PROCESSING APPARATUS AND PLATE-LIKE WORKPIECE LOADING/UNLOADING METHOD
A purpose of the present invention is to miniaturize a processing apparatus. A second plate-shaped workpiece (W2) before rough-grinding is held on a first suction surface (801) to be located above a holding surface (20a) through a horizontal moving means (83) and a vertical moving means (82), and a...
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creator | ABE HIROKI NEMOTO YOSHIMITSU YAMANAKA SATOSHI MIYAMOTO HIROKI |
description | A purpose of the present invention is to miniaturize a processing apparatus. A second plate-shaped workpiece (W2) before rough-grinding is held on a first suction surface (801) to be located above a holding surface (20a) through a horizontal moving means (83) and a vertical moving means (82), and a first suction surface (801) and a second suction surface (802) are reversed through a reversal means (81), and then, the second suction surface (802) facing the holding surface (20a) is led to approach a first plate-shaped workpiece (W1) held by the holding surface (20a) through the vertical moving means (82), thereby holding the first plate-shaped workpiece (W1) after rough-grinding on the second suction surface (802). Further, a first return pad (80A) is lifted up to a position where the same can be reversed, and then, upper and lower sides of the first suction surface (801) and the second suction surface (802) are reversed, and the second plate-shaped workpiece (W2) before grinding, held on the first suction surface, is lifted down towards the holding surface (20a) to load the second plate-shaped workpiece (W2) into the holding surface (20a). The processing apparatus (1) having such a loading/unloading function can be miniaturized.
본 발명은 가공 장치를 소형화하는 것을 목적으로 한다. 제1 흡인면(801)에 조연삭(粗硏削) 전의 제2 판형 워크(W2)를 유지하여, 수평 이동 수단(83) 및 상하 이동 수단(82)을 이용하여 유지면(20a)의 상방에 위치시키고, 반전 수단(81)을 이용하여 제1 흡인면(801)과 제2 흡인면(802)을 반전시키고 나서 유지면(20a)에 대면하고 있는 제2 흡인면(802)을, 상하 이동 수단(82)을 이용하여 유지면(20a)에 유지되어 있는 제1 판형 워크(W1)에 접근시켜 가서, 제2 흡인면(802)에 조연삭 후의 제1 판형 워크(W1)를 유지한다. 그리고, 제1 반송 패드(80A)를 그것이 반전할 수 있는 위치로 상승시키고 나서, 다시 제1 흡인면(801)과 제2 흡인면(802)의 상하를 반전시키고, 제1 흡인면에 유지되어 있는 연삭 전의 제2 판형 워크(W2)를 유지면(20a)을 향해 하강시켜 유지면(20a)에 제2 판형 워크(W2)를 반입한다. 이러한 반입 반출 기능을 갖는 가공 장치(1)는 소형화 가능하다. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20210056233A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20210056233A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20210056233A3</originalsourceid><addsrcrecordid>eNrjZHALCPJ3dg0O9vRzV3AMCHAMcgwJDVZw9HNRCPBxDHHV9fH0dlUI9w_yDvB0dXZV8PF3dAEq1Q_1g7IUfF1DPPxdeBhY0xJzilN5oTQ3g7Kba4izh25qQX58anFBYnJqXmpJvHeQkYGRoYGBqZmRsbGjMXGqAHEKLTo</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PROCESSING APPARATUS AND PLATE-LIKE WORKPIECE LOADING/UNLOADING METHOD</title><source>esp@cenet</source><creator>ABE HIROKI ; NEMOTO YOSHIMITSU ; YAMANAKA SATOSHI ; MIYAMOTO HIROKI</creator><creatorcontrib>ABE HIROKI ; NEMOTO YOSHIMITSU ; YAMANAKA SATOSHI ; MIYAMOTO HIROKI</creatorcontrib><description>A purpose of the present invention is to miniaturize a processing apparatus. A second plate-shaped workpiece (W2) before rough-grinding is held on a first suction surface (801) to be located above a holding surface (20a) through a horizontal moving means (83) and a vertical moving means (82), and a first suction surface (801) and a second suction surface (802) are reversed through a reversal means (81), and then, the second suction surface (802) facing the holding surface (20a) is led to approach a first plate-shaped workpiece (W1) held by the holding surface (20a) through the vertical moving means (82), thereby holding the first plate-shaped workpiece (W1) after rough-grinding on the second suction surface (802). Further, a first return pad (80A) is lifted up to a position where the same can be reversed, and then, upper and lower sides of the first suction surface (801) and the second suction surface (802) are reversed, and the second plate-shaped workpiece (W2) before grinding, held on the first suction surface, is lifted down towards the holding surface (20a) to load the second plate-shaped workpiece (W2) into the holding surface (20a). The processing apparatus (1) having such a loading/unloading function can be miniaturized.
