A Scrubber having a gas shielding sealing unit using a pressure difference

The embodiment relates to a scrubber. The scrubber according to the embodiment can include: a gas mixing unit; a plasma reaction chamber coupled to the lower side of the gas mixing unit; a cooling unit coupled to the lower side of the plasma reaction chamber; a first shielding flange mounted between...

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Bibliographische Detailangaben
Hauptverfasser:	LEE YOUNG CHUL, CHO JUN PYO, GONG BYEONG JUN, SONG KEUN YONG, SHIN SEUNG KYU, IM GYUNG CHEOL
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEPARATION TRANSPORTING
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Beschreibung
Zusammenfassung:	The embodiment relates to a scrubber. The scrubber according to the embodiment can include: a gas mixing unit; a plasma reaction chamber coupled to the lower side of the gas mixing unit; a cooling unit coupled to the lower side of the plasma reaction chamber; a first shielding flange mounted between the gas mixing unit and the plasma reaction chamber; and a first shield gas inlet mounted on the shielding flange. 실시예는 스크러버에 관한 것이다. 실시예에 따른 스크러버는, 가스 혼합부와, 상기 가스 혼합부 하측에 결합되는 플라즈마 반응 챔버와, 상기 플라즈마 반응 챔버 하측에 결합되는 냉각 유닛, 상기 가스 혼합부와 상기 플라즈마 반응 챔버 사이에 장착되는 제1 쉴딩 플랜지 및 상기 쉴딩 플랜지에 장착되는 제1 쉴드 가스 주입구를 포함할 수 있다.