/g. The content of the high-hydroxyl-value monomer (B1) is from 5% by mass to 60% by mass (inclusive) with respect to the mass of the photopolymerizable monomer (B). |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20240017312A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20240017312A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20240017312A3</originalsourceid><addsrcrecordid>eNrjZCgM8PAP8Q929Qv2DPEMc1Vw9vcN8Aex_f0UAoL8XUKdwUxf1xAPfxcFN_8ghQDHkBDXID9XFwXn0CAgCVWFU9zRz0XBycfR2VvB1zEkyDOCh4E1LTGnOJUXSnMzKLu5hjh76KYW5MenFhckJqfmpZbEewcZGRiZGBgYmhsbGjkaE6cKAGtPOYI</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PHOTOSENSITIVE COMPOSITION PRODUCTION METHOD FOR PATTERNED CURED PRODUCT PATTERNED CURED PRODUCT AND BLACK MATRIX</title><source>esp@cenet</source><creator>ABE KAZUKI ; TADOKORO YOSHINORI</creator><creatorcontrib>ABE KAZUKI ; TADOKORO YOSHINORI</creatorcontrib><description>(과제) 내수성이 우수하고, 또한, 기판에 대한 밀착성이 우수한 패턴화된 경화물을 형성할 수 있는 감광성 조성물과, 당해 감광성 조성물을 사용하는 패턴화된 경화물의 제조 방법과, 전술한 감광성 조성물의 경화물로 이루어지는 패턴화된 경화물과, 전술한 감광성 조성물의 경화물로 이루어지는 블랙 매트릭스를 제공한다. (해결 수단) 알칼리 가용성 수지 (A) 와 광중합성 모노머 (B) 와 광중합 개시제 (C) 와 차광제 (D) 와 실란 커플링제 (E) 를 포함하고, 차광제 (D) 는 에폭시 수지로 피복 처리된 카본 블랙 (D1) 을 포함하고, 광중합성 모노머 (B) 는 수산기가가 180 mgKOH/g 이상인 고수산기가 모노머 (B1) 와 수산기가가 180 mgKOH/g 미만인 저수산기가 모노머 (B2) 를 포함하고, 고수산기가 모노머 (B1) 의 함유량은 광중합성 모노머 (B) 의 질량에 대해 5 질량％ 이상 60 질량％ 이하인, 감광성 조성물을 사용한다.
Provided are: a photosensitive composition capable of forming a patterned cured product having excellent water resistance and excellent adhesion to a substrate; a method for producing a patterned cured product using the photosensitive composition; and a patterned cured product comprising a cured product of the photosensitive composition. And a black matrix comprising a cured product of the photosensitive composition. The photosensitive composition includes an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C), an opacifying agent (D), and a silane coupling agent (E), the opacifying agent (D) includes carbon black (D1) coated with an epoxy resin, and the photopolymerizable monomer (B) includes a high hydroxyl value monomer (B1) having a hydroxyl value of 180 mgKOH/g or more and a low hydroxyl value monomer (B2) having a hydroxyl value of less than 180 mgKOH/g. The content of the high-hydroxyl-value monomer (B1) is from 5% by mass to 60% by mass (inclusive) with respect to the mass of the photopolymerizable monomer (B).</description><language>eng ; kor</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240207&DB=EPODOC&CC=KR&NR=20240017312A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240207&DB=EPODOC&CC=KR&NR=20240017312A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ABE KAZUKI</creatorcontrib><creatorcontrib>TADOKORO YOSHINORI</creatorcontrib><title>PHOTOSENSITIVE COMPOSITION PRODUCTION METHOD FOR PATTERNED CURED PRODUCT PATTERNED CURED PRODUCT AND BLACK MATRIX</title><description>(과제) 내수성이 우수하고, 또한, 기판에 대한 밀착성이 우수한 패턴화된 경화물을 형성할 수 있는 감광성 조성물과, 당해 감광성 조성물을 사용하는 패턴화된 경화물의 제조 방법과, 전술한 감광성 조성물의 경화물로 이루어지는 패턴화된 경화물과, 전술한 감광성 조성물의 경화물로 이루어지는 블랙 매트릭스를 제공한다. (해결 수단) 알칼리 가용성 수지 (A) 와 광중합성 모노머 (B) 와 광중합 개시제 (C) 와 차광제 (D) 와 실란 커플링제 (E) 를 포함하고, 차광제 (D) 는 에폭시 수지로 피복 처리된 카본 블랙 (D1) 을 포함하고, 광중합성 모노머 (B) 는 수산기가가 180 mgKOH/g 이상인 고수산기가 모노머 (B1) 와 수산기가가 180 mgKOH/g 미만인 저수산기가 모노머 (B2) 를 포함하고, 고수산기가 모노머 (B1) 의 함유량은 광중합성 모노머 (B) 의 질량에 대해 5 질량％ 이상 60 질량％ 이하인, 감광성 조성물을 사용한다.
