SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

A substrate processing apparatus provided with a processing part for performing a periphery process, and an inspection part for inspecting the periphery of a substrate can prevent a decrease in the throughput resulting from substrate transfer. A substrate processing apparatus according to the presen...

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Bibliographische Detailangaben
1. Verfasser: TSUJIHASHI TATSUHIKO
Format: Patent
Sprache:eng ; kor
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