APPARATUS AND METHOD FOR TREATING FLUID
The present invention relates to an apparatus and method for treating liquid (4). The present apparatus comprises a first water tank for accommodating the liquid (4) and a second water tank for accommodating the liquid (4). The second water tank is disposed lower than the first water tank in the dir...
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| creator | NESME ANUHAR OSORIO DELGADO ANTONIO CHO MANGI HOHAGEN HANS |
| description | The present invention relates to an apparatus and method for treating liquid (4). The present apparatus comprises a first water tank for accommodating the liquid (4) and a second water tank for accommodating the liquid (4). The second water tank is disposed lower than the first water tank in the direction of gravity. The first water tank is connected to the second water tank via at least one line device (6). The liquid (4) is supplied from the first tank to the second tank via the line device (6). The line device (6) forms at least one channel through which a liquid connection is formed between the first water tank and the second water tank. The liquid (4) is delivered through a channel to the second water tank at least under the action of gravity and centrifugal force.
본 발명은 액체(4)를 처리하기 위한 장치 및 방법에 관한 것이다. 본 장치는 액체(4)를 수용하기 위한 제1 수조와 액체(4)를 수용하기 위한 제2 수조를 포함한다. 제2 수조는 중력 방향으로 제1 수조보다 더 낮게 배치된다. 제1 수조는 적어도 하나의 라인 장치(6)를 통해 제2 수조와 연결된다. 라인 장치(6)를 통해 액체(4)가 제1 수조로부터 제2 수조에 공급된다. 라인 장치(6)는 적어도 하나의 채널을 형성하고, 이를 통해 제1 수조와 제2 수조 사이에 액체 연결이 형성된다. 액체(4)는 적어도 중력과 원심력의 작용하에 채널을 통해 제2 수조로 전달된다. |
| format | Patent |
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본 발명은 액체(4)를 처리하기 위한 장치 및 방법에 관한 것이다. 본 장치는 액체(4)를 수용하기 위한 제1 수조와 액체(4)를 수용하기 위한 제2 수조를 포함한다. 제2 수조는 중력 방향으로 제1 수조보다 더 낮게 배치된다. 제1 수조는 적어도 하나의 라인 장치(6)를 통해 제2 수조와 연결된다. 라인 장치(6)를 통해 액체(4)가 제1 수조로부터 제2 수조에 공급된다. 라인 장치(6)는 적어도 하나의 채널을 형성하고, 이를 통해 제1 수조와 제2 수조 사이에 액체 연결이 형성된다. 액체(4)는 적어도 중력과 원심력의 작용하에 채널을 통해 제2 수조로 전달된다.</description><language>eng ; kor</language><subject>CHEMISTRY ; METALLURGY ; MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; TRANSPORTING ; TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230911&DB=EPODOC&CC=KR&NR=20230129910A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230911&DB=EPODOC&CC=KR&NR=20230129910A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NESME ANUHAR OSORIO</creatorcontrib><creatorcontrib>DELGADO ANTONIO</creatorcontrib><creatorcontrib>CHO MANGI</creatorcontrib><creatorcontrib>HOHAGEN HANS</creatorcontrib><title>APPARATUS AND METHOD FOR TREATING FLUID</title><description>The present invention relates to an apparatus and method for treating liquid (4). The present apparatus comprises a first water tank for accommodating the liquid (4) and a second water tank for accommodating the liquid (4). The second water tank is disposed lower than the first water tank in the direction of gravity. The first water tank is connected to the second water tank via at least one line device (6). The liquid (4) is supplied from the first tank to the second tank via the line device (6). The line device (6) forms at least one channel through which a liquid connection is formed between the first water tank and the second water tank. The liquid (4) is delivered through a channel to the second water tank at least under the action of gravity and centrifugal force.
본 발명은 액체(4)를 처리하기 위한 장치 및 방법에 관한 것이다. 본 장치는 액체(4)를 수용하기 위한 제1 수조와 액체(4)를 수용하기 위한 제2 수조를 포함한다. 제2 수조는 중력 방향으로 제1 수조보다 더 낮게 배치된다. 제1 수조는 적어도 하나의 라인 장치(6)를 통해 제2 수조와 연결된다. 라인 장치(6)를 통해 액체(4)가 제1 수조로부터 제2 수조에 공급된다. 라인 장치(6)는 적어도 하나의 채널을 형성하고, 이를 통해 제1 수조와 제2 수조 사이에 액체 연결이 형성된다. 액체(4)는 적어도 중력과 원심력의 작용하에 채널을 통해 제2 수조로 전달된다.</description><subject>CHEMISTRY</subject><subject>METALLURGY</subject><subject>MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>TRANSPORTING</subject><subject>TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFB3DAhwDHIMCQ1WcPRzUfB1DfHwd1Fw8w9SCAlydQzx9HNXcPMJ9XThYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXx3kFGBkbGBoZGlpaGBo7GxKkCAGN_JII</recordid><startdate>20230911</startdate><enddate>20230911</enddate><creator>NESME ANUHAR OSORIO</creator><creator>DELGADO ANTONIO</creator><creator>CHO MANGI</creator><creator>HOHAGEN HANS</creator><scope>EVB</scope></search><sort><creationdate>20230911</creationdate><title>APPARATUS AND METHOD FOR TREATING FLUID</title><author>NESME ANUHAR OSORIO ; DELGADO ANTONIO ; CHO MANGI ; HOHAGEN HANS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20230129910A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2023</creationdate><topic>CHEMISTRY</topic><topic>METALLURGY</topic><topic>MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>TRANSPORTING</topic><topic>TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE</topic><toplevel>online_resources</toplevel><creatorcontrib>NESME ANUHAR OSORIO</creatorcontrib><creatorcontrib>DELGADO ANTONIO</creatorcontrib><creatorcontrib>CHO MANGI</creatorcontrib><creatorcontrib>HOHAGEN HANS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NESME ANUHAR OSORIO</au><au>DELGADO ANTONIO</au><au>CHO MANGI</au><au>HOHAGEN HANS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>APPARATUS AND METHOD FOR TREATING FLUID</title><date>2023-09-11</date><risdate>2023</risdate><abstract>The present invention relates to an apparatus and method for treating liquid (4). The present apparatus comprises a first water tank for accommodating the liquid (4) and a second water tank for accommodating the liquid (4). The second water tank is disposed lower than the first water tank in the direction of gravity. The first water tank is connected to the second water tank via at least one line device (6). The liquid (4) is supplied from the first tank to the second tank via the line device (6). The line device (6) forms at least one channel through which a liquid connection is formed between the first water tank and the second water tank. The liquid (4) is delivered through a channel to the second water tank at least under the action of gravity and centrifugal force.
본 발명은 액체(4)를 처리하기 위한 장치 및 방법에 관한 것이다. 본 장치는 액체(4)를 수용하기 위한 제1 수조와 액체(4)를 수용하기 위한 제2 수조를 포함한다. 제2 수조는 중력 방향으로 제1 수조보다 더 낮게 배치된다. 제1 수조는 적어도 하나의 라인 장치(6)를 통해 제2 수조와 연결된다. 라인 장치(6)를 통해 액체(4)가 제1 수조로부터 제2 수조에 공급된다. 라인 장치(6)는 적어도 하나의 채널을 형성하고, 이를 통해 제1 수조와 제2 수조 사이에 액체 연결이 형성된다. 액체(4)는 적어도 중력과 원심력의 작용하에 채널을 통해 제2 수조로 전달된다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMISTRY METALLURGY MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL TRANSPORTING TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE |
| title | APPARATUS AND METHOD FOR TREATING FLUID |
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