CHEMICAL SUPPLYING NOZZLE AND APPARATUS FOR TREATING SUBSTRATE
The present invention provides a processing liquid supply nozzle. In one example, the processing liquid supply nozzle includes: a nozzle tip having an outlet through which the processing liquid is discharged; and a nozzle body coupled to the nozzle tip and combined with the nozzle tip to form a flow...
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| creator | JUNG WOO SIN LEE TAE HOON |
| description | The present invention provides a processing liquid supply nozzle. In one example, the processing liquid supply nozzle includes: a nozzle tip having an outlet through which the processing liquid is discharged; and a nozzle body coupled to the nozzle tip and combined with the nozzle tip to form a flow path through which the processing liquid flows. The nozzle body may be provided with an antistatic material.
본 발명은, 처리액 공급 노즐을 제공한다. 일 예에서, 처리액 공급 노즐은, 처리액이 토출되는 토출구를 가지는 노즐팁과; 노즐팁에 결합되며 노즐팁과 조합되어 처리액이 흐르는 유로를 형성하는 노즐 바디를 포함하고, 노즐 바디는 대전 방지 소재로 제공될 수 있다. |
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본 발명은, 처리액 공급 노즐을 제공한다. 일 예에서, 처리액 공급 노즐은, 처리액이 토출되는 토출구를 가지는 노즐팁과; 노즐팁에 결합되며 노즐팁과 조합되어 처리액이 흐르는 유로를 형성하는 노즐 바디를 포함하고, 노즐 바디는 대전 방지 소재로 제공될 수 있다.</description><language>eng ; kor</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; ATOMISING APPARATUS ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; NOZZLES ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES ; SPRAYING APPARATUS ; SPRAYING OR ATOMISING IN GENERAL ; TRANSPORTING</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220405&DB=EPODOC&CC=KR&NR=20220043634A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220405&DB=EPODOC&CC=KR&NR=20220043634A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JUNG WOO SIN</creatorcontrib><creatorcontrib>LEE TAE HOON</creatorcontrib><title>CHEMICAL SUPPLYING NOZZLE AND APPARATUS FOR TREATING SUBSTRATE</title><description>The present invention provides a processing liquid supply nozzle. In one example, the processing liquid supply nozzle includes: a nozzle tip having an outlet through which the processing liquid is discharged; and a nozzle body coupled to the nozzle tip and combined with the nozzle tip to form a flow path through which the processing liquid flows. The nozzle body may be provided with an antistatic material.
본 발명은, 처리액 공급 노즐을 제공한다. 일 예에서, 처리액 공급 노즐은, 처리액이 토출되는 토출구를 가지는 노즐팁과; 노즐팁에 결합되며 노즐팁과 조합되어 처리액이 흐르는 유로를 형성하는 노즐 바디를 포함하고, 노즐 바디는 대전 방지 소재로 제공될 수 있다.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>ATOMISING APPARATUS</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>NOZZLES</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SPRAYING APPARATUS</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLBz9nD19XR29FEIDg0I8In09HNX8POPivJxVXD0c1FwDAhwDHIMCQ1WcPMPUggJcnUMAakIDnUKDgGKu_IwsKYl5hSn8kJpbgZlN9cQZw_d1IL8-NTigsTk1LzUknjvICMDIyMDAxNjM2MTR2PiVAEAIyQrPg</recordid><startdate>20220405</startdate><enddate>20220405</enddate><creator>JUNG WOO SIN</creator><creator>LEE TAE HOON</creator><scope>EVB</scope></search><sort><creationdate>20220405</creationdate><title>CHEMICAL SUPPLYING NOZZLE AND APPARATUS FOR TREATING SUBSTRATE</title><author>JUNG WOO SIN ; LEE TAE HOON</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20220043634A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2022</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>ATOMISING APPARATUS</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>NOZZLES</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SPRAYING APPARATUS</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>JUNG WOO SIN</creatorcontrib><creatorcontrib>LEE TAE HOON</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>JUNG WOO SIN</au><au>LEE TAE HOON</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CHEMICAL SUPPLYING NOZZLE AND APPARATUS FOR TREATING SUBSTRATE</title><date>2022-04-05</date><risdate>2022</risdate><abstract>The present invention provides a processing liquid supply nozzle. In one example, the processing liquid supply nozzle includes: a nozzle tip having an outlet through which the processing liquid is discharged; and a nozzle body coupled to the nozzle tip and combined with the nozzle tip to form a flow path through which the processing liquid flows. The nozzle body may be provided with an antistatic material.
본 발명은, 처리액 공급 노즐을 제공한다. 일 예에서, 처리액 공급 노즐은, 처리액이 토출되는 토출구를 가지는 노즐팁과; 노즐팁에 결합되며 노즐팁과 조합되어 처리액이 흐르는 유로를 형성하는 노즐 바디를 포함하고, 노즐 바디는 대전 방지 소재로 제공될 수 있다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR NOZZLES ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL TRANSPORTING |
| title | CHEMICAL SUPPLYING NOZZLE AND APPARATUS FOR TREATING SUBSTRATE |
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