Apparatus and Method for treating substrate
The purpose of the present invention is to prevent tank explosion due to backfire in the event of fire when exhausting the atmosphere in a processing space. According to the present invention as described above, there is an effect of preventing explosion due to fire by separating the exhaust duct of...
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| Hauptverfasser: | , |
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| Format: | Patent |
| Sprache: | eng ; kor |
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| Zusammenfassung: | The purpose of the present invention is to prevent tank explosion due to backfire in the event of fire when exhausting the atmosphere in a processing space. According to the present invention as described above, there is an effect of preventing explosion due to fire by separating the exhaust duct of a processing unit and the exhaust duct of a processing liquid tank. A substrate processing apparatus includes: a liquid handling unit; and a liquid supply unit.
본 발명은, 처리 공간 내에 분위기를 배기할 때, 화재 발생시 역화로 인한 탱크 폭발을 방지하는 것을 목적으로 한다. 상기와 같은 본 발명에 따르면, 처리 유닛의 배기 덕트와 처리액 탱크 배기 덕트를 분리하여 화재로 인한 폭발을 방지할 수 있는 효과가 있다. |
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