Blankmask with Backside Conductive Layer and Photomask manufactured with the same

A blank mask includes a conductive film attached to a rear surface of a substrate, and the conductive film includes a first layer, a second layer, and a third layer sequentially stacked on the rear surface of the substrate. The first layer and the third layer are formed of a material containing chro...

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Bibliographische Detailangaben
Hauptverfasser:	KONG GIL WOO, YANG CHUL KYU, SEO GYEONG WON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A blank mask includes a conductive film attached to a rear surface of a substrate, and the conductive film includes a first layer, a second layer, and a third layer sequentially stacked on the rear surface of the substrate. The first layer and the third layer are formed of a material containing chromium (Cr) and oxygen (O), and the second layer is formed of a material containing chromium (Cr) without containing oxygen (O). Provided is the blank mask comprising the conductive film having low sheet resistance, high adhesion to the substrate, and low stress applied to the substrate. 블랭크마스크는 기판의 후면에 부착된 도전막을 구비하며, 도전막은 기판 후면에 순차 적층된 제1층, 제2층, 및 제3층을 구비한다. 제1층 및 제3층은 크롬(Cr) 및 산소(O)를 포함하는 재질로 형성되며, 제2층은 산소(O)를 포함하지 않고 크롬(Cr)을 포함하는 재질로 형성된다. 면저항이 낮고, 기판에 대한 부착력이 높으며, 기판에 가해지는 응력이 낮은 특성을 갖는 도전막을 구비한 블랭크마스크가 제공된다.