Mobile Type Exhauster for Semiconductor Production Apparatus
In order to be able to conveniently move and use the chamber wherever it is located and to effectively remove polluting gases from leaking out, a portable exhaust device for semiconductor manufacturing equipment is provided. The device includes: a box with wheels installed at the bottom; an exhaust...
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description | In order to be able to conveniently move and use the chamber wherever it is located and to effectively remove polluting gases from leaking out, a portable exhaust device for semiconductor manufacturing equipment is provided. The device includes: a box with wheels installed at the bottom; an exhaust pump installed inside the enclosure; an intake pipe which forms an intake passage and one end of which is connected to an exhaust pump, and an exhaust pipe which forms an exhaust passage and one end of which is connected to an exhaust pump; and an intake hood which is connected to the other end of the intake pipe and is formed and installed to perform intake around the opening of the chamber.
챔버가 위치하는 곳으로 편리하게 이동하고 다니면서 사용이 가능하고 오염가스가 외부로 유출되지 않게 효과적 으로 제거하는 것이 가능하도록, 하부에 바퀴가 설치되는 함체와, 함체의 내부에 설치되는 배기펌프와, 흡기통로 를 형성하고 한쪽 끝부분이 배기펌프에 연결 설치되는 흡기관과, 배기통로를 형성하고 한쪽 끝부분이 배기펌프에 연결 설치되는 배기관과, 흡기관의 다른쪽 끝부분에 연결 설치되고 챔버의 개구부 주위에서 흡기를 행하도록 형 성하여 설치되는 흡기후드를 포함하여 이루어지는 반도체 제조 장비용 이동식 배기장치를 제공한다. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20230132120A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20230132120A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20230132120A3</originalsourceid><addsrcrecordid>eNrjZLDxzU_KzElVCKksSFVwrchILC0uSS1SSMsvUghOzc1Mzs9LKU0uAfICivJBrMz8PAXHgoLEosSS0mIeBta0xJziVF4ozc2g7OYa4uyhm1qQH59aXJCYnJqXWhLvHWRkYGRsYGhsZGhk4GhMnCoAuF0w0A</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Mobile Type Exhauster for Semiconductor Production Apparatus</title><source>esp@cenet</source><creator>CHO SUNG CHEOL</creator><creatorcontrib>CHO SUNG CHEOL</creatorcontrib><description>In order to be able to conveniently move and use the chamber wherever it is located and to effectively remove polluting gases from leaking out, a portable exhaust device for semiconductor manufacturing equipment is provided. The device includes: a box with wheels installed at the bottom; an exhaust pump installed inside the enclosure; an intake pipe which forms an intake passage and one end of which is connected to an exhaust pump, and an exhaust pipe which forms an exhaust passage and one end of which is connected to an exhaust pump; and an intake hood which is connected to the other end of the intake pipe and is formed and installed to perform intake around the opening of the chamber.
챔버가 위치하는 곳으로 편리하게 이동하고 다니면서 사용이 가능하고 오염가스가 외부로 유출되지 않게 효과적 으로 제거하는 것이 가능하도록, 하부에 바퀴가 설치되는 함체와, 함체의 내부에 설치되는 배기펌프와, 흡기통로 를 형성하고 한쪽 끝부분이 배기펌프에 연결 설치되는 흡기관과, 배기통로를 형성하고 한쪽 끝부분이 배기펌프에 연결 설치되는 배기관과, 흡기관의 다른쪽 끝부분에 연결 설치되고 챔버의 개구부 주위에서 흡기를 행하도록 형 성하여 설치되는 흡기후드를 포함하여 이루어지는 반도체 제조 장비용 이동식 배기장치를 제공한다.</description><language>eng ; kor</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230915&DB=EPODOC&CC=KR&NR=20230132120A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230915&DB=EPODOC&CC=KR&NR=20230132120A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHO SUNG CHEOL</creatorcontrib><title>Mobile Type Exhauster for Semiconductor Production Apparatus</title><description>In order to be able to conveniently move and use the chamber wherever it is located and to effectively remove polluting gases from leaking out, a portable exhaust device for semiconductor manufacturing equipment is provided. The device includes: a box with wheels installed at the bottom; an exhaust pump installed inside the enclosure; an intake pipe which forms an intake passage and one end of which is connected to an exhaust pump, and an exhaust pipe which forms an exhaust passage and one end of which is connected to an exhaust pump; and an intake hood which is connected to the other end of the intake pipe and is formed and installed to perform intake around the opening of the chamber.
챔버가 위치하는 곳으로 편리하게 이동하고 다니면서 사용이 가능하고 오염가스가 외부로 유출되지 않게 효과적 으로 제거하는 것이 가능하도록, 하부에 바퀴가 설치되는 함체와, 함체의 내부에 설치되는 배기펌프와, 흡기통로 를 형성하고 한쪽 끝부분이 배기펌프에 연결 설치되는 흡기관과, 배기통로를 형성하고 한쪽 끝부분이 배기펌프에 연결 설치되는 배기관과, 흡기관의 다른쪽 끝부분에 연결 설치되고 챔버의 개구부 주위에서 흡기를 행하도록 형 성하여 설치되는 흡기후드를 포함하여 이루어지는 반도체 제조 장비용 이동식 배기장치를 제공한다.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLDxzU_KzElVCKksSFVwrchILC0uSS1SSMsvUghOzc1Mzs9LKU0uAfICivJBrMz8PAXHgoLEosSS0mIeBta0xJziVF4ozc2g7OYa4uyhm1qQH59aXJCYnJqXWhLvHWRkYGRsYGhsZGhk4GhMnCoAuF0w0A</recordid><startdate>20230915</startdate><enddate>20230915</enddate><creator>CHO SUNG CHEOL</creator><scope>EVB</scope></search><sort><creationdate>20230915</creationdate><title>Mobile Type Exhauster for Semiconductor Production Apparatus</title><author>CHO SUNG CHEOL</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20230132120A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2023</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>CHO SUNG CHEOL</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHO SUNG CHEOL</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Mobile Type Exhauster for Semiconductor Production Apparatus</title><date>2023-09-15</date><risdate>2023</risdate><abstract>In order to be able to conveniently move and use the chamber wherever it is located and to effectively remove polluting gases from leaking out, a portable exhaust device for semiconductor manufacturing equipment is provided. The device includes: a box with wheels installed at the bottom; an exhaust pump installed inside the enclosure; an intake pipe which forms an intake passage and one end of which is connected to an exhaust pump, and an exhaust pipe which forms an exhaust passage and one end of which is connected to an exhaust pump; and an intake hood which is connected to the other end of the intake pipe and is formed and installed to perform intake around the opening of the chamber.
챔버가 위치하는 곳으로 편리하게 이동하고 다니면서 사용이 가능하고 오염가스가 외부로 유출되지 않게 효과적 으로 제거하는 것이 가능하도록, 하부에 바퀴가 설치되는 함체와, 함체의 내부에 설치되는 배기펌프와, 흡기통로 를 형성하고 한쪽 끝부분이 배기펌프에 연결 설치되는 흡기관과, 배기통로를 형성하고 한쪽 끝부분이 배기펌프에 연결 설치되는 배기관과, 흡기관의 다른쪽 끝부분에 연결 설치되고 챔버의 개구부 주위에서 흡기를 행하도록 형 성하여 설치되는 흡기후드를 포함하여 이루어지는 반도체 제조 장비용 이동식 배기장치를 제공한다.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
title | Mobile Type Exhauster for Semiconductor Production Apparatus |
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