2 Upstream two-stage direct-and- indirect electrospray unit

The present invention relates to an upstream two-stage direct and indirect electrostatic spraying device which removes dust contained in difficult-to-decomposable process gases (PFCs based gases such as CF_4, C_2F_6, C_2F_4, SF_6 and NF_3) used and then discharged in a semiconductor and display manu...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KIM JOENG GEUN, LEE KYE JUNG, KIM JIN HAN, CHOI JONG WON, PARK JUN SU, CHO MIN JEONG
Format: Patent
Sprache:eng ; kor
Schlagworte:
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