SUBSTRATE HEATING DEVICE AND APPARATUS FOR PROCESSING SUBSTRATE HAVING THE SAME

The present invention relates to a substrate heating device and a substrate processing apparatus having the same, and more specifically, to a substrate heating device used for heating a substrate and a substrate processing apparatus having the same. The substrate heating device according to an embod...

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Bibliographische Detailangaben
1. Verfasser: KEUM MIN JONG
Format: Patent
Sprache:eng ; kor
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