Provided are: a photosensitive composition capable of forming a patterned cured product having excellent water resistance and excellent adhesion to a substrate; a method for producing a patterned cured product using the photosensitive composition; and a patterned cured product comprising a cured product of the photosensitive composition. And a black matrix comprising a cured product of the photosensitive composition. The photosensitive composition includes an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C), an opacifying agent (D), and a silane coupling agent (E), the opacifying agent (D) includes carbon black (D1) coated with an epoxy resin, and the photopolymerizable monomer (B) includes a high hydroxyl value monomer (B1) having a hydroxyl value of 180 mgKOH/g or more and a low hydroxyl value monomer (B2) having a hydroxyl value of less than 180 mgKOH/g. The content of the high-hydroxyl-value monomer (B1) is from 5% by mass to 60% by mass (inclusive) with respect to the mass of the photopolymerizable monomer (B).</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZCgM8PAP8Q929Qv2DPEMc1Vw9vcN8Aex_f0UAoL8XUKdwUxf1xAPfxcFN_8ghQDHkBDXID9XFwXn0CAgCVWFU9zRz0XBycfR2VvB1zEkyDOCh4E1LTGnOJUXSnMzKLu5hjh76KYW5MenFhckJqfmpZbEewcZGRiZGBgYmhsbGjkaE6cKAGtPOYI</recordid><startdate>20240207</startdate><enddate>20240207</enddate><creator>ABE KAZUKI</creator><creator>TADOKORO YOSHINORI</creator><scope>EVB</scope></search><sort><creationdate>20240207</creationdate><title>PHOTOSENSITIVE COMPOSITION PRODUCTION METHOD FOR PATTERNED CURED PRODUCT PATTERNED CURED PRODUCT AND BLACK MATRIX</title><author>ABE KAZUKI ; TADOKORO YOSHINORI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20240017312A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2024</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</topic><toplevel>online_resources</toplevel><creatorcontrib>ABE KAZUKI</creatorcontrib><creatorcontrib>TADOKORO YOSHINORI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ABE KAZUKI</au><au>TADOKORO YOSHINORI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOSENSITIVE COMPOSITION PRODUCTION METHOD FOR PATTERNED CURED PRODUCT PATTERNED CURED PRODUCT AND BLACK MATRIX</title><date>2024-02-07</date><risdate>2024</risdate><abstract>(과제) 내수성이 우수하고, 또한, 기판에 대한 밀착성이 우수한 패턴화된 경화물을 형성할 수 있는 감광성 조성물과, 당해 감광성 조성물을 사용하는 패턴화된 경화물의 제조 방법과, 전술한 감광성 조성물의 경화물로 이루어지는 패턴화된 경화물과, 전술한 감광성 조성물의 경화물로 이루어지는 블랙 매트릭스를 제공한다. (해결 수단) 알칼리 가용성 수지 (A) 와 광중합성 모노머 (B) 와 광중합 개시제 (C) 와 차광제 (D) 와 실란 커플링제 (E) 를 포함하고, 차광제 (D) 는 에폭시 수지로 피복 처리된 카본 블랙 (D1) 을 포함하고, 광중합성 모노머 (B) 는 수산기가가 180 mgKOH/g 이상인 고수산기가 모노머 (B1) 와 수산기가가 180 mgKOH/g 미만인 저수산기가 모노머 (B2) 를 포함하고, 고수산기가 모노머 (B1) 의 함유량은 광중합성 모노머 (B) 의 질량에 대해 5 질량％ 이상 60 질량％ 이하인, 감광성 조성물을 사용한다.
Provided are: a photosensitive composition capable of forming a patterned cured product having excellent water resistance and excellent adhesion to a substrate; a method for producing a patterned cured product using the photosensitive composition; and a patterned cured product comprising a cured product of the photosensitive composition. And a black matrix comprising a cured product of the photosensitive composition. The photosensitive composition includes an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C), an opacifying agent (D), and a silane coupling agent (E), the opacifying agent (D) includes carbon black (D1) coated with an epoxy resin, and the photopolymerizable monomer (B) includes a high hydroxyl value monomer (B1) having a hydroxyl value of 180 mgKOH/g or more and a low hydroxyl value monomer (B2) having a hydroxyl value of less than 180 mgKOH/g. The content of the high-hydroxyl-value monomer (B1) is from 5% by mass to 60% by mass (inclusive) with respect to the mass of the photopolymerizable monomer (B).</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS |
| title | PHOTOSENSITIVE COMPOSITION PRODUCTION METHOD FOR PATTERNED CURED PRODUCT PATTERNED CURED PRODUCT AND BLACK MATRIX |
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