SEMICONDUCTOR DEVICE
A technology of the present invention includes a semiconductor device including a support structure penetrating a laminate including interlayer insulating films and electrode patterns alternately laminated and having a structure extending in a zigzag shape or having a curved unit. The semiconductor...
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; kor |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| Zusammenfassung: | A technology of the present invention includes a semiconductor device including a support structure penetrating a laminate including interlayer insulating films and electrode patterns alternately laminated and having a structure extending in a zigzag shape or having a curved unit. The semiconductor device can increase the structural stability.
본 기술은 교대로 적층된 층간 절연막들 및 전극패턴들을 포함하는 적층체를 관통하고, 지그재그 형태로 연장된 구조를 갖거나, 굴곡부를 갖는 지지구조를 포함하는 반도체 장치를 포함한다. |
|---|