프린지 모아레 및 광학적 모아레 효과들을 사용한 오정렬 계측
계측 시스템 및 계측 방법들이 개시된다. 계측 시스템은 조명 서브시스템, 수집 서브시스템, 검출기, 및 제어기를 포함한다. 제어기는 샘플 상의 오버레이 타겟의 이미지를 수신하고, 이미지에 기초하여 측정 방향을 따른 2개의 작업 구역들 사이의 겉보기(apparent) 오버레이를 결정하고, 모아레 간섭을 보상하기 위해 모아레 이득으로 겉보기 오버레이를 나눔으로써 2개 샘플 층들 사이의 오버레이를 계산하도록 구성된다. A metrology system and metrology methods are disclosed. The metrolo...
Gespeichert in:
| Hauptverfasser: | , , , , |
|---|---|
| Format: | Patent |
| Sprache: | kor |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | GHINOVKER MARK LEVINSKI VLADIMIR FELER YOEL GUREVICH EVGENI SVIZHER ALEXANDER |
| description | 계측 시스템 및 계측 방법들이 개시된다. 계측 시스템은 조명 서브시스템, 수집 서브시스템, 검출기, 및 제어기를 포함한다. 제어기는 샘플 상의 오버레이 타겟의 이미지를 수신하고, 이미지에 기초하여 측정 방향을 따른 2개의 작업 구역들 사이의 겉보기(apparent) 오버레이를 결정하고, 모아레 간섭을 보상하기 위해 모아레 이득으로 겉보기 오버레이를 나눔으로써 2개 샘플 층들 사이의 오버레이를 계산하도록 구성된다.
A metrology system and metrology methods are disclosed. The metrology system includes an illumination sub-system, a collection sub-system, a detector, and a controller. The controller is configured to receive an image of an overlay target on a sample, determine an apparent overlay between two working zones along a measurement direction based on the image, and calculate an overlay between the two sample layers by dividing the apparent overlay by a Moiré gain to compensate for Moiré interference. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20230041662A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20230041662A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20230041662A3</originalsourceid><addsrcrecordid>eNrjZAh-O6Xl9bINb5Y3KLxeteLN1JbXCzoUXm_oV3i1ZeLbqTPfLGhEEn87a8WrzXteT17yZm6LwpumNW9mrXw7dY7CmxlL3iyY-nrBGoVXm1ve7FjIw8CalphTnMoLpbkZlN1cQ5w9dFML8uNTiwsSk1PzUkvivYOMDIyMDQxMDM3MjByNiVMFAGp6UJI</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>프린지 모아레 및 광학적 모아레 효과들을 사용한 오정렬 계측</title><source>esp@cenet</source><creator>GHINOVKER MARK ; LEVINSKI VLADIMIR ; FELER YOEL ; GUREVICH EVGENI ; SVIZHER ALEXANDER</creator><creatorcontrib>GHINOVKER MARK ; LEVINSKI VLADIMIR ; FELER YOEL ; GUREVICH EVGENI ; SVIZHER ALEXANDER</creatorcontrib><description>계측 시스템 및 계측 방법들이 개시된다. 계측 시스템은 조명 서브시스템, 수집 서브시스템, 검출기, 및 제어기를 포함한다. 제어기는 샘플 상의 오버레이 타겟의 이미지를 수신하고, 이미지에 기초하여 측정 방향을 따른 2개의 작업 구역들 사이의 겉보기(apparent) 오버레이를 결정하고, 모아레 간섭을 보상하기 위해 모아레 이득으로 겉보기 오버레이를 나눔으로써 2개 샘플 층들 사이의 오버레이를 계산하도록 구성된다.
A metrology system and metrology methods are disclosed. The metrology system includes an illumination sub-system, a collection sub-system, a detector, and a controller. The controller is configured to receive an image of an overlay target on a sample, determine an apparent overlay between two working zones along a measurement direction based on the image, and calculate an overlay between the two sample layers by dividing the apparent overlay by a Moiré gain to compensate for Moiré interference.</description><language>kor</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CALCULATING ; CINEMATOGRAPHY ; COMPUTING ; COUNTING ; ELECTRIC COMMUNICATION TECHNIQUE ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; IMAGE DATA PROCESSING OR GENERATION, IN GENERAL ; MATERIALS THEREFOR ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; PICTORIAL COMMUNICATION, e.g. TELEVISION</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230324&DB=EPODOC&CC=KR&NR=20230041662A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25566,76549</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230324&DB=EPODOC&CC=KR&NR=20230041662A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GHINOVKER MARK</creatorcontrib><creatorcontrib>LEVINSKI VLADIMIR</creatorcontrib><creatorcontrib>FELER YOEL</creatorcontrib><creatorcontrib>GUREVICH EVGENI</creatorcontrib><creatorcontrib>SVIZHER ALEXANDER</creatorcontrib><title>프린지 모아레 및 광학적 모아레 효과들을 사용한 오정렬 계측</title><description>계측 시스템 및 계측 방법들이 개시된다. 계측 시스템은 조명 서브시스템, 수집 서브시스템, 검출기, 및 제어기를 포함한다. 제어기는 샘플 상의 오버레이 타겟의 이미지를 수신하고, 이미지에 기초하여 측정 방향을 따른 2개의 작업 구역들 사이의 겉보기(apparent) 오버레이를 결정하고, 모아레 간섭을 보상하기 위해 모아레 이득으로 겉보기 오버레이를 나눔으로써 2개 샘플 층들 사이의 오버레이를 계산하도록 구성된다.
