METHOD OF FORMING A PHOTO-CURED LAYER

A method of forming a photo-cured layer on a substrate may comprise using a first photo-curable composition and a second photo-curable composition, wherein the two photo-curable compositions may both contain the same type of polymerizable monomer but in different concentration ratios. The ratio of t...

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description A method of forming a photo-cured layer on a substrate may comprise using a first photo-curable composition and a second photo-curable composition, wherein the two photo-curable compositions may both contain the same type of polymerizable monomer but in different concentration ratios. The ratio of the concentration of monomers in each of the two photo-curable compositions can be adapted so that the uneven loss of one type of monomer from the first photo-curable composition due to unwanted evaporation in certain areas of the substrate is compensated by the second photo-curable composition containing a greater amount of the same monomer. The two photo-curable compositions can be further adapted to be easily incorporated into a combined layer with a highly uniform distribution of polymerizable monomers. This can enable the formation of a photo-cured layer with an excellent homogeneous material structure throughout the layer. The present invention relates to a method of forming a photo-cured layer on a substrate, and more specifically, to a method of forming a photo-cured layer having a homogeneous material structure. 기판 상에 광-경화된 층을 형성하는 방법은 제1 광경화성 조성물 및 제2 광경화성 조성물을 사용하는 것을 포함할 수 있으며, 여기서 2개의 광경화성 조성물은 모두 동일한 유형의 중합성 단량체를 함유하지만 상이한 농도 비로 함유할 수 있다. 2개의 광경화성 조성물 각각에서의 단량체의 농도 비는 기판의 특정 영역에서의 원치 않는 증발로 인한 제1 광경화성 조성물로부터의 단량체 한 유형의 불균일한 손실이 더 많은 양의 상기 단량체를 함유하는 제2 광경화성 조성물에 의해 보상될 수 있도록 적응될 수 있다. 2개의 광경화성 조성물은 중합성 단량체의 매우 균일한 분포를 갖는 조합된 층에 쉽게 병합되도록 추가로 적응될 수 있다. 이것은 층 전체에 걸쳐 탁월한 균질한 물질 구조를 갖는 광-경화된 층을 형성할 수 있게 할 수 있다.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20230081636A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20230081636A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20230081636A3</originalsourceid><addsrcrecordid>eNrjZFD1dQ3x8HdR8HdTcPMP8vX0c1dwVAjw8A_x13UODXJ1UfBxjHQN4mFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8d5BRgZGxgYGFoZmxmaOxsSpAgAKkCPW</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD OF FORMING A PHOTO-CURED LAYER</title><source>esp@cenet</source><creator>KHUSNATDINOV NIYAZ</creator><creatorcontrib>KHUSNATDINOV NIYAZ</creatorcontrib><description>A method of forming a photo-cured layer on a substrate may comprise using a first photo-curable composition and a second photo-curable composition, wherein the two photo-curable compositions may both contain the same type of polymerizable monomer but in different concentration ratios. The ratio of the concentration of monomers in each of the two photo-curable compositions can be adapted so that the uneven loss of one type of monomer from the first photo-curable composition due to unwanted evaporation in certain areas of the substrate is compensated by the second photo-curable composition containing a greater amount of the same monomer. The two photo-curable compositions can be further adapted to be easily incorporated into a combined layer with a highly uniform distribution of polymerizable monomers. This can enable the formation of a photo-cured layer with an excellent homogeneous material structure throughout the layer. The present invention relates to a method of forming a photo-cured layer on a substrate, and more specifically, to a method of forming a photo-cured layer having a homogeneous material structure. 기판 상에 광-경화된 층을 형성하는 방법은 제1 광경화성 조성물 및 제2 광경화성 조성물을 사용하는 것을 포함할 수 있으며, 여기서 2개의 광경화성 조성물은 모두 동일한 유형의 중합성 단량체를 함유하지만 상이한 농도 비로 함유할 수 있다. 2개의 광경화성 조성물 각각에서의 단량체의 농도 비는 기판의 특정 영역에서의 원치 않는 증발로 인한 제1 광경화성 조성물로부터의 단량체 한 유형의 불균일한 손실이 더 많은 양의 상기 단량체를 함유하는 제2 광경화성 조성물에 의해 보상될 수 있도록 적응될 수 있다. 2개의 광경화성 조성물은 중합성 단량체의 매우 균일한 분포를 갖는 조합된 층에 쉽게 병합되도록 추가로 적응될 수 있다. 이것은 층 전체에 걸쳐 탁월한 균질한 물질 구조를 갖는 광-경화된 층을 형성할 수 있게 할 수 있다.