Composition for processing the substrate and Method for processing the substrate using the same
A composition for processing a substrate of the present invention is a composition for processing a substrate coated with a metal-containing resist composition, and contains an organic solvent, an organic acid and an additive, wherein the additive includes a chelating agent made of quercetin and / o...
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| creator | JO SU YEON HAH JUNG HWAN YANG JIN SEOK |
| description | A composition for processing a substrate of the present invention is a composition for processing a substrate coated with a metal-containing resist composition, and contains an organic solvent, an organic acid and an additive, wherein the additive includes a chelating agent made of quercetin and / or the derivatives thereof.
본 발명의 기판 처리 조성물은, 금속 함유 레지스트 조성물이 도포된 기판을 처리하기 위한 조성물로서, 유기 용매, 유기산 및 첨가제를 포함하며, 첨가제는 케르세틴 및/또는 그 유도체로 된 킬레이트제를 포함한다. |
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본 발명의 기판 처리 조성물은, 금속 함유 레지스트 조성물이 도포된 기판을 처리하기 위한 조성물로서, 유기 용매, 유기산 및 첨가제를 포함하며, 첨가제는 케르세틴 및/또는 그 유도체로 된 킬레이트제를 포함한다.</description><language>eng ; kor</language><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CANDLES ; CHEMISTRY ; CINEMATOGRAPHY ; DETERGENT COMPOSITIONS ; DETERGENTS ; ELECTROGRAPHY ; FATTY ACIDS THEREFROM ; HOLOGRAPHY ; MATERIALS THEREFOR ; METALLURGY ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; RECOVERY OF GLYCEROL ; RESIN SOAPS ; SOAP OR SOAP-MAKING ; USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231117&DB=EPODOC&CC=KR&NR=20230157675A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25551,76302</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231117&DB=EPODOC&CC=KR&NR=20230157675A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JO SU YEON</creatorcontrib><creatorcontrib>HAH JUNG HWAN</creatorcontrib><creatorcontrib>YANG JIN SEOK</creatorcontrib><title>Composition for processing the substrate and Method for processing the substrate using the same</title><description>A composition for processing a substrate of the present invention is a composition for processing a substrate coated with a metal-containing resist composition, and contains an organic solvent, an organic acid and an additive, wherein the additive includes a chelating agent made of quercetin and / or the derivatives thereof.
본 발명의 기판 처리 조성물은, 금속 함유 레지스트 조성물이 도포된 기판을 처리하기 위한 조성물로서, 유기 용매, 유기산 및 첨가제를 포함하며, 첨가제는 케르세틴 및/또는 그 유도체로 된 킬레이트제를 포함한다.</description><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CANDLES</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>DETERGENT COMPOSITIONS</subject><subject>DETERGENTS</subject><subject>ELECTROGRAPHY</subject><subject>FATTY ACIDS THEREFROM</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>RECOVERY OF GLYCEROL</subject><subject>RESIN SOAPS</subject><subject>SOAP OR SOAP-MAKING</subject><subject>USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZIh3zs8tyC_OLMnMz1NIyy9SKCjKT04tLs7MS1coyUhVKC5NKi4pSixJVUjMS1HwTS3JyE_Br64UIZaYm8rDwJqWmFOcyguluRmU3VxDnD10Uwvy41OLCxKTU_NSS-K9g4wMjIwNDE3NzcxNHY2JUwUAvtU-Rw</recordid><startdate>20231117</startdate><enddate>20231117</enddate><creator>JO SU YEON</creator><creator>HAH JUNG HWAN</creator><creator>YANG JIN SEOK</creator><scope>EVB</scope></search><sort><creationdate>20231117</creationdate><title>Composition for processing the substrate and Method for processing the substrate using the same</title><author>JO SU YEON ; HAH JUNG HWAN ; YANG JIN SEOK</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20230157675A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2023</creationdate><topic>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CANDLES</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>DETERGENT COMPOSITIONS</topic><topic>DETERGENTS</topic><topic>ELECTROGRAPHY</topic><topic>FATTY ACIDS THEREFROM</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>RECOVERY OF GLYCEROL</topic><topic>RESIN SOAPS</topic><topic>SOAP OR SOAP-MAKING</topic><topic>USE OF SINGLE SUBSTANCES AS DETERGENTS</topic><toplevel>online_resources</toplevel><creatorcontrib>JO SU YEON</creatorcontrib><creatorcontrib>HAH JUNG HWAN</creatorcontrib><creatorcontrib>YANG JIN SEOK</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>JO SU YEON</au><au>HAH JUNG HWAN</au><au>YANG JIN SEOK</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Composition for processing the substrate and Method for processing the substrate using the same</title><date>2023-11-17</date><risdate>2023</risdate><abstract>A composition for processing a substrate of the present invention is a composition for processing a substrate coated with a metal-containing resist composition, and contains an organic solvent, an organic acid and an additive, wherein the additive includes a chelating agent made of quercetin and / or the derivatives thereof.
본 발명의 기판 처리 조성물은, 금속 함유 레지스트 조성물이 도포된 기판을 처리하기 위한 조성물로서, 유기 용매, 유기산 및 첨가제를 포함하며, 첨가제는 케르세틴 및/또는 그 유도체로 된 킬레이트제를 포함한다.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng ; kor |
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| subjects | ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES APPARATUS SPECIALLY ADAPTED THEREFOR CANDLES CHEMISTRY CINEMATOGRAPHY DETERGENT COMPOSITIONS DETERGENTS ELECTROGRAPHY FATTY ACIDS THEREFROM HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RECOVERY OF GLYCEROL RESIN SOAPS SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS |
| title | Composition for processing the substrate and Method for processing the substrate using the same |
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