EVAPORATION SOURCE DEVICE
본 발명은, 도가니의 미세한 온도 제어가 가능하고, 보다 단시간에 도가니의 온도 분포를 최적화하여 균일한 막두께 분포를 갖는 박막을 성막 가능한 증발원 장치를 제공하는 것을 목적으로 한다. 증착 재료(1)가 수용되는 도가니(2)에 그 길이 방향을 따라 주(主) 히터(3)를 설치하고, 이 주 히터(3)를 설치한 상기 도가니(2)의 적어도 길이 방향 양단부에 각각 보조 히터(4)를 설치하여, 상기 도가니(2)의 길이 방향 양단부를 상기 주 히터(3) 및 보조 히터(4)로 가열 제어할 수 있도록 구성한다. Provided is an ev...
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| creator | MISAWA KEITA WATANABE KAZUHIRO MATSUMOTO EIICHI YAMAZAKI MASAHIRO KOBAYASHI YOSHIMASA KONDO YOSHINARI MAKI SHUJI YAMADA NAOTO |
| description | 본 발명은, 도가니의 미세한 온도 제어가 가능하고, 보다 단시간에 도가니의 온도 분포를 최적화하여 균일한 막두께 분포를 갖는 박막을 성막 가능한 증발원 장치를 제공하는 것을 목적으로 한다. 증착 재료(1)가 수용되는 도가니(2)에 그 길이 방향을 따라 주(主) 히터(3)를 설치하고, 이 주 히터(3)를 설치한 상기 도가니(2)의 적어도 길이 방향 양단부에 각각 보조 히터(4)를 설치하여, 상기 도가니(2)의 길이 방향 양단부를 상기 주 히터(3) 및 보조 히터(4)로 가열 제어할 수 있도록 구성한다.
Provided is an evaporation source device capable of fine temperature control of a crucible and of forming a thin film having a uniform film thickness distribution by optimizing the temperature distribution of the crucible in a shorter amount of time. A main heater (3) is provided, in the crucible (2) in which an evaporation material (1) is accommodated, along the longitudinal direction of the crucible, and auxiliary heaters (4) are provided at least at both ends in the longitudinal direction of the crucible (2) having the main heater (3). The evaporation source device is configured so that it is possible to heat and control both ends in the longitudinal direction of the crucible (2) by using the main heater (3) and the auxiliary heaters (4). |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20220123757A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20220123757A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20220123757A3</originalsourceid><addsrcrecordid>eNrjZJB0DXMM8A9yDPH091MI9g8NcnZVcHEN83R25WFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8d5BRgZGRgaGRsbmpuaOxsSpAgCZFCDj</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>EVAPORATION SOURCE DEVICE</title><source>esp@cenet</source><creator>MISAWA KEITA ; WATANABE KAZUHIRO ; MATSUMOTO EIICHI ; YAMAZAKI MASAHIRO ; KOBAYASHI YOSHIMASA ; KONDO YOSHINARI ; MAKI SHUJI ; YAMADA NAOTO</creator><creatorcontrib>MISAWA KEITA ; WATANABE KAZUHIRO ; MATSUMOTO EIICHI ; YAMAZAKI MASAHIRO ; KOBAYASHI YOSHIMASA ; KONDO YOSHINARI ; MAKI SHUJI ; YAMADA NAOTO</creatorcontrib><description>본 발명은, 도가니의 미세한 온도 제어가 가능하고, 보다 단시간에 도가니의 온도 분포를 최적화하여 균일한 막두께 분포를 갖는 박막을 성막 가능한 증발원 장치를 제공하는 것을 목적으로 한다. 증착 재료(1)가 수용되는 도가니(2)에 그 길이 방향을 따라 주(主) 히터(3)를 설치하고, 이 주 히터(3)를 설치한 상기 도가니(2)의 적어도 길이 방향 양단부에 각각 보조 히터(4)를 설치하여, 상기 도가니(2)의 길이 방향 양단부를 상기 주 히터(3) 및 보조 히터(4)로 가열 제어할 수 있도록 구성한다.
Provided is an evaporation source device capable of fine temperature control of a crucible and of forming a thin film having a uniform film thickness distribution by optimizing the temperature distribution of the crucible in a shorter amount of time. A main heater (3) is provided, in the crucible (2) in which an evaporation material (1) is accommodated, along the longitudinal direction of the crucible, and auxiliary heaters (4) are provided at least at both ends in the longitudinal direction of the crucible (2) having the main heater (3). The evaporation source device is configured so that it is possible to heat and control both ends in the longitudinal direction of the crucible (2) by using the main heater (3) and the auxiliary heaters (4).</description><language>eng ; kor</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC HEATING ; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220908&DB=EPODOC&CC=KR&NR=20220123757A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220908&DB=EPODOC&CC=KR&NR=20220123757A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MISAWA KEITA</creatorcontrib><creatorcontrib>WATANABE KAZUHIRO</creatorcontrib><creatorcontrib>MATSUMOTO EIICHI</creatorcontrib><creatorcontrib>YAMAZAKI MASAHIRO</creatorcontrib><creatorcontrib>KOBAYASHI YOSHIMASA</creatorcontrib><creatorcontrib>KONDO YOSHINARI</creatorcontrib><creatorcontrib>MAKI SHUJI</creatorcontrib><creatorcontrib>YAMADA NAOTO</creatorcontrib><title>EVAPORATION SOURCE DEVICE</title><description>본 발명은, 도가니의 미세한 온도 제어가 가능하고, 보다 단시간에 도가니의 온도 분포를 최적화하여 균일한 막두께 분포를 갖는 박막을 성막 가능한 증발원 장치를 제공하는 것을 목적으로 한다. 증착 재료(1)가 수용되는 도가니(2)에 그 길이 방향을 따라 주(主) 히터(3)를 설치하고, 이 주 히터(3)를 설치한 상기 도가니(2)의 적어도 길이 방향 양단부에 각각 보조 히터(4)를 설치하여, 상기 도가니(2)의 길이 방향 양단부를 상기 주 히터(3) 및 보조 히터(4)로 가열 제어할 수 있도록 구성한다.
