SUBSTRATE PROCESSING APPARATUS SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

A top plate is held by an opposing member holder in a first position and rotated together with a substrate holder while being held by a substrate holder in a second position. In a substrate processing apparatus, a first processing liquid supply unit, a second processing liquid supply unit, a nozzle...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MURAMOTO RYO, TAKAHASHI MITSUKAZU
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY NOZZLES PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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