전해 공정에서 가스 발생을 위한 전극
본 발명은 전해 공정에서 가스 발생을 위한 전극 및 상기 전극의 제조 방법에 관한 것으로, 상기 전극은 금속 기판 및 상기 기판 상에 형성된 코팅을 포함하며, 상기 코팅은 산화 니켈 및 수산화 니켈을 함유하는 적어도 하나의 고다공성 촉매 외층을 포함하고, 상기 다공성 외층은 적어도 40m2/g (BET)의 표면적을 갖는다. 상기 촉매층은 Ni 산화물/V 산화물 초기 코팅 및 후속 V 침출로 제조된다. An electrode for gas evolution in electrolytic processes and a method for...
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| creator | INSTULI EMANUELE MARINA RICCARDO DI BARI CHIARA MATIENZO DJ DONN PINO FRANCESCO |
| description | 본 발명은 전해 공정에서 가스 발생을 위한 전극 및 상기 전극의 제조 방법에 관한 것으로, 상기 전극은 금속 기판 및 상기 기판 상에 형성된 코팅을 포함하며, 상기 코팅은 산화 니켈 및 수산화 니켈을 함유하는 적어도 하나의 고다공성 촉매 외층을 포함하고, 상기 다공성 외층은 적어도 40m2/g (BET)의 표면적을 갖는다. 상기 촉매층은 Ni 산화물/V 산화물 초기 코팅 및 후속 V 침출로 제조된다.
An electrode for gas evolution in electrolytic processes and a method for the production of such an electrode, the electrode having a metal substrate and a coating formed on the substrate, wherein the coating has at least a highly porous catalytic outer layer containing nickel oxide and nickel hydroxide, the porous outer layer having a surface area of at least 40 m2/g (BET). The catalytic layer is prepared from a Ni oxide/V oxide initial coating with subsequent leaching of V. |
| format | Patent |
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An electrode for gas evolution in electrolytic processes and a method for the production of such an electrode, the electrode having a metal substrate and a coating formed on the substrate, wherein the coating has at least a highly porous catalytic outer layer containing nickel oxide and nickel hydroxide, the porous outer layer having a surface area of at least 40 m2/g (BET). The catalytic layer is prepared from a Ni oxide/V oxide initial coating with subsequent leaching of V.</description><language>kor</language><subject>APPARATUS THEREFOR ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTROFORMING ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTIONOF COMPOUNDS OR NON-METALS ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230502&DB=EPODOC&CC=KR&NR=20230058126A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230502&DB=EPODOC&CC=KR&NR=20230058126A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>INSTULI EMANUELE</creatorcontrib><creatorcontrib>MARINA RICCARDO</creatorcontrib><creatorcontrib>DI BARI CHIARA</creatorcontrib><creatorcontrib>MATIENZO DJ DONN</creatorcontrib><creatorcontrib>PINO FRANCESCO</creatorcontrib><title>전해 공정에서 가스 발생을 위한 전극</title><description>본 발명은 전해 공정에서 가스 발생을 위한 전극 및 상기 전극의 제조 방법에 관한 것으로, 상기 전극은 금속 기판 및 상기 기판 상에 형성된 코팅을 포함하며, 상기 코팅은 산화 니켈 및 수산화 니켈을 함유하는 적어도 하나의 고다공성 촉매 외층을 포함하고, 상기 다공성 외층은 적어도 40m2/g (BET)의 표면적을 갖는다. 상기 촉매층은 Ni 산화물/V 산화물 초기 코팅 및 후속 V 침출로 제조된다.
An electrode for gas evolution in electrolytic processes and a method for the production of such an electrode, the electrode having a metal substrate and a coating formed on the substrate, wherein the coating has at least a highly porous catalytic outer layer containing nickel oxide and nickel hydroxide, the porous outer layer having a surface area of at least 40 m2/g (BET). The catalytic layer is prepared from a Ni oxide/V oxide initial coating with subsequent leaching of V.</description><subject>APPARATUS THEREFOR</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTROFORMING</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTIONOF COMPOUNDS OR NON-METALS</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDB6s6Dl7dQtCq82b32zYOqb6RPetMxReLWh4U3XEoXXG-a8aZ77Zm6Lwps5QEVzFIBqX23fycPAmpaYU5zKC6W5GZTdXEOcPXRTC_LjU4sLEpNT81JL4r2DjAyMjA0MTC0MjcwcjYlTBQDCHTp_</recordid><startdate>20230502</startdate><enddate>20230502</enddate><creator>INSTULI EMANUELE</creator><creator>MARINA RICCARDO</creator><creator>DI BARI CHIARA</creator><creator>MATIENZO DJ DONN</creator><creator>PINO FRANCESCO</creator><scope>EVB</scope></search><sort><creationdate>20230502</creationdate><title>전해 공정에서 가스 발생을 위한 전극</title><author>INSTULI EMANUELE ; MARINA RICCARDO ; DI BARI CHIARA ; MATIENZO DJ DONN ; PINO FRANCESCO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20230058126A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>kor</language><creationdate>2023</creationdate><topic>APPARATUS THEREFOR</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTROFORMING</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTIONOF COMPOUNDS OR NON-METALS</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>INSTULI EMANUELE</creatorcontrib><creatorcontrib>MARINA RICCARDO</creatorcontrib><creatorcontrib>DI BARI CHIARA</creatorcontrib><creatorcontrib>MATIENZO DJ DONN</creatorcontrib><creatorcontrib>PINO FRANCESCO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>INSTULI EMANUELE</au><au>MARINA RICCARDO</au><au>DI BARI CHIARA</au><au>MATIENZO DJ DONN</au><au>PINO FRANCESCO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>전해 공정에서 가스 발생을 위한 전극</title><date>2023-05-02</date><risdate>2023</risdate><abstract>본 발명은 전해 공정에서 가스 발생을 위한 전극 및 상기 전극의 제조 방법에 관한 것으로, 상기 전극은 금속 기판 및 상기 기판 상에 형성된 코팅을 포함하며, 상기 코팅은 산화 니켈 및 수산화 니켈을 함유하는 적어도 하나의 고다공성 촉매 외층을 포함하고, 상기 다공성 외층은 적어도 40m2/g (BET)의 표면적을 갖는다. 상기 촉매층은 Ni 산화물/V 산화물 초기 코팅 및 후속 V 침출로 제조된다.
An electrode for gas evolution in electrolytic processes and a method for the production of such an electrode, the electrode having a metal substrate and a coating formed on the substrate, wherein the coating has at least a highly porous catalytic outer layer containing nickel oxide and nickel hydroxide, the porous outer layer having a surface area of at least 40 m2/g (BET). The catalytic layer is prepared from a Ni oxide/V oxide initial coating with subsequent leaching of V.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS THEREFOR CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTIONOF COMPOUNDS OR NON-METALS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | 전해 공정에서 가스 발생을 위한 전극 |
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