OPTICAL MEASURING SYSTEM AND OPTICAL MEASURING METHOD
The present invention relates to an optical measuring system capable of measuring optical characteristics at higher precision even for a sample in which measurement accuracy may be degraded by a conventional optical measuring device. The optical measuring system of the present invention comprises: a...
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| creator | TAGUCHI KUNIKAZU MORIMOTO KOICHI KAMEMOTO TOMOHIKO OKAMOTO SOTA INANO DAISUKE |
| description | The present invention relates to an optical measuring system capable of measuring optical characteristics at higher precision even for a sample in which measurement accuracy may be degraded by a conventional optical measuring device. The optical measuring system of the present invention comprises: a light source for generating measurement light for irradiating a sample; a spectroscopic detector for receiving reflected or transmitted light generated from the sample by the measurement light; and a processing device in which a detection result of the spectroscopic detector is inputted. The processing device can execute the processes of: calculating a first spectrum based on the detection result of the spectroscopic detector; specifying a section in which a change in amplitude for a wavelength satisfies a predetermined condition in the first spectrum; and calculating optical characteristics of the sample by using a second spectrum from which information of the specified section has been removed from the first spectrum.
종래의 광학 측정 장치로는 측정 정밀도가 저하될 수 있는 샘플에 대해서도, 보다 높은 정밀도로 광학 특성을 측정할 수 있는 구성이 제공된다. 광학 측정 시스템은, 샘플에 조사하기 위한 측정광을 발생시키는 광원과, 측정광에 의해 샘플에서 발생하는 반사광 또는 투과광을 수광하는 분광 검출기와, 분광 검출기의 검출 결과가 입력되는 처리 장치를 포함한다. 처리 장치는, 분광 검출기의 검출 결과에 기초하여 제 1 스펙트럼을 산출하는 처리와, 제 1 스펙트럼에 있어서, 파장에 관한 진폭의 변화가 소정 조건을 만족하고 있는 구간을 특정하는 처리와, 제 1 스펙트럼으로부터 특정된 구간의 정보를 제거한 제 2 스펙트럼을 사용하여 샘플의 광학 특성을 산출하는 처리를 실행 가능하게 구성되어 있다. |
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종래의 광학 측정 장치로는 측정 정밀도가 저하될 수 있는 샘플에 대해서도, 보다 높은 정밀도로 광학 특성을 측정할 수 있는 구성이 제공된다. 광학 측정 시스템은, 샘플에 조사하기 위한 측정광을 발생시키는 광원과, 측정광에 의해 샘플에서 발생하는 반사광 또는 투과광을 수광하는 분광 검출기와, 분광 검출기의 검출 결과가 입력되는 처리 장치를 포함한다. 처리 장치는, 분광 검출기의 검출 결과에 기초하여 제 1 스펙트럼을 산출하는 처리와, 제 1 스펙트럼에 있어서, 파장에 관한 진폭의 변화가 소정 조건을 만족하고 있는 구간을 특정하는 처리와, 제 1 스펙트럼으로부터 특정된 구간의 정보를 제거한 제 2 스펙트럼을 사용하여 샘플의 광학 특성을 산출하는 처리를 실행 가능하게 구성되어 있다.</description><language>eng ; kor</language><subject>COLORIMETRY ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT ; MEASURING ; MEASURING ANGLES ; MEASURING AREAS ; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS ; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ; PHYSICS ; RADIATION PYROMETRY ; TESTING</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200806&DB=EPODOC&CC=KR&NR=20200094099A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200806&DB=EPODOC&CC=KR&NR=20200094099A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TAGUCHI KUNIKAZU</creatorcontrib><creatorcontrib>MORIMOTO KOICHI</creatorcontrib><creatorcontrib>KAMEMOTO TOMOHIKO</creatorcontrib><creatorcontrib>OKAMOTO SOTA</creatorcontrib><creatorcontrib>INANO DAISUKE</creatorcontrib><title>OPTICAL MEASURING SYSTEM AND OPTICAL MEASURING METHOD</title><description>The present invention relates to an optical measuring system capable of measuring optical characteristics at higher precision even for a sample in which measurement accuracy may be degraded by a conventional optical measuring device. The optical measuring system of the present invention comprises: a light source for generating measurement light for irradiating a sample; a spectroscopic detector for receiving reflected or transmitted light generated from the sample by the measurement light; and a processing device in which a detection result of the spectroscopic detector is inputted. The processing device can execute the processes of: calculating a first spectrum based on the detection result of the spectroscopic detector; specifying a section in which a change in amplitude for a wavelength satisfies a predetermined condition in the first spectrum; and calculating optical characteristics of the sample by using a second spectrum from which information of the specified section has been removed from the first spectrum.
