EXPOSURE APPARATUS AND METHOD OF MANUFACTURING ARTICLE

The present invention relates to an exposure apparatus that performs scanning exposure on each of a plurality of shot areas on a substrate, wherein the exposure apparatus comprises: a stage configured to hold a substrate; a driving unit configured to drive the stage; and a control unit configured to...

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Bibliographische Detailangaben
Hauptverfasser: EMOTO KEIJI, KANEISHI MAMORU
Format: Patent
Sprache:eng ; kor
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Beschreibung
Zusammenfassung:The present invention relates to an exposure apparatus that performs scanning exposure on each of a plurality of shot areas on a substrate, wherein the exposure apparatus comprises: a stage configured to hold a substrate; a driving unit configured to drive the stage; and a control unit configured to control scanning exposure for each of the plurality of shot areas while controlling the driving unit according to a driving profile, wherein the driving profile includes a first section in which the stage is driven at a constant acceleration in a first direction, a second section in which the stage is driven at a constant acceleration in a second direction opposite to the first direction, and a connection section that connects the first section and the second section. The period during which scanning exposure is performed includes at least a portion of the connection section. The exposure apparatus can reduce substrate positioning errors during scanning exposure. 본 발명은, 기판에 있어서의 복수의 숏 영역의 각각에 대해 주사 노광을 행하는 노광장치로서, 기판을 유지하도록 구성된 스테이지와, 스테이지를 구동하도록 구성된 구동부와, 구동 프로파일에 따라 구동부를 제어하면서, 복수의 숏 영역의 각각에 대한 주사 노광을 제어하도록 구성된 제어부를 구비하고, 구동 프로파일은, 제1방향으로 일정한 가속도로 스테이지를 구동하는 제1 구간과, 제1방향과는 반대의 제2방향으로 일정한 가속도로 스테이지를 구동하는 제2 구간과, 제1 구간과 제2 구간을 접속하는 접속 구간을 포함하고, 주사 노광이 행해지는 기간은 접속 구간의 적어도 일부를 포함하는 노광장치를 제공한다.