ETCHANT COMPOSITION
The present invention relates to an etchant composition for etching silver (Ag) or a film containing the silver, and a manufacturing method thereof. According to the etchant composition of the present invention, in an etchant process of silver or a metal film containing the silver, etchant character...
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| creator | EUN HEE CHUN JUNG SEOK IL KIM IK JOON JEONG MIN GYEONG LEE BO YEON KIM SE HOON KIM YANG RYOUNG PARK SANG SEUNG |
| description | The present invention relates to an etchant composition for etching silver (Ag) or a film containing the silver, and a manufacturing method thereof. According to the etchant composition of the present invention, in an etchant process of silver or a metal film containing the silver, etchant characteristics may be improved as a residue is improved without damage to a lower film, generation of a precipitate is prevented, and a defect in a bias is minimized during formation of a fine wire. The etchant composition of the present invention comprises: a nitric acid; an inorganic phosphoric acid or a salt thereof; an organic phosphoric acid or a salt thereof; a sulfur compound; and an organic acid.
본 발명은 은(Ag) 또는 은을 함유하는 막의 식각을 위한 식각액 조성물 및 그 제조방법에 관한 것이다. 본 발명의 식각액 조성물에 따르면, 은 또는 은을 포함하는 금속막의 식각 공정에 있어서, 하부막의 손상 없이 잔사를 개선하고, 석출물의 발생을 방지하고, 미세 배선 형성 시 바이어스의 불량을 최소화함에 따라 식각 특성을 개선할 수 있다. |
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본 발명은 은(Ag) 또는 은을 함유하는 막의 식각을 위한 식각액 조성물 및 그 제조방법에 관한 것이다. 본 발명의 식각액 조성물에 따르면, 은 또는 은을 포함하는 금속막의 식각 공정에 있어서, 하부막의 손상 없이 잔사를 개선하고, 석출물의 발생을 방지하고, 미세 배선 형성 시 바이어스의 불량을 최소화함에 따라 식각 특성을 개선할 수 있다.</description><language>eng ; kor</language><subject>ADHESIVES ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; DYES ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 ; NATURAL RESINS ; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE ; PAINTS ; POLISHES</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220826&DB=EPODOC&CC=KR&NR=20220118706A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220826&DB=EPODOC&CC=KR&NR=20220118706A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>EUN HEE CHUN</creatorcontrib><creatorcontrib>JUNG SEOK IL</creatorcontrib><creatorcontrib>KIM IK JOON</creatorcontrib><creatorcontrib>JEONG MIN GYEONG</creatorcontrib><creatorcontrib>LEE BO YEON</creatorcontrib><creatorcontrib>KIM SE HOON</creatorcontrib><creatorcontrib>KIM YANG RYOUNG</creatorcontrib><creatorcontrib>PARK SANG SEUNG</creatorcontrib><title>ETCHANT COMPOSITION</title><description>The present invention relates to an etchant composition for etching silver (Ag) or a film containing the silver, and a manufacturing method thereof. According to the etchant composition of the present invention, in an etchant process of silver or a metal film containing the silver, etchant characteristics may be improved as a residue is improved without damage to a lower film, generation of a precipitate is prevented, and a defect in a bias is minimized during formation of a fine wire. The etchant composition of the present invention comprises: a nitric acid; an inorganic phosphoric acid or a salt thereof; an organic phosphoric acid or a salt thereof; a sulfur compound; and an organic acid.
본 발명은 은(Ag) 또는 은을 함유하는 막의 식각을 위한 식각액 조성물 및 그 제조방법에 관한 것이다. 본 발명의 식각액 조성물에 따르면, 은 또는 은을 포함하는 금속막의 식각 공정에 있어서, 하부막의 손상 없이 잔사를 개선하고, 석출물의 발생을 방지하고, 미세 배선 형성 시 바이어스의 불량을 최소화함에 따라 식각 특성을 개선할 수 있다.</description><subject>ADHESIVES</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>DYES</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25</subject><subject>NATURAL RESINS</subject><subject>NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</subject><subject>PAINTS</subject><subject>POLISHES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBB2DXH2cPQLUXD29w3wD_YM8fT342FgTUvMKU7lhdLcDMpuIGW6qQX58anFBYnJqXmpJfHeQUYGRkYGhoYW5gZmjsbEqQIA3oYfSw</recordid><startdate>20220826</startdate><enddate>20220826</enddate><creator>EUN HEE CHUN</creator><creator>JUNG SEOK IL</creator><creator>KIM IK JOON</creator><creator>JEONG MIN GYEONG</creator><creator>LEE BO YEON</creator><creator>KIM SE HOON</creator><creator>KIM YANG RYOUNG</creator><creator>PARK SANG SEUNG</creator><scope>EVB</scope></search><sort><creationdate>20220826</creationdate><title>ETCHANT COMPOSITION</title><author>EUN HEE CHUN ; JUNG SEOK IL ; KIM IK JOON ; JEONG MIN GYEONG ; LEE BO YEON ; KIM SE HOON ; KIM YANG RYOUNG ; PARK SANG SEUNG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20220118706A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2022</creationdate><topic>ADHESIVES</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>DYES</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25</topic><topic>NATURAL RESINS</topic><topic>NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</topic><topic>PAINTS</topic><topic>POLISHES</topic><toplevel>online_resources</toplevel><creatorcontrib>EUN HEE CHUN</creatorcontrib><creatorcontrib>JUNG SEOK IL</creatorcontrib><creatorcontrib>KIM IK JOON</creatorcontrib><creatorcontrib>JEONG MIN GYEONG</creatorcontrib><creatorcontrib>LEE BO YEON</creatorcontrib><creatorcontrib>KIM SE HOON</creatorcontrib><creatorcontrib>KIM YANG RYOUNG</creatorcontrib><creatorcontrib>PARK SANG SEUNG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>EUN HEE CHUN</au><au>JUNG SEOK IL</au><au>KIM IK JOON</au><au>JEONG MIN GYEONG</au><au>LEE BO YEON</au><au>KIM SE HOON</au><au>KIM YANG RYOUNG</au><au>PARK SANG SEUNG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ETCHANT COMPOSITION</title><date>2022-08-26</date><risdate>2022</risdate><abstract>The present invention relates to an etchant composition for etching silver (Ag) or a film containing the silver, and a manufacturing method thereof. According to the etchant composition of the present invention, in an etchant process of silver or a metal film containing the silver, etchant characteristics may be improved as a residue is improved without damage to a lower film, generation of a precipitate is prevented, and a defect in a bias is minimized during formation of a fine wire. The etchant composition of the present invention comprises: a nitric acid; an inorganic phosphoric acid or a salt thereof; an organic phosphoric acid or a salt thereof; a sulfur compound; and an organic acid.
본 발명은 은(Ag) 또는 은을 함유하는 막의 식각을 위한 식각액 조성물 및 그 제조방법에 관한 것이다. 본 발명의 식각액 조성물에 따르면, 은 또는 은을 포함하는 금속막의 식각 공정에 있어서, 하부막의 손상 없이 잔사를 개선하고, 석출물의 발생을 방지하고, 미세 배선 형성 시 바이어스의 불량을 최소화함에 따라 식각 특성을 개선할 수 있다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVES CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL DYES INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NATURAL RESINS NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE PAINTS POLISHES |
| title | ETCHANT COMPOSITION |
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