본 발명은 가공 장치를 소형화하는 것을 목적으로 한다. 제1 흡인면(801)에 조연삭(粗硏削) 전의 제2 판형 워크(W2)를 유지하여, 수평 이동 수단(83) 및 상하 이동 수단(82)을 이용하여 유지면(20a)의 상방에 위치시키고, 반전 수단(81)을 이용하여 제1 흡인면(801)과 제2 흡인면(802)을 반전시키고 나서 유지면(20a)에 대면하고 있는 제2 흡인면(802)을, 상하 이동 수단(82)을 이용하여 유지면(20a)에 유지되어 있는 제1 판형 워크(W1)에 접근시켜 가서, 제2 흡인면(802)에 조연삭 후의 제1 판형 워크(W1)를 유지한다. 그리고, 제1 반송 패드(80A)를 그것이 반전할 수 있는 위치로 상승시키고 나서, 다시 제1 흡인면(801)과 제2 흡인면(802)의 상하를 반전시키고, 제1 흡인면에 유지되어 있는 연삭 전의 제2 판형 워크(W2)를 유지면(20a)을 향해 하강시켜 유지면(20a)에 제2 판형 워크(W2)를 반입한다. 이러한 반입 반출 기능을 갖는 가공 장치(1)는 소형화 가능하다.</description><language>eng ; kor</language><subject>BASIC ELECTRIC ELEMENTS ; DRESSING OR CONDITIONING OF ABRADING SURFACES ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; PERFORMING OPERATIONS ; POLISHING ; SEMICONDUCTOR DEVICES ; TRANSPORTING</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210518&DB=EPODOC&CC=KR&NR=20210056233A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210518&DB=EPODOC&CC=KR&NR=20210056233A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ABE HIROKI</creatorcontrib><creatorcontrib>NEMOTO YOSHIMITSU</creatorcontrib><creatorcontrib>YAMANAKA SATOSHI</creatorcontrib><creatorcontrib>MIYAMOTO HIROKI</creatorcontrib><title>PROCESSING APPARATUS AND PLATE-LIKE WORKPIECE LOADING/UNLOADING METHOD</title><description>A purpose of the present invention is to miniaturize a processing apparatus. A second plate-shaped workpiece (W2) before rough-grinding is held on a first suction surface (801) to be located above a holding surface (20a) through a horizontal moving means (83) and a vertical moving means (82), and a first suction surface (801) and a second suction surface (802) are reversed through a reversal means (81), and then, the second suction surface (802) facing the holding surface (20a) is led to approach a first plate-shaped workpiece (W1) held by the holding surface (20a) through the vertical moving means (82), thereby holding the first plate-shaped workpiece (W1) after rough-grinding on the second suction surface (802). Further, a first return pad (80A) is lifted up to a position where the same can be reversed, and then, upper and lower sides of the first suction surface (801) and the second suction surface (802) are reversed, and the second plate-shaped workpiece (W2) before grinding, held on the first suction surface, is lifted down towards the holding surface (20a) to load the second plate-shaped workpiece (W2) into the holding surface (20a). The processing apparatus (1) having such a loading/unloading function can be miniaturized.
