전압 인가 장치 및 방전 장치
전압 인가 장치는, 전압 인가 회로를 구비한다. 전압 인가 회로는, 서로 간극을 통해 대향하도록 배치되는 방전 전극(41)과 대향 전극(42)의 사이에 인가 전압(V1)을 인가함으로써, 방전을 발생시킨다. 전압 인가 장치는, 방전의 발생 시에는, 방전 전극(41)과 대향 전극(42)의 사이에, 부분적으로 절연 파괴된 방전 경로(L1)를 형성한다. 방전 경로(L1)는, 방전 전극(41)의 주위에 생성되는 제1 절연 파괴 영역(R1)과, 대향 전극(42)의 주위에 생성되는 제2 절연 파괴 영역(R2)을 포함한다. A voltage ap...
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| creator | AONO TETSUNORI NAKANO YUKARI OE JUMPEI NAKADA TAKAYUKI SHIMIZU KANA OMORI TAKAFUMI ISHIGAMI YOHEI |
| description | 전압 인가 장치는, 전압 인가 회로를 구비한다. 전압 인가 회로는, 서로 간극을 통해 대향하도록 배치되는 방전 전극(41)과 대향 전극(42)의 사이에 인가 전압(V1)을 인가함으로써, 방전을 발생시킨다. 전압 인가 장치는, 방전의 발생 시에는, 방전 전극(41)과 대향 전극(42)의 사이에, 부분적으로 절연 파괴된 방전 경로(L1)를 형성한다. 방전 경로(L1)는, 방전 전극(41)의 주위에 생성되는 제1 절연 파괴 영역(R1)과, 대향 전극(42)의 주위에 생성되는 제2 절연 파괴 영역(R2)을 포함한다.
A voltage application device includes a voltage application circuit. The voltage application circuit applies application voltage (V1) between discharge electrode (41) and counter electrode (42) which face each other with a clearance left from each other to generate a discharge. The voltage application device forms discharge path (L1) partially and dielectrically broken between discharge electrode (41) and counter electrode (42) when a discharge is generated. Discharge path (L1) includes first dielectric breakdown region (R1) formed around discharge electrode (41), and second dielectric breakdown region (R2) formed around counter electrode (42). |
| format | Patent |
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A voltage application device includes a voltage application circuit. The voltage application circuit applies application voltage (V1) between discharge electrode (41) and counter electrode (42) which face each other with a clearance left from each other to generate a discharge. The voltage application device forms discharge path (L1) partially and dielectrically broken between discharge electrode (41) and counter electrode (42) when a discharge is generated. Discharge path (L1) includes first dielectric breakdown region (R1) formed around discharge electrode (41), and second dielectric breakdown region (R2) formed around counter electrode (42).</description><language>kor</language><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; ATOMISING APPARATUS ; BASIC ELECTRIC ELEMENTS ; CORONA DEVICES ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES ; NOZZLES ; OVERVOLTAGE ARRESTERS USING SPARK GAPS ; PERFORMING OPERATIONS ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS ; SPARK GAPS ; SPARKING PLUGS ; SPRAYING APPARATUS ; SPRAYING OR ATOMISING IN GENERAL ; TRANSPORTING</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210503&DB=EPODOC&CC=KR&NR=20210048491A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210503&DB=EPODOC&CC=KR&NR=20210048491A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>AONO TETSUNORI</creatorcontrib><creatorcontrib>NAKANO YUKARI</creatorcontrib><creatorcontrib>OE JUMPEI</creatorcontrib><creatorcontrib>NAKADA TAKAYUKI</creatorcontrib><creatorcontrib>SHIMIZU KANA</creatorcontrib><creatorcontrib>OMORI TAKAFUMI</creatorcontrib><creatorcontrib>ISHIGAMI YOHEI</creatorcontrib><title>전압 인가 장치 및 방전 장치</title><description>전압 인가 장치는, 전압 인가 회로를 구비한다. 전압 인가 회로는, 서로 간극을 통해 대향하도록 배치되는 방전 전극(41)과 대향 전극(42)의 사이에 인가 전압(V1)을 인가함으로써, 방전을 발생시킨다. 전압 인가 장치는, 방전의 발생 시에는, 방전 전극(41)과 대향 전극(42)의 사이에, 부분적으로 절연 파괴된 방전 경로(L1)를 형성한다. 방전 경로(L1)는, 방전 전극(41)의 주위에 생성되는 제1 절연 파괴 영역(R1)과, 대향 전극(42)의 주위에 생성되는 제2 절연 파괴 영역(R2)을 포함한다.