Provided is an evaporation source device capable of fine temperature control of a crucible and of forming a thin film having a uniform film thickness distribution by optimizing the temperature distribution of the crucible in a shorter amount of time. A main heater (3) is provided, in the crucible (2) in which an evaporation material (1) is accommodated, along the longitudinal direction of the crucible, and auxiliary heaters (4) are provided at least at both ends in the longitudinal direction of the crucible (2) having the main heater (3). The evaporation source device is configured so that it is possible to heat and control both ends in the longitudinal direction of the crucible (2) by using the main heater (3) and the auxiliary heaters (4).</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC HEATING</subject><subject>ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJB0DXMM8A9yDPH091MI9g8NcnZVcHEN83R25WFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8d5BRgZGRgaGRsbmpuaOxsSpAgCZFCDj</recordid><startdate>20220908</startdate><enddate>20220908</enddate><creator>MISAWA KEITA</creator><creator>WATANABE KAZUHIRO</creator><creator>MATSUMOTO EIICHI</creator><creator>YAMAZAKI MASAHIRO</creator><creator>KOBAYASHI YOSHIMASA</creator><creator>KONDO YOSHINARI</creator><creator>MAKI SHUJI</creator><creator>YAMADA NAOTO</creator><scope>EVB</scope></search><sort><creationdate>20220908</creationdate><title>EVAPORATION SOURCE DEVICE</title><author>MISAWA KEITA ; WATANABE KAZUHIRO ; MATSUMOTO EIICHI ; YAMAZAKI MASAHIRO ; KOBAYASHI YOSHIMASA ; KONDO YOSHINARI ; MAKI SHUJI ; YAMADA NAOTO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20220123757A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2022</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC HEATING</topic><topic>ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>MISAWA KEITA</creatorcontrib><creatorcontrib>WATANABE KAZUHIRO</creatorcontrib><creatorcontrib>MATSUMOTO EIICHI</creatorcontrib><creatorcontrib>YAMAZAKI MASAHIRO</creatorcontrib><creatorcontrib>KOBAYASHI YOSHIMASA</creatorcontrib><creatorcontrib>KONDO YOSHINARI</creatorcontrib><creatorcontrib>MAKI SHUJI</creatorcontrib><creatorcontrib>YAMADA NAOTO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MISAWA KEITA</au><au>WATANABE KAZUHIRO</au><au>MATSUMOTO EIICHI</au><au>YAMAZAKI MASAHIRO</au><au>KOBAYASHI YOSHIMASA</au><au>KONDO YOSHINARI</au><au>MAKI SHUJI</au><au>YAMADA NAOTO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>EVAPORATION SOURCE DEVICE</title><date>2022-09-08</date><risdate>2022</risdate><abstract>본 발명은, 도가니의 미세한 온도 제어가 가능하고, 보다 단시간에 도가니의 온도 분포를 최적화하여 균일한 막두께 분포를 갖는 박막을 성막 가능한 증발원 장치를 제공하는 것을 목적으로 한다. 증착 재료(1)가 수용되는 도가니(2)에 그 길이 방향을 따라 주(主) 히터(3)를 설치하고, 이 주 히터(3)를 설치한 상기 도가니(2)의 적어도 길이 방향 양단부에 각각 보조 히터(4)를 설치하여, 상기 도가니(2)의 길이 방향 양단부를 상기 주 히터(3) 및 보조 히터(4)로 가열 제어할 수 있도록 구성한다.
Provided is an evaporation source device capable of fine temperature control of a crucible and of forming a thin film having a uniform film thickness distribution by optimizing the temperature distribution of the crucible in a shorter amount of time. A main heater (3) is provided, in the crucible (2) in which an evaporation material (1) is accommodated, along the longitudinal direction of the crucible, and auxiliary heaters (4) are provided at least at both ends in the longitudinal direction of the crucible (2) having the main heater (3). The evaporation source device is configured so that it is possible to heat and control both ends in the longitudinal direction of the crucible (2) by using the main heater (3) and the auxiliary heaters (4).</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | EVAPORATION SOURCE DEVICE |
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