감광성 엘리먼트, 및 레지스트 패턴의 형성 방법

지지 필름 (A), 감광성 수지 조성물층 (B) 를 이 순서로 갖는 감광성 엘리먼트로서, ISO 25178 에서 규정되는, 상기 지지 필름 (A) 의 상기 감광성 수지 조성물층 (B) 와 접하는 측의 계면의 전개 면적비 SdrA2 (％), 반대측의 계면의 전개 면적비 SdrA1 (％) 이, 식 (1) : SdrA1/SdrA2 ＜ 0.75 (1) 를 만족한다. A photosensitive element including, in this order, a support film (A) and a photosensitive resin c...

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1. Verfasser:	YANAGI SHOTA
Format:	Patent
Sprache:	kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTED CIRCUITS THEIR PREPARATION OR CHEMICAL WORKING-UP
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