PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER AND DISPLAY DEVICE USING THE SAME
Provided are a photosensitive resin composition, a photosensitive resin film manufactured using the same, and a display device including the photosensitive resin film, wherein the photosensitive resin composition includes: (A) an alkali-soluble resin containing structural units represented by chemic...
Gespeichert in:
| Hauptverfasser: | , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; kor |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | KO JINTAE BAEK TAEK JIN KANG JINHEE KIM SANG SOO KIM DO UK RYU JEEHYUN HONG CHUNGBEUM |
| description | Provided are a photosensitive resin composition, a photosensitive resin film manufactured using the same, and a display device including the photosensitive resin film, wherein the photosensitive resin composition includes: (A) an alkali-soluble resin containing structural units represented by chemical formula 1; (B) a photosensitive diazoquinone compound; and (C) a solvent. In chemical formula 1, each substituent is as defined in the specification.
(A) 하기 화학식 1로 표시되는 구조단위 함유 알칼리 가용성 수지; (B) 감광성 디아조퀴논 화합물; 및 (C) 용매를 포함하는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 디스플레이 장치가 제공된다. [화학식 1] JPEGpat00052.jpg86139 (상기 화학식 1에서, 각 치환기는 명세서에 정의된 바와 같다.) |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20210089440A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20210089440A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20210089440A3</originalsourceid><addsrcrecordid>eNrjZIgN8PAP8Q929Qv2DPEMc1UIcg329FNw9vcN8AeJ-PspYFXg4xjpGqTg6Oei4OIZHADkKbi4hnk6uyqEAmXdFUI8XBWCHX1deRhY0xJzilN5oTQ3g7Kba4izh25qQX58anFBYnJqXmpJvHeQkYGRoYGBhaWJiYGjMXGqABoFM_0</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER AND DISPLAY DEVICE USING THE SAME</title><source>esp@cenet</source><creator>KO JINTAE ; BAEK TAEK JIN ; KANG JINHEE ; KIM SANG SOO ; KIM DO UK ; RYU JEEHYUN ; HONG CHUNGBEUM</creator><creatorcontrib>KO JINTAE ; BAEK TAEK JIN ; KANG JINHEE ; KIM SANG SOO ; KIM DO UK ; RYU JEEHYUN ; HONG CHUNGBEUM</creatorcontrib><description>Provided are a photosensitive resin composition, a photosensitive resin film manufactured using the same, and a display device including the photosensitive resin film, wherein the photosensitive resin composition includes: (A) an alkali-soluble resin containing structural units represented by chemical formula 1; (B) a photosensitive diazoquinone compound; and (C) a solvent. In chemical formula 1, each substituent is as defined in the specification.
(A) 하기 화학식 1로 표시되는 구조단위 함유 알칼리 가용성 수지; (B) 감광성 디아조퀴논 화합물; 및 (C) 용매를 포함하는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 디스플레이 장치가 제공된다. [화학식 1] JPEGpat00052.jpg86139 (상기 화학식 1에서, 각 치환기는 명세서에 정의된 바와 같다.)</description><language>eng ; kor</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; ELECTROGRAPHY ; HOLOGRAPHY ; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS ; MATERIALS THEREFOR ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210716&DB=EPODOC&CC=KR&NR=20210089440A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210716&DB=EPODOC&CC=KR&NR=20210089440A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KO JINTAE</creatorcontrib><creatorcontrib>BAEK TAEK JIN</creatorcontrib><creatorcontrib>KANG JINHEE</creatorcontrib><creatorcontrib>KIM SANG SOO</creatorcontrib><creatorcontrib>KIM DO UK</creatorcontrib><creatorcontrib>RYU JEEHYUN</creatorcontrib><creatorcontrib>HONG CHUNGBEUM</creatorcontrib><title>PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER AND DISPLAY DEVICE USING THE SAME</title><description>Provided are a photosensitive resin composition, a photosensitive resin film manufactured using the same, and a display device including the photosensitive resin film, wherein the photosensitive resin composition includes: (A) an alkali-soluble resin containing structural units represented by chemical formula 1; (B) a photosensitive diazoquinone compound; and (C) a solvent. In chemical formula 1, each substituent is as defined in the specification.
(A) 하기 화학식 1로 표시되는 구조단위 함유 알칼리 가용성 수지; (B) 감광성 디아조퀴논 화합물; 및 (C) 용매를 포함하는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 디스플레이 장치가 제공된다. [화학식 1] JPEGpat00052.jpg86139 (상기 화학식 1에서, 각 치환기는 명세서에 정의된 바와 같다.)</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZIgN8PAP8Q929Qv2DPEMc1UIcg329FNw9vcN8AeJ-PspYFXg4xjpGqTg6Oei4OIZHADkKbi4hnk6uyqEAmXdFUI8XBWCHX1deRhY0xJzilN5oTQ3g7Kba4izh25qQX58anFBYnJqXmpJvHeQkYGRoYGBhaWJiYGjMXGqABoFM_0</recordid><startdate>20210716</startdate><enddate>20210716</enddate><creator>KO JINTAE</creator><creator>BAEK TAEK JIN</creator><creator>KANG JINHEE</creator><creator>KIM SANG SOO</creator><creator>KIM DO UK</creator><creator>RYU JEEHYUN</creator><creator>HONG CHUNGBEUM</creator><scope>EVB</scope></search><sort><creationdate>20210716</creationdate><title>PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER AND DISPLAY DEVICE USING THE SAME</title><author>KO JINTAE ; BAEK TAEK JIN ; KANG JINHEE ; KIM SANG SOO ; KIM DO UK ; RYU JEEHYUN ; HONG CHUNGBEUM</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20210089440A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2021</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>KO JINTAE</creatorcontrib><creatorcontrib>BAEK TAEK JIN</creatorcontrib><creatorcontrib>KANG JINHEE</creatorcontrib><creatorcontrib>KIM SANG SOO</creatorcontrib><creatorcontrib>KIM DO UK</creatorcontrib><creatorcontrib>RYU JEEHYUN</creatorcontrib><creatorcontrib>HONG CHUNGBEUM</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KO JINTAE</au><au>BAEK TAEK JIN</au><au>KANG JINHEE</au><au>KIM SANG SOO</au><au>KIM DO UK</au><au>RYU JEEHYUN</au><au>HONG CHUNGBEUM</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER AND DISPLAY DEVICE USING THE SAME</title><date>2021-07-16</date><risdate>2021</risdate><abstract>Provided are a photosensitive resin composition, a photosensitive resin film manufactured using the same, and a display device including the photosensitive resin film, wherein the photosensitive resin composition includes: (A) an alkali-soluble resin containing structural units represented by chemical formula 1; (B) a photosensitive diazoquinone compound; and (C) a solvent. In chemical formula 1, each substituent is as defined in the specification.
(A) 하기 화학식 1로 표시되는 구조단위 함유 알칼리 가용성 수지; (B) 감광성 디아조퀴논 화합물; 및 (C) 용매를 포함하는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 디스플레이 장치가 제공된다. [화학식 1] JPEGpat00052.jpg86139 (상기 화학식 1에서, 각 치환기는 명세서에 정의된 바와 같다.)</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; kor |
| recordid | cdi_epo_espacenet_KR20210089440A |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP |
| title | PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER AND DISPLAY DEVICE USING THE SAME |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-11T12%3A52%3A15IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KO%20JINTAE&rft.date=2021-07-16&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EKR20210089440A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |