PHOTO-CURABLE COMPOSITION WITH ENHANCED PATTERN FORMATION
One embodiment of the present invention is to provide: a photosensitive composition which includes a cardo-based compound with three or more reactive groups in a cardo-based core with many aryl groups, so that high photosensitivity is achieved, and phenomena such as undercutting at the bottom of the...
Gespeichert in:
| Hauptverfasser: | , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; kor |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | SEO HANWOOK JEON SEO JEONG KIM JUN KI LEE CHANG UK KO YUN JONG CHANGMIN LEE LEE SUN HEE |
| description | One embodiment of the present invention is to provide: a photosensitive composition which includes a cardo-based compound with three or more reactive groups in a cardo-based core with many aryl groups, so that high photosensitivity is achieved, and phenomena such as undercutting at the bottom of the pattern do not occur during the development stage, resulting in a high-resolution and highly reliable cured pattern; and an organic light emitting display device using the same.
본 발명의 일 실시예는 아릴기가 많은 카도계 코어에 반응기가 3개 이상 있는 카도계 화합물을 포함함으로써, 높은 광감도를 갖게 되고, 현상 단계에서 패턴 하부 언더컷과 같은 현상이 일어나지 않아서 높은 해상도 및 높은 신뢰성의 경화 패턴이 구현되는 감광성 조성물 및 이를 적용한 유기발광 표시장치를 제공하기 위한 것이다. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20230107053A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20230107053A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20230107053A3</originalsourceid><addsrcrecordid>eNrjZLAM8PAP8dd1Dg1ydPJxVXD29w3wD_YM8fT3Uwj3DPFQcPXzcPRzdnVRCHAMCXEN8lNw8w_ydQTJ8zCwpiXmFKfyQmluBmU31xBnD93Ugvz41OKCxOTUvNSSeO8gIwMjYwNDA3MDU2NHY-JUAQBPUSnS</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PHOTO-CURABLE COMPOSITION WITH ENHANCED PATTERN FORMATION</title><source>esp@cenet</source><creator>SEO HANWOOK ; JEON SEO JEONG ; KIM JUN KI ; LEE CHANG UK ; KO YUN JONG ; CHANGMIN LEE ; LEE SUN HEE</creator><creatorcontrib>SEO HANWOOK ; JEON SEO JEONG ; KIM JUN KI ; LEE CHANG UK ; KO YUN JONG ; CHANGMIN LEE ; LEE SUN HEE</creatorcontrib><description>One embodiment of the present invention is to provide: a photosensitive composition which includes a cardo-based compound with three or more reactive groups in a cardo-based core with many aryl groups, so that high photosensitivity is achieved, and phenomena such as undercutting at the bottom of the pattern do not occur during the development stage, resulting in a high-resolution and highly reliable cured pattern; and an organic light emitting display device using the same.
본 발명의 일 실시예는 아릴기가 많은 카도계 코어에 반응기가 3개 이상 있는 카도계 화합물을 포함함으로써, 높은 광감도를 갖게 되고, 현상 단계에서 패턴 하부 언더컷과 같은 현상이 일어나지 않아서 높은 해상도 및 높은 신뢰성의 경화 패턴이 구현되는 감광성 조성물 및 이를 적용한 유기발광 표시장치를 제공하기 위한 것이다.</description><language>eng ; kor</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230714&DB=EPODOC&CC=KR&NR=20230107053A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230714&DB=EPODOC&CC=KR&NR=20230107053A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SEO HANWOOK</creatorcontrib><creatorcontrib>JEON SEO JEONG</creatorcontrib><creatorcontrib>KIM JUN KI</creatorcontrib><creatorcontrib>LEE CHANG UK</creatorcontrib><creatorcontrib>KO YUN JONG</creatorcontrib><creatorcontrib>CHANGMIN LEE</creatorcontrib><creatorcontrib>LEE SUN HEE</creatorcontrib><title>PHOTO-CURABLE COMPOSITION WITH ENHANCED PATTERN FORMATION</title><description>One embodiment of the present invention is to provide: a photosensitive composition which includes a cardo-based compound with three or more reactive groups in a cardo-based core with many aryl groups, so that high photosensitivity is achieved, and phenomena such as undercutting at the bottom of the pattern do not occur during the development stage, resulting in a high-resolution and highly reliable cured pattern; and an organic light emitting display device using the same.
