2 Upstream two-stage direct-and- indirect electrospray unit

The present invention relates to an upstream two-stage direct and indirect electrostatic spraying device which removes dust contained in difficult-to-decomposable process gases (PFCs based gases such as CF_4, C_2F_6, C_2F_4, SF_6 and NF_3) used and then discharged in a semiconductor and display manu...

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Bibliographische Detailangaben
Hauptverfasser:	KIM JOENG GEUN, LEE KYE JUNG, KIM JIN HAN, CHOI JONG WON, PARK JUN SU, CHO MIN JEONG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLIDMATERIALS OR FLUIDS MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROMSOLID MATERIALS OR FLUIDS PERFORMING OPERATIONS SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATICTABLES OR JIGS TRANSPORTING
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Beschreibung
Zusammenfassung:	The present invention relates to an upstream two-stage direct and indirect electrostatic spraying device which removes dust contained in difficult-to-decomposable process gases (PFCs based gases such as CF_4, C_2F_6, C_2F_4, SF_6 and NF_3) used and then discharged in a semiconductor and display manufacturing process, and various other difficult-to-decomposable harmful gases discharged from a chemical process. 본 발명은 반도체 및 디스플레이 제조공정에 사용되고 배출되는 난분해성 처리가스(PFCs 계열 (CF4, C2F6, C2F4, SF6 및 NF3 및 화학공정에서 배출되는 여타 다양한 난분해성 유해가스에 포함된 분진을 제거하는 상향류 방식 2단 직간접식 정전분무장치에 관한 것이다.