SUBSTRATE PROCESSING APPARATUS SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM

The present invention provides a substrate processing apparatus, which can coat a substrate with a coating liquid with high convenience. A resist coating device (1) includes: a spin chuck (12a) which holds, supports, and rotates a substrate (W); a cup (21a) which is arranged to surround the substrat...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	KAJIWARA HIDEKI, MIZUSHINO. SHINICHI, MATSUURA KAZUHIRO, TOYOZAWA AKIHIRO, SHIGEMOTO HOKUTO, SAKAI YUJI, KUNUGIMOTO YUICHIRO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The present invention provides a substrate processing apparatus, which can coat a substrate with a coating liquid with high convenience. A resist coating device (1) includes: a spin chuck (12a) which holds, supports, and rotates a substrate (W); a cup (21a) which is arranged to surround the substrate (W) held and supported by the spin chuck (12a); and coating liquid nozzles (41) which can inject a coating liquid onto the substrate (W). In addition, the resist coating device (1) comprises: a removal liquid nozzle (50a); and a nozzle tracking camera (60) installed on a nozzle arm (133) that holds and supports the coating liquid nozzles (41), moving to follow the coating liquid nozzles (41), and configured to capture an image of the coating liquid nozzles (41). In addition, the resist coating device (1) comprises a processing space camera configured to capture an image of a processing space on the spin chuck (12a). 본 발명은, 기판에 대한 도포액의 도포에 관해서, 편리성이 높은 기판 처리 장치를 제공하는 것이다. 레지스트 도포 장치(1)는, 기판(W)을 보유 지지해서 회전시키는 스핀 척(12a)과, 스핀 척(12a)에 보유 지지된 기판(W)을 둘러싸도록 해서 배치된 컵(21a)과, 기판(W)에 대하여 도포액을 토출 가능하게 구성된 도포액 노즐(41)을 구비한다. 또한, 레지스트 도포 장치(1)는, 제거액 노즐(50a)과, 도포액 노즐(41)을 보유 지지하는 노즐 암(133)에 설치됨으로써 도포액 노즐(41)에 추종해서 이동하여, 도포액 노즐(41)을 촬상 가능하게 구성된 노즐 추종 카메라(60)를 구비한다. 또한, 레지스트 도포 장치(1)는, 스핀 척(12a) 상의 처리 공간을 촬상 가능하게 구성된 처리 공간용 카메라를 구비한다.