종래의 광학 측정 장치로는 측정 정밀도가 저하될 수 있는 샘플에 대해서도, 보다 높은 정밀도로 광학 특성을 측정할 수 있는 구성이 제공된다. 광학 측정 시스템은, 샘플에 조사하기 위한 측정광을 발생시키는 광원과, 측정광에 의해 샘플에서 발생하는 반사광 또는 투과광을 수광하는 분광 검출기와, 분광 검출기의 검출 결과가 입력되는 처리 장치를 포함한다. 처리 장치는, 분광 검출기의 검출 결과에 기초하여 제 1 스펙트럼을 산출하는 처리와, 제 1 스펙트럼에 있어서, 파장에 관한 진폭의 변화가 소정 조건을 만족하고 있는 구간을 특정하는 처리와, 제 1 스펙트럼으로부터 특정된 구간의 정보를 제거한 제 2 스펙트럼을 사용하여 샘플의 광학 특성을 산출하는 처리를 실행 가능하게 구성되어 있다.</description><subject>COLORIMETRY</subject><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT</subject><subject>MEASURING</subject><subject>MEASURING ANGLES</subject><subject>MEASURING AREAS</subject><subject>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</subject><subject>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</subject><subject>PHYSICS</subject><subject>RADIATION PYROMETRY</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDD1DwjxdHb0UfB1dQwODfL0c1cIjgwOcfVVcPRzUcCU9HUN8fB34WFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8d5BRgZGBgYGliYGlpaOxsSpAgCaeCil</recordid><startdate>20200806</startdate><enddate>20200806</enddate><creator>TAGUCHI KUNIKAZU</creator><creator>MORIMOTO KOICHI</creator><creator>KAMEMOTO TOMOHIKO</creator><creator>OKAMOTO SOTA</creator><creator>INANO DAISUKE</creator><scope>EVB</scope></search><sort><creationdate>20200806</creationdate><title>OPTICAL MEASURING SYSTEM AND OPTICAL MEASURING METHOD</title><author>TAGUCHI KUNIKAZU ; MORIMOTO KOICHI ; KAMEMOTO TOMOHIKO ; OKAMOTO SOTA ; INANO DAISUKE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20200094099A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2020</creationdate><topic>COLORIMETRY</topic><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT</topic><topic>MEASURING</topic><topic>MEASURING ANGLES</topic><topic>MEASURING AREAS</topic><topic>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</topic><topic>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</topic><topic>PHYSICS</topic><topic>RADIATION PYROMETRY</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>TAGUCHI KUNIKAZU</creatorcontrib><creatorcontrib>MORIMOTO KOICHI</creatorcontrib><creatorcontrib>KAMEMOTO TOMOHIKO</creatorcontrib><creatorcontrib>OKAMOTO SOTA</creatorcontrib><creatorcontrib>INANO DAISUKE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TAGUCHI KUNIKAZU</au><au>MORIMOTO KOICHI</au><au>KAMEMOTO TOMOHIKO</au><au>OKAMOTO SOTA</au><au>INANO DAISUKE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>OPTICAL MEASURING SYSTEM AND OPTICAL MEASURING METHOD</title><date>2020-08-06</date><risdate>2020</risdate><abstract>The present invention relates to an optical measuring system capable of measuring optical characteristics at higher precision even for a sample in which measurement accuracy may be degraded by a conventional optical measuring device. The optical measuring system of the present invention comprises: a light source for generating measurement light for irradiating a sample; a spectroscopic detector for receiving reflected or transmitted light generated from the sample by the measurement light; and a processing device in which a detection result of the spectroscopic detector is inputted. The processing device can execute the processes of: calculating a first spectrum based on the detection result of the spectroscopic detector; specifying a section in which a change in amplitude for a wavelength satisfies a predetermined condition in the first spectrum; and calculating optical characteristics of the sample by using a second spectrum from which information of the specified section has been removed from the first spectrum.
종래의 광학 측정 장치로는 측정 정밀도가 저하될 수 있는 샘플에 대해서도, 보다 높은 정밀도로 광학 특성을 측정할 수 있는 구성이 제공된다. 광학 측정 시스템은, 샘플에 조사하기 위한 측정광을 발생시키는 광원과, 측정광에 의해 샘플에서 발생하는 반사광 또는 투과광을 수광하는 분광 검출기와, 분광 검출기의 검출 결과가 입력되는 처리 장치를 포함한다. 처리 장치는, 분광 검출기의 검출 결과에 기초하여 제 1 스펙트럼을 산출하는 처리와, 제 1 스펙트럼에 있어서, 파장에 관한 진폭의 변화가 소정 조건을 만족하고 있는 구간을 특정하는 처리와, 제 1 스펙트럼으로부터 특정된 구간의 정보를 제거한 제 2 스펙트럼을 사용하여 샘플의 광학 특성을 산출하는 처리를 실행 가능하게 구성되어 있다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | COLORIMETRY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS RADIATION PYROMETRY TESTING |
| title | OPTICAL MEASURING SYSTEM AND OPTICAL MEASURING METHOD |
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