Vacuum Carburizing Method It is Possible to Foaming Surface Ideal Layer by Processing Gas Flow Control

According to the present invention, a vacuum carburizing method capable of forming a superficial layer through flow rate control of process gas comprises: a step (a) of performing pretreatment on target metal formed of low-carbon steel; a step (b) of inputting the target metal into a reaction chambe...

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Hauptverfasser: BUM SOO KIM, PARK HYUNJUN, MOON KYOUNG IL, MINSU JUNG, KWON GI HOON
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Sprache:eng ; kor
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creator BUM SOO KIM
PARK HYUNJUN
MOON KYOUNG IL
MINSU JUNG
KWON GI HOON
description According to the present invention, a vacuum carburizing method capable of forming a superficial layer through flow rate control of process gas comprises: a step (a) of performing pretreatment on target metal formed of low-carbon steel; a step (b) of inputting the target metal into a reaction chamber; and a step (c) of forming the reaction chamber in a vacuum atmosphere and performing carburizing treatment by inputting reaction gas into the reaction chamber, wherein the step (c) controls a predetermined flow rate of the reaction gas to be supplied in a pulse type so as to disperse carbon from the surface of the target metal to predetermined depth and additionally form the superficial layer on the surface of the target metal. 본 발명에 따른 처리가스 유량조절을 통한 표면 이상층 형성이 가능한 진공침탄방법은, 저탄소강으로 형성되는 대상금속에 전처리를 수행하는 (a)단계, 상기 대상금속을 반응챔버에 투입하는 (b)단계 및 상기 반응챔버를 진공 분위기로 형성하고, 상기 반응챔버 내에 반응가스를 투입하여 침탄 처리를 수행하는 (c)단계를 포함하며, 상기 (c)단계는, 상기 반응가스 일정 유량을 펄스 타입으로 공급하도록 조절함에 따라, 상기 대상금속의 표면으로부터 일정 깊이까지 탄소를 확산시킨 이후, 표면에 표면 이상층을 추가적으로 형성하도록 한다.
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a step (b) of inputting the target metal into a reaction chamber; and a step (c) of forming the reaction chamber in a vacuum atmosphere and performing carburizing treatment by inputting reaction gas into the reaction chamber, wherein the step (c) controls a predetermined flow rate of the reaction gas to be supplied in a pulse type so as to disperse carbon from the surface of the target metal to predetermined depth and additionally form the superficial layer on the surface of the target metal. 본 발명에 따른 처리가스 유량조절을 통한 표면 이상층 형성이 가능한 진공침탄방법은, 저탄소강으로 형성되는 대상금속에 전처리를 수행하는 (a)단계, 상기 대상금속을 반응챔버에 투입하는 (b)단계 및 상기 반응챔버를 진공 분위기로 형성하고, 상기 반응챔버 내에 반응가스를 투입하여 침탄 처리를 수행하는 (c)단계를 포함하며, 상기 (c)단계는, 상기 반응가스 일정 유량을 펄스 타입으로 공급하도록 조절함에 따라, 상기 대상금속의 표면으로부터 일정 깊이까지 탄소를 확산시킨 이후, 표면에 표면 이상층을 추가적으로 형성하도록 한다.</abstract><oa>free_for_read</oa></addata></record>
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subjects CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title Vacuum Carburizing Method It is Possible to Foaming Surface Ideal Layer by Processing Gas Flow Control
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