SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

The invention provides a substrate processing apparatus and a substrate transfer method. A second conveyance mechanism (23) of the substrate processing apparatus (100) is provided with a first non-common hand (H_F), a second non-common hand (H_S), and the M number of common hands (H1-HM). In one tra...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	KIKUMOTO NORIYUKI
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS CHAMBERS PROVIDED WITH MANIPULATION DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HAND TOOLS MANIPULATORS PERFORMING OPERATIONS PORTABLE POWER-DRIVEN TOOLS SEMICONDUCTOR DEVICES TRANSPORTING
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