Substrate processing apparatus

A substrate processing device which blocks light inflow and outflow is provided. The substrate processing device includes: a chamber; a light source disposed in the chamber and irradiating light; a substrate support unit disposed in the chamber and supporting a substrate; a transmission unit which i...

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Bibliographische Detailangaben
Hauptverfasser: YUN KANG SEOP, SONG SOO HAN, CHOI JUNG BONG, KIM CHUL GOO
Format: Patent
Sprache:eng ; kor
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Beschreibung
Zusammenfassung:A substrate processing device which blocks light inflow and outflow is provided. The substrate processing device includes: a chamber; a light source disposed in the chamber and irradiating light; a substrate support unit disposed in the chamber and supporting a substrate; a transmission unit which is installed in the chamber and through which the light is transmitted; and a blocking film installed on the transmission unit to prevent the light generated from the light source from leaking out of the chamber. 광의 유입 및 유출을 차단하는 기판 처리 장치가 제공된다. 상기 기판 처리 장치는 챔버; 상기 챔버 내에 배치되고, 광을 조사하는 광원; 상기 챔버 내에 배치되고, 기판을 지지하는 기판 지지부; 상기 챔버에 설치되고, 상기 광이 투과되는 투과부; 및 상기 투과부에 설치되어, 상기 광원으로부터 발생된 광이 상기 챔버의 외부로 유출되는 것을 방지하기 위한 차단 필름을 포함한다.