PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING SAME AND COLOR FILTER

The present invention relates to a photosensitive resin composition comprising: (A) quantum dots; (B) a binder resin; (C) a photopolymerizable monomer; (D) a photoinitiator; (E-1) a first solvent; and (E-2) a second solvent different from the first solvent, wherein the second solvent is cyclohexyl a...

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Bibliographische Detailangaben
Hauptverfasser:	PAEK HOJEONG, CHOI JONG KYU, KIM LEE JUNE, YOUN JINSUOP, CHUNG MINKYEOL, PARK ONYOU, LEE BUMJIN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The present invention relates to a photosensitive resin composition comprising: (A) quantum dots; (B) a binder resin; (C) a photopolymerizable monomer; (D) a photoinitiator; (E-1) a first solvent; and (E-2) a second solvent different from the first solvent, wherein the second solvent is cyclohexyl acetate, and comprises 40 to 80 wt% based on the total amount of the first solvent and the second solvent, to a photosensitive resin film produced using the same, and to a color filter comprising the photosensitive resin film. The photosensitive resin composition minimizes deterioration of optical properties of the quantum dots. (A) 양자점; (B) 바인더 수지; (C) 광중합성 단량체; (D) 광중합 개시제; (E-1) 제1 용매; 및 (E-2) 상기 제1 용매와 상이한 제2 용매를 포함하고, 상기 제2 용매는 사이클로헥실아세테이트이고, 상기 제2 용매는 상기 제1 용매 및 제2 용매 총량에 대해 40 중량% 내지 80 중량%로 포함되는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막, 상기 감광성 수지막을 포함하는 컬러필터가 제공된다.