</description><language>eng ; kor</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20230607&amp;DB=EPODOC&amp;CC=KR&amp;NR=20230081636A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20230607&amp;DB=EPODOC&amp;CC=KR&amp;NR=20230081636A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KHUSNATDINOV NIYAZ</creatorcontrib><title>METHOD OF FORMING A PHOTO-CURED LAYER</title><description>A method of forming a photo-cured layer on a substrate may comprise using a first photo-curable composition and a second photo-curable composition, wherein the two photo-curable compositions may both contain the same type of polymerizable monomer but in different concentration ratios. The ratio of the concentration of monomers in each of the two photo-curable compositions can be adapted so that the uneven loss of one type of monomer from the first photo-curable composition due to unwanted evaporation in certain areas of the substrate is compensated by the second photo-curable composition containing a greater amount of the same monomer. The two photo-curable compositions can be further adapted to be easily incorporated into a combined layer with a highly uniform distribution of polymerizable monomers. This can enable the formation of a photo-cured layer with an excellent homogeneous material structure throughout the layer. The present invention relates to a method of forming a photo-cured layer on a substrate, and more specifically, to a method of forming a photo-cured layer having a homogeneous material structure. 기판 상에 광-경화된 층을 형성하는 방법은 제1 광경화성 조성물 및 제2 광경화성 조성물을 사용하는 것을 포함할 수 있으며, 여기서 2개의 광경화성 조성물은 모두 동일한 유형의 중합성 단량체를 함유하지만 상이한 농도 비로 함유할 수 있다. 2개의 광경화성 조성물 각각에서의 단량체의 농도 비는 기판의 특정 영역에서의 원치 않는 증발로 인한 제1 광경화성 조성물로부터의 단량체 한 유형의 불균일한 손실이 더 많은 양의 상기 단량체를 함유하는 제2 광경화성 조성물에 의해 보상될 수 있도록 적응될 수 있다. 2개의 광경화성 조성물은 중합성 단량체의 매우 균일한 분포를 갖는 조합된 층에 쉽게 병합되도록 추가로 적응될 수 있다. 이것은 층 전체에 걸쳐 탁월한 균질한 물질 구조를 갖는 광-경화된 층을 형성할 수 있게 할 수 있다.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFD1dQ3x8HdR8HdTcPMP8vX0c1dwVAjw8A_x13UODXJ1UfBxjHQN4mFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8d5BRgZGxgYGFoZmxmaOxsSpAgAKkCPW</recordid><startdate>20230607</startdate><enddate>20230607</enddate><creator>KHUSNATDINOV NIYAZ</creator><scope>EVB</scope></search><sort><creationdate>20230607</creationdate><title>METHOD OF FORMING A PHOTO-CURED LAYER</title><author>KHUSNATDINOV NIYAZ</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20230081636A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2023</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>KHUSNATDINOV NIYAZ</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KHUSNATDINOV NIYAZ</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD OF FORMING A PHOTO-CURED LAYER</title><date>2023-06-07</date><risdate>2023</risdate><abstract>A method of forming a photo-cured layer on a substrate may comprise using a first photo-curable composition and a second photo-curable composition, wherein the two photo-curable compositions may both contain the same type of polymerizable monomer but in different concentration ratios. The ratio of the concentration of monomers in each of the two photo-curable compositions can be adapted so that the uneven loss of one type of monomer from the first photo-curable composition due to unwanted evaporation in certain areas of the substrate is compensated by the second photo-curable composition containing a greater amount of the same monomer. The two photo-curable compositions can be further adapted to be easily incorporated into a combined layer with a highly uniform distribution of polymerizable monomers. This can enable the formation of a photo-cured layer with an excellent homogeneous material structure throughout the layer. The present invention relates to a method of forming a photo-cured layer on a substrate, and more specifically, to a method of forming a photo-cured layer having a homogeneous material structure. 기판 상에 광-경화된 층을 형성하는 방법은 제1 광경화성 조성물 및 제2 광경화성 조성물을 사용하는 것을 포함할 수 있으며, 여기서 2개의 광경화성 조성물은 모두 동일한 유형의 중합성 단량체를 함유하지만 상이한 농도 비로 함유할 수 있다. 2개의 광경화성 조성물 각각에서의 단량체의 농도 비는 기판의 특정 영역에서의 원치 않는 증발로 인한 제1 광경화성 조성물로부터의 단량체 한 유형의 불균일한 손실이 더 많은 양의 상기 단량체를 함유하는 제2 광경화성 조성물에 의해 보상될 수 있도록 적응될 수 있다. 2개의 광경화성 조성물은 중합성 단량체의 매우 균일한 분포를 갖는 조합된 층에 쉽게 병합되도록 추가로 적응될 수 있다. 이것은 층 전체에 걸쳐 탁월한 균질한 물질 구조를 갖는 광-경화된 층을 형성할 수 있게 할 수 있다.</abstract><oa>free_for_read</oa></addata></record>
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
title METHOD OF FORMING A PHOTO-CURED LAYER
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-18T21%3A09%3A53IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KHUSNATDINOV%20NIYAZ&rft.date=2023-06-07&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EKR20230081636A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true