A voltage application device includes a voltage application circuit. The voltage application circuit applies application voltage (V1) between discharge electrode (41) and counter electrode (42) which face each other with a clearance left from each other to generate a discharge. The voltage application device forms discharge path (L1) partially and dielectrically broken between discharge electrode (41) and counter electrode (42) when a discharge is generated. Discharge path (L1) includes first dielectric breakdown region (R1) formed around discharge electrode (41), and second dielectric breakdown region (R2) formed around counter electrode (42).</description><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>ATOMISING APPARATUS</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CORONA DEVICES</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES</subject><subject>NOZZLES</subject><subject>OVERVOLTAGE ARRESTERS USING SPARK GAPS</subject><subject>PERFORMING OPERATIONS</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><subject>SPARK GAPS</subject><subject>SPARKING PLUGS</subject><subject>SPRAYING APPARATUS</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFB7s6DlzdSpCm_m7ni1oUHhzbylb3bOUHi9oR-IVwLloCI8DKxpiTnFqbxQmptB2c01xNlDN7UgPz61uCAxOTUvtSTeO8jIwMjQwMDEwsTS0NGYOFUAZjIyXg</recordid><startdate>20210503</startdate><enddate>20210503</enddate><creator>AONO TETSUNORI</creator><creator>NAKANO YUKARI</creator><creator>OE JUMPEI</creator><creator>NAKADA TAKAYUKI</creator><creator>SHIMIZU KANA</creator><creator>OMORI TAKAFUMI</creator><creator>ISHIGAMI YOHEI</creator><scope>EVB</scope></search><sort><creationdate>20210503</creationdate><title>전압 인가 장치 및 방전 장치</title><author>AONO TETSUNORI ; NAKANO YUKARI ; OE JUMPEI ; NAKADA TAKAYUKI ; SHIMIZU KANA ; OMORI TAKAFUMI ; ISHIGAMI YOHEI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20210048491A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>kor</language><creationdate>2021</creationdate><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>ATOMISING APPARATUS</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CORONA DEVICES</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES</topic><topic>NOZZLES</topic><topic>OVERVOLTAGE ARRESTERS USING SPARK GAPS</topic><topic>PERFORMING OPERATIONS</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><topic>SPARK GAPS</topic><topic>SPARKING PLUGS</topic><topic>SPRAYING APPARATUS</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>AONO TETSUNORI</creatorcontrib><creatorcontrib>NAKANO YUKARI</creatorcontrib><creatorcontrib>OE JUMPEI</creatorcontrib><creatorcontrib>NAKADA TAKAYUKI</creatorcontrib><creatorcontrib>SHIMIZU KANA</creatorcontrib><creatorcontrib>OMORI TAKAFUMI</creatorcontrib><creatorcontrib>ISHIGAMI YOHEI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>AONO TETSUNORI</au><au>NAKANO YUKARI</au><au>OE JUMPEI</au><au>NAKADA TAKAYUKI</au><au>SHIMIZU KANA</au><au>OMORI TAKAFUMI</au><au>ISHIGAMI YOHEI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>전압 인가 장치 및 방전 장치</title><date>2021-05-03</date><risdate>2021</risdate><abstract>전압 인가 장치는, 전압 인가 회로를 구비한다. 전압 인가 회로는, 서로 간극을 통해 대향하도록 배치되는 방전 전극(41)과 대향 전극(42)의 사이에 인가 전압(V1)을 인가함으로써, 방전을 발생시킨다. 전압 인가 장치는, 방전의 발생 시에는, 방전 전극(41)과 대향 전극(42)의 사이에, 부분적으로 절연 파괴된 방전 경로(L1)를 형성한다. 방전 경로(L1)는, 방전 전극(41)의 주위에 생성되는 제1 절연 파괴 영역(R1)과, 대향 전극(42)의 주위에 생성되는 제2 절연 파괴 영역(R2)을 포함한다.
A voltage application device includes a voltage application circuit. The voltage application circuit applies application voltage (V1) between discharge electrode (41) and counter electrode (42) which face each other with a clearance left from each other to generate a discharge. The voltage application device forms discharge path (L1) partially and dielectrically broken between discharge electrode (41) and counter electrode (42) when a discharge is generated. Discharge path (L1) includes first dielectric breakdown region (R1) formed around discharge electrode (41), and second dielectric breakdown region (R2) formed around counter electrode (42).</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS BASIC ELECTRIC ELEMENTS CORONA DEVICES ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES NOZZLES OVERVOLTAGE ARRESTERS USING SPARK GAPS PERFORMING OPERATIONS PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SPARK GAPS SPARKING PLUGS SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL TRANSPORTING |
| title | 전압 인가 장치 및 방전 장치 |
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