PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER
The description relates to a photosensitive resin composition, a photosensitive resin film manufactured using the same, and a color filter. Specifically, one embodiment provides a photosensitive resin composition including: (A) a photopolymerizable compound; (B) a photopolymerization initiator; (C)...
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| creator | KIM JIHONG KIM JIHYE KIM SABINA SONG HAENI YOO JEONGHO PARK BAEK SOUNG |
| description | The description relates to a photosensitive resin composition, a photosensitive resin film manufactured using the same, and a color filter. Specifically, one embodiment provides a photosensitive resin composition including: (A) a photopolymerizable compound; (B) a photopolymerization initiator; (C) a colorant; (D) a binder resin; and (E) a solvent, wherein the solvent includes a first solvent and a second solvent, the first solvent has a boiling point of less than 150℃ (but more than 0℃) under 1 atm, the second solvent has a boiling point of 150℃ or more under 1 atm, and the first solvent has a higher content than the second solvent.
본 기재는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러 필터에 관한 것이다. 구체적으로, 일 구현예는 (A) 광중합성 화합물; (B) 광중합 개시제; (C) 착색제; (D) 바인더 수지; 및 (E) 용매를 포함하고, 상기 용매는 제1 용매 및 제2 용매를 포함하고, 상기 제1 용매는 1 atm 하에서 150 ℃ 미만(단, 0 ℃ 초과)의 비점을 가지고, 상기 제2 용매는 1 atm 하에서 150 ℃ 이상의 비점을 가지고, 상기 제1 용매는 상기 제2 용매보다 많은 함량으로 포함되는 감광성 수지 조성물을 제공한다. |
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본 기재는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러 필터에 관한 것이다. 구체적으로, 일 구현예는 (A) 광중합성 화합물; (B) 광중합 개시제; (C) 착색제; (D) 바인더 수지; 및 (E) 용매를 포함하고, 상기 용매는 제1 용매 및 제2 용매를 포함하고, 상기 제1 용매는 1 atm 하에서 150 ℃ 미만(단, 0 ℃ 초과)의 비점을 가지고, 상기 제2 용매는 1 atm 하에서 150 ℃ 이상의 비점을 가지고, 상기 제1 용매는 상기 제2 용매보다 많은 함량으로 포함되는 감광성 수지 조성물을 제공한다.</description><language>eng ; kor</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; METALLURGY ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230619&DB=EPODOC&CC=KR&NR=20230088228A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230619&DB=EPODOC&CC=KR&NR=20230088228A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KIM JIHONG</creatorcontrib><creatorcontrib>KIM JIHYE</creatorcontrib><creatorcontrib>KIM SABINA</creatorcontrib><creatorcontrib>SONG HAENI</creatorcontrib><creatorcontrib>YOO JEONGHO</creatorcontrib><creatorcontrib>PARK BAEK SOUNG</creatorcontrib><title>PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER</title><description>The description relates to a photosensitive resin composition, a photosensitive resin film manufactured using the same, and a color filter. Specifically, one embodiment provides a photosensitive resin composition including: (A) a photopolymerizable compound; (B) a photopolymerization initiator; (C) a colorant; (D) a binder resin; and (E) a solvent, wherein the solvent includes a first solvent and a second solvent, the first solvent has a boiling point of less than 150℃ (but more than 0℃) under 1 atm, the second solvent has a boiling point of 150℃ or more under 1 atm, and the first solvent has a higher content than the second solvent.
본 기재는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러 필터에 관한 것이다. 구체적으로, 일 구현예는 (A) 광중합성 화합물; (B) 광중합 개시제; (C) 착색제; (D) 바인더 수지; 및 (E) 용매를 포함하고, 상기 용매는 제1 용매 및 제2 용매를 포함하고, 상기 제1 용매는 1 atm 하에서 150 ℃ 미만(단, 0 ℃ 초과)의 비점을 가지고, 상기 제2 용매는 1 atm 하에서 150 ℃ 이상의 비점을 가지고, 상기 제1 용매는 상기 제2 용매보다 많은 함량으로 포함되는 감광성 수지 조성물을 제공한다.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZIgO8PAP8Q929Qv2DPEMc1UIcg329FNw9vcN8AeJ-PspYFXg4xjpGqQQCmS6K4R4uCoEO_q6Kjj6uQB1-vgHKbh5-oS4BvEwsKYl5hSn8kJpbgZlN9cQZw_d1IL8-NTigsTk1LzUknjvICMDI2MDAwsLIyMLR2PiVAEAtoQzhA</recordid><startdate>20230619</startdate><enddate>20230619</enddate><creator>KIM JIHONG</creator><creator>KIM JIHYE</creator><creator>KIM SABINA</creator><creator>SONG HAENI</creator><creator>YOO JEONGHO</creator><creator>PARK BAEK SOUNG</creator><scope>EVB</scope></search><sort><creationdate>20230619</creationdate><title>PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER</title><author>KIM JIHONG ; KIM JIHYE ; KIM SABINA ; SONG HAENI ; YOO JEONGHO ; PARK BAEK SOUNG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20230088228A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2023</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</topic><toplevel>online_resources</toplevel><creatorcontrib>KIM JIHONG</creatorcontrib><creatorcontrib>KIM JIHYE</creatorcontrib><creatorcontrib>KIM SABINA</creatorcontrib><creatorcontrib>SONG HAENI</creatorcontrib><creatorcontrib>YOO JEONGHO</creatorcontrib><creatorcontrib>PARK BAEK SOUNG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KIM JIHONG</au><au>KIM JIHYE</au><au>KIM SABINA</au><au>SONG HAENI</au><au>YOO JEONGHO</au><au>PARK BAEK SOUNG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER</title><date>2023-06-19</date><risdate>2023</risdate><abstract>The description relates to a photosensitive resin composition, a photosensitive resin film manufactured using the same, and a color filter. Specifically, one embodiment provides a photosensitive resin composition including: (A) a photopolymerizable compound; (B) a photopolymerization initiator; (C) a colorant; (D) a binder resin; and (E) a solvent, wherein the solvent includes a first solvent and a second solvent, the first solvent has a boiling point of less than 150℃ (but more than 0℃) under 1 atm, the second solvent has a boiling point of 150℃ or more under 1 atm, and the first solvent has a higher content than the second solvent.
본 기재는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러 필터에 관한 것이다. 구체적으로, 일 구현예는 (A) 광중합성 화합물; (B) 광중합 개시제; (C) 착색제; (D) 바인더 수지; 및 (E) 용매를 포함하고, 상기 용매는 제1 용매 및 제2 용매를 포함하고, 상기 제1 용매는 1 atm 하에서 150 ℃ 미만(단, 0 ℃ 초과)의 비점을 가지고, 상기 제2 용매는 1 atm 하에서 150 ℃ 이상의 비점을 가지고, 상기 제1 용매는 상기 제2 용매보다 많은 함량으로 포함되는 감광성 수지 조성물을 제공한다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS |
| title | PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER |
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