본 발명은 가공 장치를 소형화하는 것을 목적으로 한다. 제1 흡인면(801)에 조연삭(粗硏削) 전의 제2 판형 워크(W2)를 유지하여, 수평 이동 수단(83) 및 상하 이동 수단(82)을 이용하여 유지면(20a)의 상방에 위치시키고, 반전 수단(81)을 이용하여 제1 흡인면(801)과 제2 흡인면(802)을 반전시키고 나서 유지면(20a)에 대면하고 있는 제2 흡인면(802)을, 상하 이동 수단(82)을 이용하여 유지면(20a)에 유지되어 있는 제1 판형 워크(W1)에 접근시켜 가서, 제2 흡인면(802)에 조연삭 후의 제1 판형 워크(W1)를 유지한다. 그리고, 제1 반송 패드(80A)를 그것이 반전할 수 있는 위치로 상승시키고 나서, 다시 제1 흡인면(801)과 제2 흡인면(802)의 상하를 반전시키고, 제1 흡인면에 유지되어 있는 연삭 전의 제2 판형 워크(W2)를 유지면(20a)을 향해 하강시켜 유지면(20a)에 제2 판형 워크(W2)를 반입한다. 이러한 반입 반출 기능을 갖는 가공 장치(1)는 소형화 가능하다.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHING</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHALCPJ3dg0O9vRzV3AMCHAMcgwJDVZw9HNRCPBxDHHV9fH0dlUI9w_yDvB0dXZV8PF3dAEq1Q_1g7IUfF1DPPxdeBhY0xJzilN5oTQ3g7Kba4izh25qQX58anFBYnJqXmpJvHeQkYGRoYGBqZmRsbGjMXGqAHEKLTo</recordid><startdate>20210518</startdate><enddate>20210518</enddate><creator>ABE HIROKI</creator><creator>NEMOTO YOSHIMITSU</creator><creator>YAMANAKA SATOSHI</creator><creator>MIYAMOTO HIROKI</creator><scope>EVB</scope></search><sort><creationdate>20210518</creationdate><title>PROCESSING APPARATUS AND PLATE-LIKE WORKPIECE LOADING/UNLOADING METHOD</title><author>ABE HIROKI ; NEMOTO YOSHIMITSU ; YAMANAKA SATOSHI ; MIYAMOTO HIROKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20210056233A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2021</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHING</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>ABE HIROKI</creatorcontrib><creatorcontrib>NEMOTO YOSHIMITSU</creatorcontrib><creatorcontrib>YAMANAKA SATOSHI</creatorcontrib><creatorcontrib>MIYAMOTO HIROKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ABE HIROKI</au><au>NEMOTO YOSHIMITSU</au><au>YAMANAKA SATOSHI</au><au>MIYAMOTO HIROKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PROCESSING APPARATUS AND PLATE-LIKE WORKPIECE LOADING/UNLOADING METHOD</title><date>2021-05-18</date><risdate>2021</risdate><abstract>A purpose of the present invention is to miniaturize a processing apparatus. A second plate-shaped workpiece (W2) before rough-grinding is held on a first suction surface (801) to be located above a holding surface (20a) through a horizontal moving means (83) and a vertical moving means (82), and a first suction surface (801) and a second suction surface (802) are reversed through a reversal means (81), and then, the second suction surface (802) facing the holding surface (20a) is led to approach a first plate-shaped workpiece (W1) held by the holding surface (20a) through the vertical moving means (82), thereby holding the first plate-shaped workpiece (W1) after rough-grinding on the second suction surface (802). Further, a first return pad (80A) is lifted up to a position where the same can be reversed, and then, upper and lower sides of the first suction surface (801) and the second suction surface (802) are reversed, and the second plate-shaped workpiece (W2) before grinding, held on the first suction surface, is lifted down towards the holding surface (20a) to load the second plate-shaped workpiece (W2) into the holding surface (20a). The processing apparatus (1) having such a loading/unloading function can be miniaturized.
본 발명은 가공 장치를 소형화하는 것을 목적으로 한다. 제1 흡인면(801)에 조연삭(粗硏削) 전의 제2 판형 워크(W2)를 유지하여, 수평 이동 수단(83) 및 상하 이동 수단(82)을 이용하여 유지면(20a)의 상방에 위치시키고, 반전 수단(81)을 이용하여 제1 흡인면(801)과 제2 흡인면(802)을 반전시키고 나서 유지면(20a)에 대면하고 있는 제2 흡인면(802)을, 상하 이동 수단(82)을 이용하여 유지면(20a)에 유지되어 있는 제1 판형 워크(W1)에 접근시켜 가서, 제2 흡인면(802)에 조연삭 후의 제1 판형 워크(W1)를 유지한다. 그리고, 제1 반송 패드(80A)를 그것이 반전할 수 있는 위치로 상승시키고 나서, 다시 제1 흡인면(801)과 제2 흡인면(802)의 상하를 반전시키고, 제1 흡인면에 유지되어 있는 연삭 전의 제2 판형 워크(W2)를 유지면(20a)을 향해 하강시켜 유지면(20a)에 제2 판형 워크(W2)를 반입한다. 이러한 반입 반출 기능을 갖는 가공 장치(1)는 소형화 가능하다.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | BASIC ELECTRIC ELEMENTS DRESSING OR CONDITIONING OF ABRADING SURFACES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING SEMICONDUCTOR DEVICES TRANSPORTING |
title | PROCESSING APPARATUS AND PLATE-LIKE WORKPIECE LOADING/UNLOADING METHOD |
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