APPARATUS FOR DRAINING CHEMICAL AND APPARATUS FOR PROCESSING SUBSTRATE HAVING THE SAME

A liquid chemical drain device includes a collection unit, a drain line, and a gas supply unit. The collection unit may be provided to collect the liquid chemical drained from the treatment process. The drain line may be provided to drain the liquid chemical of the collection unit to the outside. Th...

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1. Verfasser:	LEE MU HYEON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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creator	LEE MU HYEON
description	A liquid chemical drain device includes a collection unit, a drain line, and a gas supply unit. The collection unit may be provided to collect the liquid chemical drained from the treatment process. The drain line may be provided to drain the liquid chemical of the collection unit to the outside. The gas supply unit may be provided to supply positive pressure gas having a predetermined size to the collection unit to prevent fume generated from the drain line from flowing into the collection unit. 약액 드레인 장치는 수집부, 드레인 라인, 기체 공급부를 포함할 수 있다. 상기 수집부는 처리 공정으로부터 드레인되는 약액을 수집하도록 구비될 수 있다. 상기 드레인 라인은 상기 수집부의 약액을 외부로 드레인시킬 수 있게 구비될 수 있다. 상기 기체 공급부는 상기 드레인 라인에서 발생하는 흄이 상기 수집부로 유입되는 것을 방지할 수 있게 상기 수집부에 일정 크기를 갖는 양압의 기체를 공급하도록 구비될 수 있다.
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The collection unit may be provided to collect the liquid chemical drained from the treatment process. The drain line may be provided to drain the liquid chemical of the collection unit to the outside. The gas supply unit may be provided to supply positive pressure gas having a predetermined size to the collection unit to prevent fume generated from the drain line from flowing into the collection unit. 약액 드레인 장치는 수집부, 드레인 라인, 기체 공급부를 포함할 수 있다. 상기 수집부는 처리 공정으로부터 드레인되는 약액을 수집하도록 구비될 수 있다. 상기 드레인 라인은 상기 수집부의 약액을 외부로 드레인시킬 수 있게 구비될 수 있다. 상기 기체 공급부는 상기 드레인 라인에서 발생하는 흄이 상기 수집부로 유입되는 것을 방지할 수 있게 상기 수집부에 일정 크기를 갖는 양압의 기체를 공급하도록 구비될 수 있다.</description><language>eng ; kor</language><subject>BASIC ELECTRIC ELEMENTS ; CLEANING ; CLEANING IN GENERAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; PERFORMING OPERATIONS ; PREVENTION OF FOULING IN GENERAL ; SEMICONDUCTOR DEVICES ; TRANSPORTING</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220706&DB=EPODOC&CC=KR&NR=20220094426A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220706&DB=EPODOC&CC=KR&NR=20220094426A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LEE MU HYEON</creatorcontrib><title>APPARATUS FOR DRAINING CHEMICAL AND APPARATUS FOR PROCESSING SUBSTRATE HAVING THE SAME</title><description>A liquid chemical drain device includes a collection unit, a drain line, and a gas supply unit. The collection unit may be provided to collect the liquid chemical drained from the treatment process. The drain line may be provided to drain the liquid chemical of the collection unit to the outside. The gas supply unit may be provided to supply positive pressure gas having a predetermined size to the collection unit to prevent fume generated from the drain line from flowing into the collection unit. 약액 드레인 장치는 수집부, 드레인 라인, 기체 공급부를 포함할 수 있다. 상기 수집부는 처리 공정으로부터 드레인되는 약액을 수집하도록 구비될 수 있다. 상기 드레인 라인은 상기 수집부의 약액을 외부로 드레인시킬 수 있게 구비될 수 있다. 상기 기체 공급부는 상기 드레인 라인에서 발생하는 흄이 상기 수집부로 유입되는 것을 방지할 수 있게 상기 수집부에 일정 크기를 갖는 양압의 기체를 공급하도록 구비될 수 있다.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>PERFORMING OPERATIONS</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAhzDAhwDHIMCQ1WcPMPUnAJcvT08_RzV3D2cPX1dHb0UXD0c1FAVRMQ5O_sGhwMUhUc6hQcApRxVfBwDAMJhHi4KgQ7-rryMLCmJeYUp_JCaW4GZTfXEGcP3dSC_PjU4oLE5NS81JJ47yAjAyMjAwNLExMjM0dj4lQBAEpnMXo</recordid><startdate>20220706</startdate><enddate>20220706</enddate><creator>LEE MU HYEON</creator><scope>EVB</scope></search><sort><creationdate>20220706</creationdate><title>APPARATUS FOR DRAINING CHEMICAL AND APPARATUS FOR PROCESSING SUBSTRATE HAVING THE SAME</title><author>LEE MU HYEON</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20220094426A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2022</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>PERFORMING OPERATIONS</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>LEE MU HYEON</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LEE MU HYEON</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>APPARATUS FOR DRAINING CHEMICAL AND APPARATUS FOR PROCESSING SUBSTRATE HAVING THE SAME</title><date>2022-07-06</date><risdate>2022</risdate><abstract>A liquid chemical drain device includes a collection unit, a drain line, and a gas supply unit. The collection unit may be provided to collect the liquid chemical drained from the treatment process. The drain line may be provided to drain the liquid chemical of the collection unit to the outside. The gas supply unit may be provided to supply positive pressure gas having a predetermined size to the collection unit to prevent fume generated from the drain line from flowing into the collection unit. 약액 드레인 장치는 수집부, 드레인 라인, 기체 공급부를 포함할 수 있다. 상기 수집부는 처리 공정으로부터 드레인되는 약액을 수집하도록 구비될 수 있다. 상기 드레인 라인은 상기 수집부의 약액을 외부로 드레인시킬 수 있게 구비될 수 있다. 상기 기체 공급부는 상기 드레인 라인에서 발생하는 흄이 상기 수집부로 유입되는 것을 방지할 수 있게 상기 수집부에 일정 크기를 갖는 양압의 기체를 공급하도록 구비될 수 있다.</abstract><oa>free_for_read</oa></addata></record>
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subjects	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
title	APPARATUS FOR DRAINING CHEMICAL AND APPARATUS FOR PROCESSING SUBSTRATE HAVING THE SAME
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