Metal-Assisted Chemical Etching Process for Silicon Substrate

The present invention relates to a metal catalyst wet etching method of a silicon substrate and, more specifically, to a metal catalyst wet etching method of a silicon substrate which etches a substrate by a redox reaction of the silicon substrate, on which a metal catalyst is deposited, and an etch...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	OH IL WHAN, ANAFI NUR' AINI, WON JUN HO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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