수처리 시스템
본 개시내용은 물로부터 불순물을 제거하기 위해 사용될 수도 있는 수처리 시스템, 특히 건물 내로의 상수도의 입구 지점에 삽입되는 시스템에 관한 것이다. The disclosure relates to water treatment systems that may be used to remove impurities from water, particularly systems that inserted at the point of entry of a water supply into a building....
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| creator | KOVALCIK MICHAEL REESBECK THOMAS JUNI JACK O'BRIAN MITCH KOWALSKI DEREK DRULIA JEFF TALLY WILLIAM N RUFFOLO ALEX |
| description | 본 개시내용은 물로부터 불순물을 제거하기 위해 사용될 수도 있는 수처리 시스템, 특히 건물 내로의 상수도의 입구 지점에 삽입되는 시스템에 관한 것이다.
The disclosure relates to water treatment systems that may be used to remove impurities from water, particularly systems that inserted at the point of entry of a water supply into a building. |
| format | Patent |
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The disclosure relates to water treatment systems that may be used to remove impurities from water, particularly systems that inserted at the point of entry of a water supply into a building.</description><subject>CHEMISTRY</subject><subject>METALLURGY</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>SEPARATION</subject><subject>TRANSPORTING</subject><subject>TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBB-0zHjzaYZr5etUXjTPedN15K3rXN4GFjTEnOKU3mhNDeDsptriLOHbmpBfnxqcUFicmpeakm8d5CRgZGBgaGxoYWJpaMxcaoA0mEmrA</recordid><startdate>20201124</startdate><enddate>20201124</enddate><creator>KOVALCIK MICHAEL</creator><creator>REESBECK THOMAS</creator><creator>JUNI JACK</creator><creator>O'BRIAN MITCH</creator><creator>KOWALSKI DEREK</creator><creator>DRULIA JEFF</creator><creator>TALLY WILLIAM N</creator><creator>RUFFOLO ALEX</creator><scope>EVB</scope></search><sort><creationdate>20201124</creationdate><title>수처리 시스템</title><author>KOVALCIK MICHAEL ; REESBECK THOMAS ; JUNI JACK ; O'BRIAN MITCH ; KOWALSKI DEREK ; DRULIA JEFF ; TALLY WILLIAM N ; RUFFOLO ALEX</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20200131849A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>kor</language><creationdate>2020</creationdate><topic>CHEMISTRY</topic><topic>METALLURGY</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>SEPARATION</topic><topic>TRANSPORTING</topic><topic>TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE</topic><toplevel>online_resources</toplevel><creatorcontrib>KOVALCIK MICHAEL</creatorcontrib><creatorcontrib>REESBECK THOMAS</creatorcontrib><creatorcontrib>JUNI JACK</creatorcontrib><creatorcontrib>O'BRIAN MITCH</creatorcontrib><creatorcontrib>KOWALSKI DEREK</creatorcontrib><creatorcontrib>DRULIA JEFF</creatorcontrib><creatorcontrib>TALLY WILLIAM N</creatorcontrib><creatorcontrib>RUFFOLO ALEX</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KOVALCIK MICHAEL</au><au>REESBECK THOMAS</au><au>JUNI JACK</au><au>O'BRIAN MITCH</au><au>KOWALSKI DEREK</au><au>DRULIA JEFF</au><au>TALLY WILLIAM N</au><au>RUFFOLO ALEX</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>수처리 시스템</title><date>2020-11-24</date><risdate>2020</risdate><abstract>본 개시내용은 물로부터 불순물을 제거하기 위해 사용될 수도 있는 수처리 시스템, 특히 건물 내로의 상수도의 입구 지점에 삽입되는 시스템에 관한 것이다.
The disclosure relates to water treatment systems that may be used to remove impurities from water, particularly systems that inserted at the point of entry of a water supply into a building.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMISTRY METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION TRANSPORTING TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE |
| title | 수처리 시스템 |
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