고주파 생성 장치
고주파 증폭기에 의해 증폭되고, 플라스마 생성 전극에 공급되는 고주파 전력에 있어서의 고조파를 저감시키는 고주파 생성 장치(2)로서, 기본파의 입력에 대해서 생성되는 고조파를 역위상화한 보정파와 기본파를 합성한 합성파를 생성하는 고주파 생성부(201)를 구비했다. An RF generating device 2, which attenuates harmonics in RF power amplified by an RF amplifier and supplied to plasma generating electrodes, includes an...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Patent |
| Sprache: | kor |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | MURAI KOICHI |
| description | 고주파 증폭기에 의해 증폭되고, 플라스마 생성 전극에 공급되는 고주파 전력에 있어서의 고조파를 저감시키는 고주파 생성 장치(2)로서, 기본파의 입력에 대해서 생성되는 고조파를 역위상화한 보정파와 기본파를 합성한 합성파를 생성하는 고주파 생성부(201)를 구비했다.
An RF generating device 2, which attenuates harmonics in RF power amplified by an RF amplifier and supplied to plasma generating electrodes, includes an RF generation unit 201 that generates a composite wave by combining a fundamental wave with a compensation wave which is made by inverting a phase of a harmonic generated by inputting the fundamental wave. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20220165732A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20220165732A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20220165732A3</originalsourceid><addsrcrecordid>eNrjZBB_tXnBm8V73vb0KLxpnvumZaPCm3lL3-ycwcPAmpaYU5zKC6W5GZTdXEOcPXRTC_LjU4sLEpNT81JL4r2DjAyMjAwMzUzNjY0cjYlTBQD5Ayk8</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>고주파 생성 장치</title><source>esp@cenet</source><creator>MURAI KOICHI</creator><creatorcontrib>MURAI KOICHI</creatorcontrib><description>고주파 증폭기에 의해 증폭되고, 플라스마 생성 전극에 공급되는 고주파 전력에 있어서의 고조파를 저감시키는 고주파 생성 장치(2)로서, 기본파의 입력에 대해서 생성되는 고조파를 역위상화한 보정파와 기본파를 합성한 합성파를 생성하는 고주파 생성부(201)를 구비했다.
An RF generating device 2, which attenuates harmonics in RF power amplified by an RF amplifier and supplied to plasma generating electrodes, includes an RF generation unit 201 that generates a composite wave by combining a fundamental wave with a compensation wave which is made by inverting a phase of a harmonic generated by inputting the fundamental wave.</description><language>kor</language><subject>CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS, ORSURGICAL ARTICLES ; DISINFECTION, STERILISATION, OR DEODORISATION OF AIR ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; HUMAN NECESSITIES ; HYGIENE ; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS, OR SURGICALARTICLES ; MEDICAL OR VETERINARY SCIENCE ; METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS INGENERAL ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221215&DB=EPODOC&CC=KR&NR=20220165732A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221215&DB=EPODOC&CC=KR&NR=20220165732A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MURAI KOICHI</creatorcontrib><title>고주파 생성 장치</title><description>고주파 증폭기에 의해 증폭되고, 플라스마 생성 전극에 공급되는 고주파 전력에 있어서의 고조파를 저감시키는 고주파 생성 장치(2)로서, 기본파의 입력에 대해서 생성되는 고조파를 역위상화한 보정파와 기본파를 합성한 합성파를 생성하는 고주파 생성부(201)를 구비했다.
An RF generating device 2, which attenuates harmonics in RF power amplified by an RF amplifier and supplied to plasma generating electrodes, includes an RF generation unit 201 that generates a composite wave by combining a fundamental wave with a compensation wave which is made by inverting a phase of a harmonic generated by inputting the fundamental wave.</description><subject>CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS, ORSURGICAL ARTICLES</subject><subject>DISINFECTION, STERILISATION, OR DEODORISATION OF AIR</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>HUMAN NECESSITIES</subject><subject>HYGIENE</subject><subject>MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS, OR SURGICALARTICLES</subject><subject>MEDICAL OR VETERINARY SCIENCE</subject><subject>METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS INGENERAL</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBB_tXnBm8V73vb0KLxpnvumZaPCm3lL3-ycwcPAmpaYU5zKC6W5GZTdXEOcPXRTC_LjU4sLEpNT81JL4r2DjAyMjAwMzUzNjY0cjYlTBQD5Ayk8</recordid><startdate>20221215</startdate><enddate>20221215</enddate><creator>MURAI KOICHI</creator><scope>EVB</scope></search><sort><creationdate>20221215</creationdate><title>고주파 생성 장치</title><author>MURAI KOICHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20220165732A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>kor</language><creationdate>2022</creationdate><topic>CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS, ORSURGICAL ARTICLES</topic><topic>DISINFECTION, STERILISATION, OR DEODORISATION OF AIR</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>HUMAN NECESSITIES</topic><topic>HYGIENE</topic><topic>MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS, OR SURGICALARTICLES</topic><topic>MEDICAL OR VETERINARY SCIENCE</topic><topic>METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS INGENERAL</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><toplevel>online_resources</toplevel><creatorcontrib>MURAI KOICHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MURAI KOICHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>고주파 생성 장치</title><date>2022-12-15</date><risdate>2022</risdate><abstract>고주파 증폭기에 의해 증폭되고, 플라스마 생성 전극에 공급되는 고주파 전력에 있어서의 고조파를 저감시키는 고주파 생성 장치(2)로서, 기본파의 입력에 대해서 생성되는 고조파를 역위상화한 보정파와 기본파를 합성한 합성파를 생성하는 고주파 생성부(201)를 구비했다.
An RF generating device 2, which attenuates harmonics in RF power amplified by an RF amplifier and supplied to plasma generating electrodes, includes an RF generation unit 201 that generates a composite wave by combining a fundamental wave with a compensation wave which is made by inverting a phase of a harmonic generated by inputting the fundamental wave.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | kor |
| recordid | cdi_epo_espacenet_KR20220165732A |
| source | esp@cenet |
| subjects | CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS, ORSURGICAL ARTICLES DISINFECTION, STERILISATION, OR DEODORISATION OF AIR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY HUMAN NECESSITIES HYGIENE MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS, OR SURGICALARTICLES MEDICAL OR VETERINARY SCIENCE METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS INGENERAL PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS |
| title | 고주파 생성 장치 |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-19T05%3A20%3A54IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=MURAI%20KOICHI&rft.date=2022-12-15&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EKR20220165732A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |