COATING TREATMENT APPARATUS COATING TREATMENT METHOD AND STORAGE MEDIUM
Provided is a technique capable of accurately detecting a coating treatment defect. A coating treatment apparatus according to an aspect of the present disclosure includes a carriage, a substrate holder, a line sensor, and a light source. The carriage has a plurality of discharge heads for dischargi...
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| creator | SAGARA NORIHIDE MIYAZAKI FUMIHIRO ONOUE KOUTAROU |
| description | Provided is a technique capable of accurately detecting a coating treatment defect. A coating treatment apparatus according to an aspect of the present disclosure includes a carriage, a substrate holder, a line sensor, and a light source. The carriage has a plurality of discharge heads for discharging functional liquid to a substrate. The substrate holder holds the substrate and is capable of moving the substrate relative to the carriage. The line sensor images the substrate and is wider than the substrate. The light source has an elongated shape and irradiates an imaging region of the line sensor with light. An angle formed by an optical axis of the line sensor and a surface of the substrate is smaller than an angle formed by an optical axis of the light source and the surface of the substrate.
[과제] 도포 처리의 불량을 정밀도 양호하게 검출할 수 있는 기술을 제공한다. [해결 수단] 본 개시의 일 태양에 의한 도포 처리 장치는 캐리지와, 기판 보지부와, 라인 센서와, 광원을 구비한다. 캐리지는 기판에 대해 기능액을 토출하는 복수의 토출 헤드를 갖는다. 기판 보지부는 기판을 보지하고, 캐리지에 대해 기판을 상대 이동 가능하다. 라인 센서는 기판을 촬상하며, 기판보다 광폭이다. 광원은 장척형상이며, 라인 센서의 촬상 영역에 광을 조사한다. 또한, 라인 센서의 광축과 기판의 표면이 이루는 각도는, 광원의 광축과 기판의 표면이 이루는 각도보다 작다. |
| format | Patent |
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[과제] 도포 처리의 불량을 정밀도 양호하게 검출할 수 있는 기술을 제공한다. [해결 수단] 본 개시의 일 태양에 의한 도포 처리 장치는 캐리지와, 기판 보지부와, 라인 센서와, 광원을 구비한다. 캐리지는 기판에 대해 기능액을 토출하는 복수의 토출 헤드를 갖는다. 기판 보지부는 기판을 보지하고, 캐리지에 대해 기판을 상대 이동 가능하다. 라인 센서는 기판을 촬상하며, 기판보다 광폭이다. 광원은 장척형상이며, 라인 센서의 촬상 영역에 광을 조사한다. 또한, 라인 센서의 광축과 기판의 표면이 이루는 각도는, 광원의 광축과 기판의 표면이 이루는 각도보다 작다.</description><language>eng ; kor</language><subject>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; PERFORMING OPERATIONS ; SEMICONDUCTOR DEVICES ; SPRAYING OR ATOMISING IN GENERAL ; TRANSPORTING</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230720&DB=EPODOC&CC=KR&NR=20230109555A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230720&DB=EPODOC&CC=KR&NR=20230109555A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SAGARA NORIHIDE</creatorcontrib><creatorcontrib>MIYAZAKI FUMIHIRO</creatorcontrib><creatorcontrib>ONOUE KOUTAROU</creatorcontrib><title>COATING TREATMENT APPARATUS COATING TREATMENT METHOD AND STORAGE MEDIUM</title><description>Provided is a technique capable of accurately detecting a coating treatment defect. A coating treatment apparatus according to an aspect of the present disclosure includes a carriage, a substrate holder, a line sensor, and a light source. The carriage has a plurality of discharge heads for discharging functional liquid to a substrate. The substrate holder holds the substrate and is capable of moving the substrate relative to the carriage. The line sensor images the substrate and is wider than the substrate. The light source has an elongated shape and irradiates an imaging region of the line sensor with light. An angle formed by an optical axis of the line sensor and a surface of the substrate is smaller than an angle formed by an optical axis of the light source and the surface of the substrate.
