CHEMICAL SUPPLYING NOZZLE AND APPARATUS FOR TREATING SUBSTRATE

The present invention provides a processing liquid supply nozzle. In one example, the processing liquid supply nozzle includes: a nozzle tip having an outlet through which the processing liquid is discharged; and a nozzle body coupled to the nozzle tip and combined with the nozzle tip to form a flow...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	JUNG WOO SIN, LEE TAE HOON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR NOZZLES ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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