A metrology system and metrology methods are disclosed. The metrology system includes an illumination sub-system, a collection sub-system, a detector, and a controller. The controller is configured to receive an image of an overlay target on a sample, determine an apparent overlay between two working zones along a measurement direction based on the image, and calculate an overlay between the two sample layers by dividing the apparent overlay by a Moiré gain to compensate for Moiré interference.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CALCULATING</subject><subject>CINEMATOGRAPHY</subject><subject>COMPUTING</subject><subject>COUNTING</subject><subject>ELECTRIC COMMUNICATION TECHNIQUE</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>IMAGE DATA PROCESSING OR GENERATION, IN GENERAL</subject><subject>MATERIALS THEREFOR</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>PICTORIAL COMMUNICATION, e.g. TELEVISION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAh-O6Xl9bINb5Y3KLxeteLN1JbXCzoUXm_oV3i1ZeLbqTPfLGhEEn87a8WrzXteT17yZm6LwpumNW9mrXw7dY7CmxlL3iyY-nrBGoVXm1ve7FjIw8CalphTnMoLpbkZlN1cQ5w9dFML8uNTiwsSk1PzUkvivYOMDIyMDQxMDM3MjByNiVMFAGp6UJI</recordid><startdate>20230324</startdate><enddate>20230324</enddate><creator>GHINOVKER MARK</creator><creator>LEVINSKI VLADIMIR</creator><creator>FELER YOEL</creator><creator>GUREVICH EVGENI</creator><creator>SVIZHER ALEXANDER</creator><scope>EVB</scope></search><sort><creationdate>20230324</creationdate><title>프린지 모아레 및 광학적 모아레 효과들을 사용한 오정렬 계측</title><author>GHINOVKER MARK ; LEVINSKI VLADIMIR ; FELER YOEL ; GUREVICH EVGENI ; SVIZHER ALEXANDER</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20230041662A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>kor</language><creationdate>2023</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CALCULATING</topic><topic>CINEMATOGRAPHY</topic><topic>COMPUTING</topic><topic>COUNTING</topic><topic>ELECTRIC COMMUNICATION TECHNIQUE</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>IMAGE DATA PROCESSING OR GENERATION, IN GENERAL</topic><topic>MATERIALS THEREFOR</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>PICTORIAL COMMUNICATION, e.g. TELEVISION</topic><toplevel>online_resources</toplevel><creatorcontrib>GHINOVKER MARK</creatorcontrib><creatorcontrib>LEVINSKI VLADIMIR</creatorcontrib><creatorcontrib>FELER YOEL</creatorcontrib><creatorcontrib>GUREVICH EVGENI</creatorcontrib><creatorcontrib>SVIZHER ALEXANDER</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>GHINOVKER MARK</au><au>LEVINSKI VLADIMIR</au><au>FELER YOEL</au><au>GUREVICH EVGENI</au><au>SVIZHER ALEXANDER</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>프린지 모아레 및 광학적 모아레 효과들을 사용한 오정렬 계측</title><date>2023-03-24</date><risdate>2023</risdate><abstract>계측 시스템 및 계측 방법들이 개시된다. 계측 시스템은 조명 서브시스템, 수집 서브시스템, 검출기, 및 제어기를 포함한다. 제어기는 샘플 상의 오버레이 타겟의 이미지를 수신하고, 이미지에 기초하여 측정 방향을 따른 2개의 작업 구역들 사이의 겉보기(apparent) 오버레이를 결정하고, 모아레 간섭을 보상하기 위해 모아레 이득으로 겉보기 오버레이를 나눔으로써 2개 샘플 층들 사이의 오버레이를 계산하도록 구성된다.
A metrology system and metrology methods are disclosed. The metrology system includes an illumination sub-system, a collection sub-system, a detector, and a controller. The controller is configured to receive an image of an overlay target on a sample, determine an apparent overlay between two working zones along a measurement direction based on the image, and calculate an overlay between the two sample layers by dividing the apparent overlay by a Moiré gain to compensate for Moiré interference.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | kor |
| recordid | cdi_epo_espacenet_KR20230041662A |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTRIC COMMUNICATION TECHNIQUE ELECTRICITY ELECTROGRAPHY HOLOGRAPHY IMAGE DATA PROCESSING OR GENERATION, IN GENERAL MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PICTORIAL COMMUNICATION, e.g. TELEVISION |
| title | 프린지 모아레 및 광학적 모아레 효과들을 사용한 오정렬 계측 |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-17T22%3A40%3A46IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=GHINOVKER%20MARK&rft.date=2023-03-24&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EKR20230041662A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |