APPARATUS FOR CONTROLLING TEMPERATURE OF SUBSTRATE AND APPARATUS FOR TREATING SUBSTRATE COMPRISING THE SAME

Disclosed is an apparatus for processing a substrate, capable of simplifying the circuit structure of a substrate temperature control device. The apparatus for processing a substrate according to the present invention includes: a chamber having a processing space for processing a substrate therein;...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: PARK TAE DONG, KONG BYEONG HYEON, JU YUNSIK
Format: Patent
Sprache:eng ; kor
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!