METHOD FOR INHIBITING FORMABLE MATERIAL EVAPORATION SYSTEM FOR INHIBITING EVAPORATION AND METHOD OF MAKING AN ARTICLE

The present invention relates to a method for inhibiting the evaporation of a formable material on a substrate. The method comprises the steps of: holding a substrate with a substrate chuck, wherein the substrate chuck is positioned within a central opening of a frame such that the frame surrounds a...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	FLETCHER EDWARD BRIAN, CONE CRAIG WILLIAM, SHACKLETON STEVEN C, YE ZHENGMAO, KONDO HIROYUKI
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The present invention relates to a method for inhibiting the evaporation of a formable material on a substrate. The method comprises the steps of: holding a substrate with a substrate chuck, wherein the substrate chuck is positioned within a central opening of a frame such that the frame surrounds at least a part of the substrate chuck; supplying a formable material or a volatile material different from the formable material to a part of the frame surrounding the substrate chuck; and dispensing the formable material on the substrate. 기판 상의 성형가능 재료의 증발을 억제하는 방법이며, 방법은 기판 척으로 기판을 보유지지하는 단계로서, 기판 척은 프레임이 기판 척의 적어도 일부를 둘러싸도록 프레임의 중앙 개구 내에 위치결정되는, 기판을 보유지지하는 단계, 기판 척을 둘러싸는 프레임의 일부에 성형가능 재료 또는 성형가능 재료와는 상이한 휘발성 재료를 공급하는 단계, 및 기판 상에 성형가능 재료를 분배하는 단계를 포함하는 방법.