RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

The present invention relates to: a resist underlayer composition including a polymer containing a structural unit represented by chemical formula 1, a structural unit represented by chemical formula 2 or a combination thereof, and a structural unit represented by chemical formula 3, and a solvent;...

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Bibliographische Detailangaben
Hauptverfasser:	KWON SOONHYUNG, CHUN MINKI, BAEK JAEYEOL, KIM MINSOO, PARK HYEON, JIN HWAYOUNG, KIM SEONG JIN, NAMGUNG RAN, CHOI YOOJEONG, SONG DAESEOK
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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