Heater and substrate processing apparatus having the same

The present invention relates to a heater and a substrate processing apparatus including the same and, more specifically, to a heater and a substrate processing apparatus including the same for performing substrate processing, such as heat treatment. The heater (100) of the present invention compris...

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Bibliographische Detailangaben
Hauptverfasser: JANG HEE SUP, PARK JUN YUNG
Format: Patent
Sprache:eng ; kor
Schlagworte:
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