Inline type deposition system

An inline type deposition system is disclosed, which can smoothly transport large-area substrates while preventing a substrate transport device from being contaminated with deposition materials. The inline type deposition system according to an aspect of the present invention includes: a deposition...

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Bibliographische Detailangaben
1. Verfasser: MIN KYOUNG HO
Format: Patent
Sprache:eng ; kor
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Beschreibung
Zusammenfassung:An inline type deposition system is disclosed, which can smoothly transport large-area substrates while preventing a substrate transport device from being contaminated with deposition materials. The inline type deposition system according to an aspect of the present invention includes: a deposition source provided in a deposition chamber and spraying a deposition material; a carrier supporting a substrate, on which the deposition material is deposited, and transported to a deposition space of the deposition chamber; a magnetic levitation module provided in the deposition chamber and connected to the carrier to support the carrier; and a blocking part provided in the deposition chamber and blocking the magnetic levitation module from the deposition space. 인라인 방식의 증착 시스템이 개시된다. 본 발명의 일 측면에 따른 인라인 방식의 증착 시스템은, 상기 증착 챔버에 구비되고, 증착 물질을 분사하는 증착 소스; 상기 증착 물질이 증착되는 기판을 지지하고, 상기 증착 챔버의 상기 증착 공간으로 이송되는 캐리어; 상기 증착 챔버에 구비되고, 상기 캐리어와 연결되어 상기 캐리어를 지지하는 자기부상 모듈; 및 상기 증착 챔버에 구비되고, 상기 자기부상 모듈을 상기 증착 공간과 차단시키는 차단부를 포함할 수 있다.