낮은 유전 손실률을 갖는 폴리이미드

본 발명은 특정 플루오린화 디아민 모이어티(moiety)를 함유하는 신규한 폴리이미드 중합체에 관한 것으로, 상기 폴리이미드 중합체는 탁월한 유전 성능을 특징으로 한다. 본 발명은 또한 마이크로전자장치 용품에서의 중합체 조성물 중 상기 폴리이미드계(polyimide-based) 중합체의 용도에 관한 것이다. The present invention relates to novel polyimide polymers containing certain fluorinated diamine moieties, said polyimide polym...

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Bibliographische Detailangaben
Hauptverfasser:	BASSI MATTIA, BASAK DIPANKAR, NARDELE CHINMAY, SHINGTE RAHUL
Format:	Patent
Sprache:	kor
Schlagworte:	ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR CHEMICAL PAINT OR INK REMOVERS CHEMISTRY CINEMATOGRAPHY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS CORRECTING FLUIDS DYES ELECTROGRAPHY FILLING PASTES HOLOGRAPHY INKS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS THEREFOR WOODSTAINS
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