본 발명의 일 실시예는 아릴기가 많은 카도계 코어에 반응기가 3개 이상 있는 카도계 화합물을 포함함으로써, 높은 광감도를 갖게 되고, 현상 단계에서 패턴 하부 언더컷과 같은 현상이 일어나지 않아서 높은 해상도 및 높은 신뢰성의 경화 패턴이 구현되는 감광성 조성물 및 이를 적용한 유기발광 표시장치를 제공하기 위한 것이다.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLAM8PAP8dd1Dg1ydPJxVXD29w3wD_YM8fT3Uwj3DPFQcPXzcPRzdnVRCHAMCXEN8lNw8w_ydQTJ8zCwpiXmFKfyQmluBmU31xBnD93Ugvz41OKCxOTUvNSSeO8gIwMjYwNDA3MDU2NHY-JUAQBPUSnS</recordid><startdate>20230714</startdate><enddate>20230714</enddate><creator>SEO HANWOOK</creator><creator>JEON SEO JEONG</creator><creator>KIM JUN KI</creator><creator>LEE CHANG UK</creator><creator>KO YUN JONG</creator><creator>CHANGMIN LEE</creator><creator>LEE SUN HEE</creator><scope>EVB</scope></search><sort><creationdate>20230714</creationdate><title>PHOTO-CURABLE COMPOSITION WITH ENHANCED PATTERN FORMATION</title><author>SEO HANWOOK ; JEON SEO JEONG ; KIM JUN KI ; LEE CHANG UK ; KO YUN JONG ; CHANGMIN LEE ; LEE SUN HEE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20230107053A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2023</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>SEO HANWOOK</creatorcontrib><creatorcontrib>JEON SEO JEONG</creatorcontrib><creatorcontrib>KIM JUN KI</creatorcontrib><creatorcontrib>LEE CHANG UK</creatorcontrib><creatorcontrib>KO YUN JONG</creatorcontrib><creatorcontrib>CHANGMIN LEE</creatorcontrib><creatorcontrib>LEE SUN HEE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SEO HANWOOK</au><au>JEON SEO JEONG</au><au>KIM JUN KI</au><au>LEE CHANG UK</au><au>KO YUN JONG</au><au>CHANGMIN LEE</au><au>LEE SUN HEE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTO-CURABLE COMPOSITION WITH ENHANCED PATTERN FORMATION</title><date>2023-07-14</date><risdate>2023</risdate><abstract>One embodiment of the present invention is to provide: a photosensitive composition which includes a cardo-based compound with three or more reactive groups in a cardo-based core with many aryl groups, so that high photosensitivity is achieved, and phenomena such as undercutting at the bottom of the pattern do not occur during the development stage, resulting in a high-resolution and highly reliable cured pattern; and an organic light emitting display device using the same.
본 발명의 일 실시예는 아릴기가 많은 카도계 코어에 반응기가 3개 이상 있는 카도계 화합물을 포함함으로써, 높은 광감도를 갖게 되고, 현상 단계에서 패턴 하부 언더컷과 같은 현상이 일어나지 않아서 높은 해상도 및 높은 신뢰성의 경화 패턴이 구현되는 감광성 조성물 및 이를 적용한 유기발광 표시장치를 제공하기 위한 것이다.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; kor |
| recordid | cdi_epo_espacenet_KR20230107053A |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | PHOTO-CURABLE COMPOSITION WITH ENHANCED PATTERN FORMATION |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-25T14%3A51%3A15IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SEO%20HANWOOK&rft.date=2023-07-14&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EKR20230107053A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |