Hologram structure containing diffraction grating pattern and method of manufacturing thereof
The present invention relates to a holographic structure including a diffraction grating pattern and a manufacturing method thereof. One aspect of the invention includes a plurality of holographic elements. The holographic element includes a slit-shaped diffraction grid pattern formed with irregular...
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| creator | JEONG SANG GYUN JEON IN KYU |
| description | The present invention relates to a holographic structure including a diffraction grating pattern and a manufacturing method thereof. One aspect of the invention includes a plurality of holographic elements. The holographic element includes a slit-shaped diffraction grid pattern formed with irregularities on the surface. The diffraction grating pattern is one diffraction grating pattern selected from various patterns. When incident light is irradiated on the diffraction grating pattern, a holographic color is implemented, and the diffraction grating pattern and the implemented hologram color may correspond one-to-one.
본 발명은 회절격자무늬를 포함하는 홀로그램 구조체 및 이의 제조방법에 관한 것이다. 본 발명의 일 측면은 복수의 홀로그램 요소를 포함하고, 상기 홀로그램 요소는 표면에 요철로 이루어지는 슬릿 형태의 회절격자무늬가 형성되고, 상기 회절격자무늬는 다양한 패턴 중 선택되는 하나의 회절격자무늬이고, 상기 회절격자무늬에 입사광이 조사되면 홀로그램 색상이 구현되고, 상기 회절격자무늬와 상기 구현되는 홀로그램 색상은 일대일로 대응될 수 있다. |
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본 발명은 회절격자무늬를 포함하는 홀로그램 구조체 및 이의 제조방법에 관한 것이다. 본 발명의 일 측면은 복수의 홀로그램 요소를 포함하고, 상기 홀로그램 요소는 표면에 요철로 이루어지는 슬릿 형태의 회절격자무늬가 형성되고, 상기 회절격자무늬는 다양한 패턴 중 선택되는 하나의 회절격자무늬이고, 상기 회절격자무늬에 입사광이 조사되면 홀로그램 색상이 구현되고, 상기 회절격자무늬와 상기 구현되는 홀로그램 색상은 일대일로 대응될 수 있다.</description><language>eng ; kor</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHIC PROCESSES OR APPARATUS ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231023&DB=EPODOC&CC=KR&NR=20230147365A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231023&DB=EPODOC&CC=KR&NR=20230147365A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JEONG SANG GYUN</creatorcontrib><creatorcontrib>JEON IN KYU</creatorcontrib><title>Hologram structure containing diffraction grating pattern and method of manufacturing thereof</title><description>The present invention relates to a holographic structure including a diffraction grating pattern and a manufacturing method thereof. One aspect of the invention includes a plurality of holographic elements. The holographic element includes a slit-shaped diffraction grid pattern formed with irregularities on the surface. The diffraction grating pattern is one diffraction grating pattern selected from various patterns. When incident light is irradiated on the diffraction grating pattern, a holographic color is implemented, and the diffraction grating pattern and the implemented hologram color may correspond one-to-one.
본 발명은 회절격자무늬를 포함하는 홀로그램 구조체 및 이의 제조방법에 관한 것이다. 본 발명의 일 측면은 복수의 홀로그램 요소를 포함하고, 상기 홀로그램 요소는 표면에 요철로 이루어지는 슬릿 형태의 회절격자무늬가 형성되고, 상기 회절격자무늬는 다양한 패턴 중 선택되는 하나의 회절격자무늬이고, 상기 회절격자무늬에 입사광이 조사되면 홀로그램 색상이 구현되고, 상기 회절격자무늬와 상기 구현되는 홀로그램 색상은 일대일로 대응될 수 있다.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHIC PROCESSES OR APPARATUS</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNzLsKwkAQheFtLER9hwFrISZeahElYCe2EobNTLKQnVk2k_fXgA9gdeDn4yzdu9ZBu4wRRsuTtykTeBXDIEE6aANzRm9BBb7K5pbQjLIASguRrNcWlCGiTIzzwWysp0zKa7dgHEba_Hbltvfb61rvKGlDY0JPQtY8nmVRVsX-cK5Ox0v1n_oAe2Y-Ew</recordid><startdate>20231023</startdate><enddate>20231023</enddate><creator>JEONG SANG GYUN</creator><creator>JEON IN KYU</creator><scope>EVB</scope></search><sort><creationdate>20231023</creationdate><title>Hologram structure containing diffraction grating pattern and method of manufacturing thereof</title><author>JEONG SANG GYUN ; JEON IN KYU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20230147365A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2023</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHIC PROCESSES OR APPARATUS</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>JEONG SANG GYUN</creatorcontrib><creatorcontrib>JEON IN KYU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>JEONG SANG GYUN</au><au>JEON IN KYU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Hologram structure containing diffraction grating pattern and method of manufacturing thereof</title><date>2023-10-23</date><risdate>2023</risdate><abstract>The present invention relates to a holographic structure including a diffraction grating pattern and a manufacturing method thereof. One aspect of the invention includes a plurality of holographic elements. The holographic element includes a slit-shaped diffraction grid pattern formed with irregularities on the surface. The diffraction grating pattern is one diffraction grating pattern selected from various patterns. When incident light is irradiated on the diffraction grating pattern, a holographic color is implemented, and the diffraction grating pattern and the implemented hologram color may correspond one-to-one.
본 발명은 회절격자무늬를 포함하는 홀로그램 구조체 및 이의 제조방법에 관한 것이다. 본 발명의 일 측면은 복수의 홀로그램 요소를 포함하고, 상기 홀로그램 요소는 표면에 요철로 이루어지는 슬릿 형태의 회절격자무늬가 형성되고, 상기 회절격자무늬는 다양한 패턴 중 선택되는 하나의 회절격자무늬이고, 상기 회절격자무늬에 입사광이 조사되면 홀로그램 색상이 구현되고, 상기 회절격자무늬와 상기 구현되는 홀로그램 색상은 일대일로 대응될 수 있다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHIC PROCESSES OR APPARATUS HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Hologram structure containing diffraction grating pattern and method of manufacturing thereof |
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