[과제] 도포 처리의 불량을 정밀도 양호하게 검출할 수 있는 기술을 제공한다. [해결 수단] 본 개시의 일 태양에 의한 도포 처리 장치는 캐리지와, 기판 보지부와, 라인 센서와, 광원을 구비한다. 캐리지는 기판에 대해 기능액을 토출하는 복수의 토출 헤드를 갖는다. 기판 보지부는 기판을 보지하고, 캐리지에 대해 기판을 상대 이동 가능하다. 라인 센서는 기판을 촬상하며, 기판보다 광폭이다. 광원은 장척형상이며, 라인 센서의 촬상 영역에 광을 조사한다. 또한, 라인 센서의 광축과 기판의 표면이 이루는 각도는, 광원의 광축과 기판의 표면이 이루는 각도보다 작다.</description><subject>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</subject><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>PERFORMING OPERATIONS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHB39ncM8fRzVwgJcnUM8XX1C1FwDAhwDHIMCQ1WwJTzdQ3x8HdRcPRzUQgO8Q9ydHcFCrl4hvryMLCmJeYUp_JCaW4GZTfXEGcP3dSC_PjU4oLE5NS81JJ47yAjAyNjA0MDS1NTU0dj4lQBAKRILZc</recordid><startdate>20230720</startdate><enddate>20230720</enddate><creator>SAGARA NORIHIDE</creator><creator>MIYAZAKI FUMIHIRO</creator><creator>ONOUE KOUTAROU</creator><scope>EVB</scope></search><sort><creationdate>20230720</creationdate><title>COATING TREATMENT APPARATUS COATING TREATMENT METHOD AND STORAGE MEDIUM</title><author>SAGARA NORIHIDE ; MIYAZAKI FUMIHIRO ; ONOUE KOUTAROU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20230109555A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2023</creationdate><topic>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</topic><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>PERFORMING OPERATIONS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>SAGARA NORIHIDE</creatorcontrib><creatorcontrib>MIYAZAKI FUMIHIRO</creatorcontrib><creatorcontrib>ONOUE KOUTAROU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SAGARA NORIHIDE</au><au>MIYAZAKI FUMIHIRO</au><au>ONOUE KOUTAROU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>COATING TREATMENT APPARATUS COATING TREATMENT METHOD AND STORAGE MEDIUM</title><date>2023-07-20</date><risdate>2023</risdate><abstract>Provided is a technique capable of accurately detecting a coating treatment defect. A coating treatment apparatus according to an aspect of the present disclosure includes a carriage, a substrate holder, a line sensor, and a light source. The carriage has a plurality of discharge heads for discharging functional liquid to a substrate. The substrate holder holds the substrate and is capable of moving the substrate relative to the carriage. The line sensor images the substrate and is wider than the substrate. The light source has an elongated shape and irradiates an imaging region of the line sensor with light. An angle formed by an optical axis of the line sensor and a surface of the substrate is smaller than an angle formed by an optical axis of the light source and the surface of the substrate.
[과제] 도포 처리의 불량을 정밀도 양호하게 검출할 수 있는 기술을 제공한다. [해결 수단] 본 개시의 일 태양에 의한 도포 처리 장치는 캐리지와, 기판 보지부와, 라인 센서와, 광원을 구비한다. 캐리지는 기판에 대해 기능액을 토출하는 복수의 토출 헤드를 갖는다. 기판 보지부는 기판을 보지하고, 캐리지에 대해 기판을 상대 이동 가능하다. 라인 센서는 기판을 촬상하며, 기판보다 광폭이다. 광원은 장척형상이며, 라인 센서의 촬상 영역에 광을 조사한다. 또한, 라인 센서의 광축과 기판의 표면이 이루는 각도는, 광원의 광축과 기판의 표면이 이루는 각도보다 작다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING |
| title | COATING TREATMENT APPARATUS COATING TREATMENT METHOD AND STORAGE MEDIUM |
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